3.
    发明专利
    未知

    公开(公告)号:DE1522470A1

    公开(公告)日:1969-07-31

    申请号:DE1522470

    申请日:1966-09-06

    Applicant: BASF AG

    Abstract: 1,191,177. Photopolymerizable compositions. BADISCHE ANILIN- & SODA-FABRIK A.G. 1 Sept., 1967 [2 Sept., 1966; 6 Sept., 1966], No. 40068/67. Heading C3P. [Also in Division G2] Photopolymerizable mixtures for use in producing printing plates comprise a polyamide, m- or p-xylylene-bis-acrylamide, triethylene glycol diacrylate and, optionally, butanediol monoacrylate, hexamethylene bisacrylamide and maleic anhydride, a photoinitiator, e.g. benzoin methyl ether, and a polymerization inhibitor, e.g. hydroquinone, p-methoxy-phenol or p-t-butyl-cresol.

    6.
    发明专利
    未知

    公开(公告)号:DE1522469A1

    公开(公告)日:1969-07-31

    申请号:DE1522469

    申请日:1966-09-02

    Applicant: BASF AG

    Abstract: 1,191,177. Photopolymerizable compositions. BADISCHE ANILIN- & SODA-FABRIK A.G. 1 Sept., 1967 [2 Sept., 1966; 6 Sept., 1966], No. 40068/67. Heading C3P. [Also in Division G2] Photopolymerizable mixtures for use in producing printing plates comprise a polyamide, m- or p-xylylene-bis-acrylamide, triethylene glycol diacrylate and, optionally, butanediol monoacrylate, hexamethylene bisacrylamide and maleic anhydride, a photoinitiator, e.g. benzoin methyl ether, and a polymerization inhibitor, e.g. hydroquinone, p-methoxy-phenol or p-t-butyl-cresol.

    8.
    发明专利
    未知

    公开(公告)号:DE1447931A1

    公开(公告)日:1968-12-12

    申请号:DE1447931

    申请日:1965-09-08

    Applicant: BASF AG

    Abstract: 1,154,872. Photo-polymerizable materials. BADISHE ANILIN & SODA-FABRIK A. G. Sept. 7, 1966 [Sept. 8, 1965], No. 39967/66. Heading G2C. [Also in Division C3] Printing reliefs are prepared by exposing a plate, film or sheet of a photo-polymerizable composition to the action of actinic light, through a negative or positive image-bearing transparency, and removing in the desired depth the non-polymerized (non exposed) areas by means of a suitable solvent, said photo-polymerizable composition comprising a mixture of 50 - 90% by weight of a soluble linear synthetic polyamide containing as an integral part of the polymer chain recurring amido groups and 10 - 50% by weight of at least one addition polymerizable monomer containing at least two non-conjugated ethylenic double bonds or a mixture of such monomer with a monomer containing only one ethylenic double bond (said monomer or monomers being compatible to the extent of at least 30% by weight of the polyamidemonomer mixture with said polyamide), and 0À05 - 8% by weight of the polyamide/monomer mixture of at least one compatible carboxylic anhydride dispersed in the polyamide - monomer mixture. The compositions may also contain 0À01 - 10% by weight of the polyamide/monomer mixture of a photo-polymerisation initiator. The plate, film or sheet may be attached to a support, e.g. of metal, wood, paper or plastics material. The polyamide is preferably a copolymer of a lactam and/or nylon salt. Suitable poly-unsaturated monomers include alkylene - bis (meth) acrylamides, poly (meth) acrylyl derivatives of polyamines, (meth) acrylate esters of polyhydric alcohols, urethane and urea compounds obtained by reacting a diol mono (meth) acrylate or a mono - (meth) acrylamide with a diisocyanate, and heterocyclic compounds such as 1, 35 - triacryloyl - hexahydrotriazine- 1, 3, 5 and triallyl cyanurate. Suitable monoethylenic monomers include amides of (meth) acrylic, maleic and itaconic acid, styrene, mono- (meth) acrylate esters, N-vinyl-carbazole, N-vinyl pyrrolidone, N-vinyl-imides, vinyl acetate or propionate, dimethyl maleate and N - vinyl caprolactam. The anhydride component may be an aliphatic, cycloaliphatic or aromatic anhydride; polymeric anhydrides may also be used. Initiators which may be used include vicinal dicarbonyl compounds, α-carbonylalcohols, acyloin ethers, azonitriles, and polynuclear quinones. A thermal polymerization inhibitor, e.g. hydroquinone, p-methoxyphenol or di-t-butyl-p-cresol, may also be present. The photo-polymerization process is suitable for relief printing, indirect relief printing, dry offset printing and autotype intaglio printing.

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