9.
    发明专利
    未知

    公开(公告)号:DE1024743B

    公开(公告)日:1958-02-20

    申请号:DEB0041534

    申请日:1956-08-25

    Applicant: BASF AG

    Abstract: The invention comprises compounds of the formula in which R is an aliphatic, araliphatic or cycloaliphatic radical, and X is hydrogen, ammonium, substituted ammonium or one equivalent of a metal. Suitable radicals R include methyl, isopropyl, benzyl, butyl, cyclohexyl, cycloheptyl and cyclo-octyl. Suitable radicals X include H, NH4, alkyl-ammonium, cycloalkylammonium, e.g. cyclohexyl-ammonium, one equivalent of the mono- or polyvalent metals of Groups Ia to VIIa and VIII of the Periodic System, e.g. Na, K, Ca, Ba, Ce, Fe, Ni or of Groups Ib to IVb, e.g. Ag, Cu, Zn, Hg, Al, Pb; or alkyl-mercury, alkoxyalkyl-mercury, aryl-mercury and halogen-mercury. These compounds may be prepared according to the process of Specification 815,537.ALSO:Fungicidal compositions contain as active ingredients compounds of the formula in which R represents an aliphatic, araliphatic or cycloaliphatic radical and X is hydrogen, ammonium, substituted ammonium or one equivalent of a metal. They may be used in aqueous solution or dispersion, dissolved in oil or as an oily solution emulsified in water, or in the form of preparations capable of being scattered or dusted, in admixture with inert materials such as talc, clay or shale meal; wetting agents, e.g. alkyl or aryl sulphonates, or adhesives based on resins, wood ethers, waxes or the like may be incorporated in the preparations. Suitable radicals R include methyl, isopropyl, benzyl, butyl, cyclohexyl, hydroxymethyl - cyclohexyl, cyano - cyclohexyl, cycloheptyl and cyclooctyl. Suitable radicals X include H, NH4, alkyl-ammonium, cycloalkyl-ammonium, e.g. cyclohexyl-ammonium, one equivalent of the monovalent or polyvalent metals of Groups Ia to VIIa and VIII of the Periodic system, e.g. Na, K, Ca, Ba, Ce, Fe, Ni or of Groups Ib to IVb, e.g. Ag, Cu, Zn, Hg, Al, Pb; or alkyl-mercury, alkoxyalkyl-mercury, aryl-mercury and halogen-mercury. The compounds may be used for the protection against fungi of substrates such as cultivated plants, fruit, paper, textiles, glue, tanning liquors, leather, wood, mechanical wood pulp, synthetic substances or emulsions of synthetic substances, and lacquers. Examples describe the application of compositions containing various compounds of the formula given against specific fungi. Specification 815,537, [Group IV (b)], is referred to.

Patent Agency Ranking