公开(公告)号：US20220148847A1

公开(公告)日：2022-05-12

申请号：US17523359

申请日：2021-11-10

Applicant: Axcelis Technologies, Inc.

Inventor： Atul Gupta ,  Scott E Galica

IPC: H01J37/20 ,  H01L21/683

Abstract: A thermal electrostatic clamp has a central electrostatic portion associated with a central region of a workpiece. A central body has a clamping surface and one or more electrodes are associated with the central body. One or more electrodes selectively electrostatically clamp at least the central region of the workpiece to the clamping surface based on an electrical current passed therethrough. One or more first heaters of the central body selectively heat the central electrostatic portion to a first temperature. A non-electrostatic peripheral portion associated with a peripheral region of the workpiece has a peripheral body encircling the central body, separated by a gap. The peripheral body is positioned beneath the peripheral region of the workpiece. The peripheral portion does not electrostatically clamp the peripheral region of the workpiece. One or more second heaters of the peripheral body selectively heat the non-electrostatic peripheral portion to a second temperature.

公开(公告)号：US20240035148A1

公开(公告)日：2024-02-01

申请号：US18361024

申请日：2023-07-28

Applicant: Axcelis Technologies, Inc.

Inventor： Neil Colvin ,  David Sporleder ,  Udo H. Verkerk ,  Atul Gupta ,  Edward Moore

IPC: C23C14/48 ,  H01J37/317 ,  C23C14/14

CPC classification number: C23C14/48 ,  H01J37/3171 ,  C23C14/14

Abstract: An ion implantation system, ion source, and method are provided for forming an aluminum ion beam from an aluminum-containing species to an ion source. One or more of a halide species and a halide molecule are introduced to the ion source, where the halide species is selected from a group consisting of atomic chlorine, atomic bromine, and atomic iodine, and the halide molecule comprises a halide selected from a group consisting of chlorine, bromine, and iodine. The one or more of the halide species and the halide molecule clean one or more components of the ion source and further react with the aluminum-containing species to generate an aluminum-halide vapor. The aluminum ion beam is further formed from at least the aluminum-halide vapor.

公开(公告)号：US11887808B2

公开(公告)日：2024-01-30

申请号：US17523359

申请日：2021-11-10

Applicant: Axcelis Technologies, Inc.

Inventor： Atul Gupta ,  Scott E Galica

IPC: H01J37/20 ,  H01L21/683 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01L21/6833 ,  H01J37/3171 ,  H01J2237/2007

Abstract: A thermal electrostatic clamp has a central electrostatic portion associated with a central region of a workpiece. A central body has a clamping surface and one or more electrodes are associated with the central body. One or more electrodes selectively electrostatically clamp at least the central region of the workpiece to the clamping surface based on an electrical current passed therethrough. One or more first heaters of the central body selectively heat the central electrostatic portion to a first temperature. A non-electrostatic peripheral portion associated with a peripheral region of the workpiece has a peripheral body encircling the central body, separated by a gap. The peripheral body is positioned beneath the peripheral region of the workpiece. The peripheral portion does not electrostatically clamp the peripheral region of the workpiece. One or more second heaters of the peripheral body selectively heat the non-electrostatic peripheral portion to a second temperature.

公开(公告)号：US20230038392A1

公开(公告)日：2023-02-09

申请号：US17881020

申请日：2022-08-04

Applicant: Axcelis Technologies, Inc.

Inventor： James S. DeLuca ,  Dwight Roh ,  Patrick Heres ,  Atul Gupta

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/20 ,  H01J37/304 ,  C23C14/48 ,  C23C14/54

Abstract: Ion implantation systems and methods implant varying energies of an ion beam across a workpiece in a serial single-workpiece end station, where electrodes of an acceleration/deceleration stage, bend electrode and/or energy filter control a final energy or path of the ion beam to the workpiece. The bend electrode or an energy filter can form part of the acceleration/deceleration stage or can be positioned downstream. A scanning apparatus scans the ion beam and/or the workpiece, and a power source provides varied electrical bias signals to the electrodes. A controller selectively varies the electrical bias signals concurrent with the scanning of the ion beam and/or workpiece through the ion beam based on a desired ion beam energy at the workpiece. A waveform generator can provide the variation and synchronize the electrical bias signals supplied to the acceleration/deceleration stage, bend electrode and/or energy filter.

公开(公告)号：US20250157821A1

公开(公告)日：2025-05-15

申请号：US18948701

申请日：2024-11-15

Applicant: Axcelis Technologies, Inc.

Inventor： Sean Jones ,  Atul Gupta

IPC: H01L21/265 ,  H01J37/304 ,  H01J37/317 ,  H01L21/302 ,  H01L21/687

Abstract: A method for controlling workpiece deformation presents a first side of a first workpiece having an initial planarity to a first ion beam. The first ion beam deforms the first workpiece to define a first deformation of the first workpiece. A second side of the first workpiece is presented to a second ion beam to define a second deformation of the first workpiece that generally counteracts the first deformation of the first workpiece to define a final planarity of the first workpiece. The first workpiece can be a donor workpiece that is annealed after being presented to the second ion beam to define a split layer on one or more of the first and second sides of the donor workpiece. A receiver workpiece is bonded to the donor workpiece and is split from the donor workpiece to define an engineered substrate.