INTERFERENCE IN-SENSITIVE LITTROW SYSTEM FOR OPTICAL DEVICE STRUCTURE MEASUREMENT

    公开(公告)号:US20240142227A1

    公开(公告)日:2024-05-02

    申请号:US18408193

    申请日:2024-01-09

    CPC classification number: G01B11/26

    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

    ULTRA-WIDE ANGLE LENS SYSTEMS WITH EXTERNAL PUPIL

    公开(公告)号:US20220397744A1

    公开(公告)日:2022-12-15

    申请号:US17805623

    申请日:2022-06-06

    Abstract: Embodiments of the present disclosure generally relate to an optical system having a lens system configured to have a wide field of view and high resolution. The optical system includes three or more lens groups with ability to combat optical aberrations and produce a pupil outside of the lens group. The lens system as an image projection system projects a pattern or image rendered on a flat reticle or display of finite distance to the infinity. In an imaging system, the lens system collects light from infinity and forms an image of that object on a sensor.

    ION IMPLANTATION TO MODIFY GLASS LOCALLY FOR OPTICAL DEVICES

    公开(公告)号:US20220307127A1

    公开(公告)日:2022-09-29

    申请号:US17655849

    申请日:2022-03-22

    Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

    LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE

    公开(公告)号:US20220171283A1

    公开(公告)日:2022-06-02

    申请号:US17534128

    申请日:2021-11-23

    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.

    ASYMMETRIC METROLOGY TOOL FOR REFLECTIVE WAVEGUIDE

    公开(公告)号:US20250053099A1

    公开(公告)日:2025-02-13

    申请号:US18797716

    申请日:2024-08-08

    Abstract: Embodiments described herein provide an asymmetric optical metrology system for evaluating and inspecting the performance of optical devices, such as augmented reality (AR) waveguide combiners. The system utilizes an asymmetric optical configuration and fly-eye illumination to enhance the detection limit of image sharpness and the accuracy of luminance uniformity. By employing different lenses with various focal lengths, the system increases the sampling rate in the angular space, addressing the challenges of form factor limitations and pixel density inherent in conventional metrology tools. Embodiments described herein offer improved contrast and sharp image details, as well as a compact design, making it suitable for the development, optimization, and quality control of optical devices, such as AR waveguide combiners.

    LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE

    公开(公告)号:US20250053082A1

    公开(公告)日:2025-02-13

    申请号:US18933099

    申请日:2024-10-31

    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.

    GLOBAL COLOR CORRECTION FOR OPTICAL SYSTEM

    公开(公告)号:US20250020921A1

    公开(公告)日:2025-01-16

    申请号:US18769069

    申请日:2024-07-10

    Inventor: Jinxin FU Sihui HE

    Abstract: Embodiments described herein relate to an augmented reality (AR) system. The AR system includes a projection system and an optical device. The projection system includes a backlight, a lens, and an illumination system. The illumination system is configured to receive light from the backlight and emit light having a first color trend. The light having a first color trend is emitted through the lens towards the optical device. The optical device is configured to form a second color trend. The second color trend is opposite the first color trend.

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