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12 records (took 0.023 seconds)

    1.
    发明专利
    未知

    公开(公告)号：DE59006478D1

    公开(公告)日：1994-08-25

    申请号：DE59006478

    申请日：1990-04-30

    Applicant: BASF AG

    Inventor： HICKEL WERNER DR ,  KNOLL WOLFGANG DR

    IPC: G01N21/21 ,  G01N21/00 ,  G01N21/55 ,  G01N21/552 ,  G01N21/59 ,  G01N21/84

    Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.

    2.
    发明专利
    未知

    公开(公告)号：AT108902T

    公开(公告)日：1994-08-15

    申请号：AT90108208

    申请日：1990-04-30

    Applicant: BASF AG

    Inventor： HICKEL WERNER DR ,  KNOLL WOLFGANG DR

    IPC: G01N21/21 ,  G01N21/00 ,  G01N21/55 ,  G01N21/552 ,  G01N21/59 ,  G01N21/84

    Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.

    3.
    发明专利
    未知

    公开(公告)号：DE3909144A1

    公开(公告)日：1990-09-27

    申请号：DE3909144

    申请日：1989-03-21

    Applicant: BASF AG

    Inventor： HICKEL WERNER DR ,  KNOLL WOLFGANG DR

    IPC: G01B11/06 ,  G01N21/41

    Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.

    4.
    发明专利
    未知

    公开(公告)号：DE3914631A1

    公开(公告)日：1990-11-08

    申请号：DE3914631

    申请日：1989-05-03

    Applicant: BASF AG

    Inventor： HICKEL WERNER DR ,  KNOLL WOLFGANG DR

    IPC: G01N21/21 ,  G01N21/00 ,  G01N21/55 ,  G01N21/552 ,  G01N21/59 ,  G01N21/84

    Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.

    5.
    发明专利
    未知

    公开(公告)号：DE59005573D1

    公开(公告)日：1994-06-09

    申请号：DE59005573

    申请日：1990-03-20

    Applicant: BASF AG

    Inventor： HICKEL WERNER DR ,  KNOLL WOLFGANG DR

    IPC: G01B11/06 ,  G01N21/41

    Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.

    8.
    发明专利
    未知

    公开(公告)号：DE3914377A1

    公开(公告)日：1990-11-08

    申请号：DE3914377

    申请日：1989-04-29

    Applicant: BASF AG

    Inventor： HICKEL WERNER DR ,  KNOLL WOLFGANG DR

    IPC: G02B6/12 ,  G02B5/26 ,  G02B5/30 ,  G02F1/19

    Abstract: The invention relates to a method for optical filtering of polarised light, the polarised light to be filtered impinging on a layer system in which surface plasmons or optical waveguide modes are excited.

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