公开(公告)号：JPH0511445A

公开(公告)日：1993-01-22

申请号：JP14846891

申请日：1991-06-20

Applicant: BASF AG

Inventor： GEERUHARUTO BAUAA ,  GEERUHARUTO BURETSUKUMAN ,  MANFUREETO TSUYURUGAA ,  KURAUSUUPEETAA IEKERU ,  DEIITORITSUHI HAARAA

IPC: B41M5/28 ,  B41M5/30 ,  B41M5/46 ,  G03F1/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/025 ,  G03F7/027 ,  G03F7/029 ,  G03G13/32 ,  H01L21/027

Abstract: PURPOSE: To provide a photosensitive recording element with which copying is executed simply by uniformly exposing the image mask on a recording layer to chemical rays prior to development. CONSTITUTION: This recording element sensitive to UV band and visible band chemical rays has (A) a dimensionally stable substrate, (B) the negative processing photosensitive recording layer (B1) or the positive processing photosensitive recording layer (B2) and (C) the image mask which is directly placed on the surface of the photosensitive recording layer (B1) or (B2) and forms the relief-like patterns of the coating regions (C1) and non-coating regions (C2) substantially non-transmissible to the chemical rays to be used in either case. The relief-like patterns and the coating regions (C1) of the image mask (C) are composed of the liquid droplets or solid particles transferred onto the surface of the photosensitive recording layer (B1) or (B2).

公开(公告)号：JPH02248408A

公开(公告)日：1990-10-04

申请号：JP4274090

申请日：1990-02-26

Applicant: BASF AG

Inventor： RAINHORUTO IYOTSUTO REIRAA ,  HAARARUTO RAUKE ,  BERUNHARUTO NITSUKU ,  PEETAA SHIYUTOROORIIGURU ,  DEIITORITSUHI HAARAA

IPC: C08F20/34 ,  G03G5/05 ,  G03G5/07 ,  G03G13/26 ,  G03G13/28

公开(公告)号：JPH02265904A

公开(公告)日：1990-10-30

申请号：JP4600890

申请日：1990-02-28

Applicant: BASF AG

Inventor： RAINHORUTO IYOTSUTO REIRAA ,  HAARARUTO RAUKE ,  PEETAA SHIYUTOROORIIGURU ,  DEIITORITSUHI HAARAA

IPC: C08F8/30 ,  C08F20/02 ,  C08F20/34 ,  C08F20/36

公开(公告)号：JPH06194849A

公开(公告)日：1994-07-15

申请号：JP7200493

申请日：1993-03-30

Applicant: BASF AG

Inventor： FURIIDORITSUHI KUROSU ,  TOOMASU FURAI ,  DEIRUKU FUNHOFU ,  KAARU ZUIIMENSUMAIYAA ,  KARUSUTEN CHIIRUSUKE ,  DEIITORITSUHI HAARAA ,  PEETAA SHIYUTOROORIIGURU

IPC: C08L101/00 ,  C09K19/34 ,  C09K19/38 ,  G03G5/00 ,  G03G5/06 ,  G03G5/07 ,  H01L51/30 ,  H01L51/42 ,  H01L31/0344 ,  H01L31/04

Abstract: PURPOSE: To provide an organic photoconductor with liquid crystal property, having higher photoconductivity in a liquid crystal state than in non-liquid crystal state by using a liquid crystal photoconductor having choramitic property. CONSTITUTION: The photoconductor is produced from a low molecular weight or polymer organic compound, having the liquid crystal property with photoconductivity higher in a choramitic (nematic or smectic) state than in the non-liquid crystal state. As the low molecular weight organic compound, thiadiazol, oxyadiazol or a carbazol derivative is suitable. The polymer organic compound is obtained, for example, by converting 1,3,4-thiadiazol, having a terminal hydroxyl group, into an acrylate under a proper condition. The photoconductor preferably contains a sensitizer. The sensitizer is e.g. a perylene tetracarboxylic acid derivative and rhodamine B and astrazone orange are preferred.

公开(公告)号：JPH05201142A

公开(公告)日：1993-08-10

申请号：JP20235892

申请日：1992-07-29

Applicant: BASF AG

Inventor： FURIIDORITSUHI KUROSU ,  TOOMASU FURAI ,  DEIRUKU FUNHOFU ,  KAARU ZUIIMENSUMAIYAA ,  HERUMUUTO RINGUSUDORUFU ,  DEIITORITSUHI HAARAA ,  PEETAA SHIYUTOROORIIGURU

IPC: B41M5/26 ,  B41J2/46 ,  C09K19/02 ,  C09K19/38 ,  G03G5/00 ,  G03G5/06 ,  G03G5/07 ,  H01L51/42

Abstract: PURPOSE: To provide an organic photoconductive material that has liquid crystal properties, and has higher photoconductivity in liquid crystal phases than in non-liquid crystal phases. CONSTITUTION: This photoconductive material is composed of low molecular weight or polymeric organic compounds with liquid crystal properties, where the photoconduction in the discotic phase is higher than in the non-liquid-crystal phases, and the compound is triphenylen or triphenylens.