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公开(公告)号：DE4211693A1
公开(公告)日：1993-10-14
申请号：DE4211693
申请日：1992-04-08
Applicant: BASF AG
Inventor： FUCHS HARALD DR , KNOLL WOLFGANG DR , AUST EMIL DR
IPC: G01N21/21 , G01N21/552 , G01N21/84 , G02F1/19 , G01N21/41
Abstract: The invention relates to a method for examining the physical properties of thin electro-optically active substances. This is performed with the aid of polarised light, by means of which the layer to be examined is irradiated and the reflected light or transmitted light is directed onto an imaging system, the irradiation of the polarised light exciting in the layer to be examined optical fibre modes which in the case of an electrooptically active layer can be modulated with the aid of an applied, likewise modulated electric field.
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公开(公告)号：DE3914631A1
公开(公告)日：1990-11-08
申请号：DE3914631
申请日：1989-05-03
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR
Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.
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公开(公告)号：DE59006478D1
公开(公告)日：1994-08-25
申请号：DE59006478
申请日：1990-04-30
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR
Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.
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公开(公告)号：AT108902T
公开(公告)日：1994-08-15
申请号：AT90108208
申请日：1990-04-30
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR
Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.
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公开(公告)号：DE3909144A1
公开(公告)日：1990-09-27
申请号：DE3909144
申请日：1989-03-21
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR
Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.
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Patent Agency Ranking
公开(公告)号：AT105403T
公开(公告)日：1994-05-15
申请号：AT90105199
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR
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公开(公告)号：DK0388872T3
公开(公告)日：1993-09-27
申请号：DK90105197
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR , ROTHENHAEUSLER BENNO DR
IPC: G01B11/06 , G01B11/30 , G01N21/552 , G01N21/88 , G01N21/55
Abstract: The invention relates to a method for examination of surface structures which differ with respect to refractive index and/or height modulation of the surface, these surface structures being brought into a surface/plasmon field and scanned by means of surface/plasmon microscopy.
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公开(公告)号：DE3909143A1
公开(公告)日：1990-09-27
申请号：DE3909143
申请日：1989-03-21
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR , ROTHENHAEUSLER BENNO DR
IPC: G01B11/06 , G01B11/30 , G01N21/552 , G01N21/88
Abstract: The invention relates to a method for examination of surface structures which differ with respect to refractive index and/or height modulation of the surface, these surface structures being brought into a surface/plasmon field and scanned by means of surface/plasmon microscopy.
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公开(公告)号：DE3906521A1
公开(公告)日：1990-09-13
申请号：DE3906521
申请日：1989-03-02
Applicant: BASF AG
Inventor： FUNHOFF DIRK DR , FUCHS HARALD DR , LICHT ULRIKE DR , SCHREPP WOLFGANG DR , HICKEL WERNER DR , KNOLL WOLFGANG DR , WEGNER GERHARD PROF DR , DUDA GISELA DR
Abstract: The invention relates to a method for reproducing information which is recorded in thin polymer films, information in thin polymer films which have been applied to a metal or semiconductor layer, by means of electromagnetic or particle beams which induce a permanent change in the properties of the polymer films in the irradiated areas, being reproduced by surface plasmons. … …
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公开(公告)号：DE59005573D1
公开(公告)日：1994-06-09
申请号：DE59005573
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER DR , KNOLL WOLFGANG DR
Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.
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