公开(公告)号：JPH0511445A

公开(公告)日：1993-01-22

申请号：JP14846891

申请日：1991-06-20

Applicant: BASF AG

Inventor： GEERUHARUTO BAUAA ,  GEERUHARUTO BURETSUKUMAN ,  MANFUREETO TSUYURUGAA ,  KURAUSUUPEETAA IEKERU ,  DEIITORITSUHI HAARAA

IPC: B41M5/28 ,  B41M5/30 ,  B41M5/46 ,  G03F1/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/025 ,  G03F7/027 ,  G03F7/029 ,  G03G13/32 ,  H01L21/027

Abstract: PURPOSE: To provide a photosensitive recording element with which copying is executed simply by uniformly exposing the image mask on a recording layer to chemical rays prior to development. CONSTITUTION: This recording element sensitive to UV band and visible band chemical rays has (A) a dimensionally stable substrate, (B) the negative processing photosensitive recording layer (B1) or the positive processing photosensitive recording layer (B2) and (C) the image mask which is directly placed on the surface of the photosensitive recording layer (B1) or (B2) and forms the relief-like patterns of the coating regions (C1) and non-coating regions (C2) substantially non-transmissible to the chemical rays to be used in either case. The relief-like patterns and the coating regions (C1) of the image mask (C) are composed of the liquid droplets or solid particles transferred onto the surface of the photosensitive recording layer (B1) or (B2).

公开(公告)号：JPS6095432A

公开(公告)日：1985-05-28

申请号：JP18083484

申请日：1984-08-31

Applicant: BASF AG

Inventor： HANSU SHIYUPU ,  ARUBERUTO ERUTSUAA ,  KURAUSUUPEETAA IEKERU ,  RAINHORUTO IYOTSUTO REIRAA

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/26 ,  G03F7/38

公开(公告)号：JPS57180639A

公开(公告)日：1982-11-06

申请号：JP5555582

申请日：1982-04-05

Applicant: BASF AG

Inventor： KURAUSUUPEETAA IEKERU

IPC: B05D3/06 ,  C08F299/08 ,  C08G77/00 ,  C08G77/22 ,  C08J7/04 ,  C08L83/06 ,  C09D4/06 ,  C09D183/04 ,  C09D183/06

Abstract: 1. A curable coating composition based on olefinically unsaturated polysiloxanes, wherein the olefinically unsaturated polysiloxane is a polycondensate of a) from 50 to 95 mole% of an olefinically unsaturated silane of the general formula R**1 -Si(OR**2 )3 where R**1 is vinyl or a C2 -C8 -alkyl acrylate or methacrylate radical bonded to the Si atom via a C-Si bond and R**2 is hydrogen or a saturated hydrocarbon radical of 1 to 4 carbon atoms, b) from 5 to 50 mole% of a saturated silane of the general formula see diagramm : EP0062899,P6,F2 where R**2 has the above meanings and R**3 and R**4 are identical or different and each is a saturated hydrocarbon radical of 1 to 6 carbon atoms or an unsubstituted or C1 -C4 -alkyl-substituted aromatic hydrocarbon radical, and c) 0 to 25 mole% of an epoxide-containing silane with 2 or more hydroxyl or alkoxy groups, with 2 or more hydroxyl or alkoxy groups, with the proviso that the sum of the percentages of a), b) and c) is 100.