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公开(公告)号:JPH0525232A
公开(公告)日:1993-02-02
申请号:JP645992
申请日:1992-01-17
Applicant: BASF AG
Inventor: HAARARUTO RAUKE , TOOMASU RERUTSUAA , AKUSERU ZANAA , YOOAHIMU ROOZAA
IPC: C08F2/40 , C08F2/38 , C08F230/02 , C08F265/06 , C08F290/00 , C08F290/12 , C08F299/00 , C09D4/02 , G03F7/028 , G03F7/033 , G03F7/038
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公开(公告)号:JPH0647789A
公开(公告)日:1994-02-22
申请号:JP33135292
申请日:1992-12-11
Applicant: BASF AG
Inventor: GEERUHARUTO BURETSUKUMAN , TOOMASU RERUTSUAA , TOOMASU TERUZAA
IPC: B29B7/48 , B05D1/26 , B05D7/00 , B29C47/06 , B29C47/10 , B29C47/40 , B29C48/74 , G03F7/027 , G03F7/028 , G03F7/16 , G03F7/18
Abstract: PURPOSE: To continuously produce a multilayered photosensitive recording element by a simple and economical method by melting components to be used in the production of the individual layers of a photopolymerizable recording layer in one screw extruder to mix them. CONSTITUTION: A component mixture comprising components (a), (b) is degassed at a degassing position and, next, about 5% of the component mixture is taken out of an extruder in front of a re-supply member 4. This partial flow is supplied into a bypass pipe by using a gear pump 5 and the component mixture is supplied to a multilayered nozzle 6 by a static mixer 7. A component (d) is supplied to the component mixture remaining in the extruder and this mixture is degassed in front of a kneading member 8 to be supplied to the multilayered nozzle 6. Individual layers are formed within the multilayered nozzle from mass flows (e), (f) to be mutually bonded. The obtained composite is rolled. By this method, a recording element having a photopolymerizable recording layer consisting of individual layers having different properties can be produced.
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公开(公告)号:JPS6350845A
公开(公告)日:1988-03-03
申请号:JP19058387
申请日:1987-07-31
Applicant: BASF AG
Inventor: HARARUTO RAUKE , BUIRUHERUMU BUEEBAA , RAINHORUTO IYOTSUTO REIRAA , BERUNHARUTO NITSUKU , TOOMASU RERUTSUAA
Abstract: The process produces a sensitized lithographic printing plate from an aluminium base which has been pretreated mechanically, chemically and/or electrochemically in the standard way and anodised, and a photosensitive copying layer applied to said base, a thin hydrophilising layer consisting of a hydrolysate or condensate of at least one silane being applied between said base and copying layer. … These lithographic printing plates are suitable, in particular, for offset printing.
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公开(公告)号:JPS632983A
公开(公告)日:1988-01-07
申请号:JP14815087
申请日:1987-06-16
Applicant: BASF AG
Inventor: UUBUE KEMUPE , TOONI DOTSUKUNAA , HERUMUUTO KAAN , TOOMASU BURIYUUMERU , RAINHORUTO YOTSUTO REIRAA , TOOMASU RERUTSUAA
IPC: C07B61/00 , C07D233/54 , C07D233/61 , C07D233/64
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公开(公告)号:JPH04275333A
公开(公告)日:1992-09-30
申请号:JP32565091
申请日:1991-12-10
Applicant: BASF AG
Inventor: YOOAHIMU ROOZAA , YURUGEN MOORU , ARUMIN RANGE , KUNUUTO OPENRENDAA , BUARUTAA DENTSUINGAA , TOOMASU RERUTSUAA
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公开(公告)号:JPS62277364A
公开(公告)日:1987-12-02
申请号:JP6143687
申请日:1987-03-18
Applicant: BASF AG
Inventor: TOOMASU RERUTSUAA , RAINHORUTO IYOTSUTO REIRAA
IPC: C07D235/02 , C08F2/50 , C09D4/00 , C09D5/00 , G03F7/031
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公开(公告)号:JPS6233154A
公开(公告)日:1987-02-13
申请号:JP17791886
申请日:1986-07-30
Applicant: BASF AG
Inventor: HORUSUTO KOTSUHO , TOOMASU RERUTSUAA , ANDOREASU BETSUCHIYAA , GIYUNTAA SHIYURUTSU , RAINHORUTO SHIYUBUARUMU
IPC: C07D213/89 , C07D405/12 , C08F2/48 , C08F2/50 , G03F7/004 , G03F7/025 , G03F7/027 , G03F7/038
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8.
公开(公告)号:JPH0392391A
公开(公告)日:1991-04-17
申请号:JP22545590
申请日:1990-08-29
Applicant: BASF AG
Inventor: HAARARUTO RAUKE , GUREEGORU SHIYUURUMAN , HARUTOMUUTO ZANDEIHI , TOOMASU RERUTSUAA
Abstract: PURPOSE: To make the copying performance of a printing plate unchanged, especially, even after the process to develop an image with an alkaline developing solution for a long time by aftertreating the printing plate with an aqueous solution of a silane hydrolysate and, in addition thereto, an aqueous solution of free fluoride. CONSTITUTION: When treating an aluminum oxide layer with at least, an aqueous solution of one kind of silane hydrolysate and/or a condensate as shown by a formula, the aqueous solution contains at least, one kind of chemical compound of MF or M2 XF6 (M is an alkaline metal and X is Ti, Zr or Si). In a formula I, R and R are each a 1-9C alkyl group or the like; and X is one of the groups represented by a formula II, wherein, R is a hydrogen, a 1-9C alkyl group, a carboxylic acid group or a carboxylic acid anhydride formed by a formula III bonded with the carboxylic acid group and R . R and R are each 1-9C alkyl group or the like; R is a hydrogen or a 1-9C alkyl group; Z is a hydrogen or an alkaline metal; Hal is a chlorine or a bromine; y is 1-4 and: n is 0.1 or 2.
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公开(公告)号:JPS6350855A
公开(公告)日:1988-03-03
申请号:JP20196987
申请日:1987-08-14
Applicant: BASF AG
Inventor: HARARUTO RAUKE , RAINHORUTO IYOTSUTO REIRAA , BERUNHARUTO NITSUKU , TOOMASU RERUTSUAA
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公开(公告)号:JPS62231251A
公开(公告)日:1987-10-09
申请号:JP6446887
申请日:1987-03-20
Applicant: BASF AG
Inventor: TOOMASU RERUTSUAA , RAINHORUTO IYOTSUTO REIRAA
IPC: G03F7/004 , C07D235/02 , G03C1/72 , G03C1/73 , G03F7/105
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