公开(公告)号：JPH0326384B2

公开(公告)日：1991-04-10

申请号：JP4302982

申请日：1982-03-19

Applicant: BASF AG

Inventor： GEERUHARUTO HOFUMAN ,  FURITSUTSU GURAASAA ,  RAINHORUTO IYOTSUTO REIRAA

IPC: C09B5/62 ,  G03G5/06 ,  G03G5/07 ,  G03G5/14

公开(公告)号：JPH0324664B2

公开(公告)日：1991-04-03

申请号：JP4302682

申请日：1982-03-19

Applicant: BASF AG

Inventor： FURITSUTSU GURAASAA ,  GEERUHARUTO HOFUMAN ,  RAINHORUTO IYOTSUTO REIRAA ,  PEETAA NOIMAN

IPC: C09B5/62 ,  G03G5/06 ,  G03G5/14

公开(公告)号：JPH01188694A

公开(公告)日：1989-07-27

申请号：JP30237288

申请日：1988-12-01

Applicant: BASF AG

Inventor： HAARARUTO RAUKE ,  BERUNHARUTO NITSUKU ,  RAINHORUTO IYOTSUTO REIRAA

IPC: B41N1/08 ,  B41N3/03 ,  C25D11/06 ,  C25D11/18

公开(公告)号：JPS6350845A

公开(公告)日：1988-03-03

申请号：JP19058387

申请日：1987-07-31

Applicant: BASF AG

Inventor： HARARUTO RAUKE ,  BUIRUHERUMU BUEEBAA ,  RAINHORUTO IYOTSUTO REIRAA ,  BERUNHARUTO NITSUKU ,  TOOMASU RERUTSUAA

IPC: B41N1/08 ,  B41N3/03 ,  G03F7/00 ,  G03F7/11

Abstract: The process produces a sensitized lithographic printing plate from an aluminium base which has been pretreated mechanically, chemically and/or electrochemically in the standard way and anodised, and a photosensitive copying layer applied to said base, a thin hydrophilising layer consisting of a hydrolysate or condensate of at least one silane being applied between said base and copying layer. … These lithographic printing plates are suitable, in particular, for offset printing.

公开(公告)号：JPH02292388A

公开(公告)日：1990-12-03

申请号：JP4600790

申请日：1990-02-28

Applicant: BASF AG

Inventor： DEIRUKU FUNHOFU ,  RAINHORUTO IYOTSUTO REIRAA ,  HAAHARUTO RAUKE ,  HERUMUUTO RINGUSUDORUFU ,  RENAATE BUYUSUTEFUERUTO ,  ORAFU KARUTAUSU ,  ERUFURIIDE TSUERUTA

IPC: G02F1/13 ,  C08F20/30 ,  C08G63/187 ,  C08G63/197 ,  C08G63/66 ,  C08G83/00 ,  C08K5/03 ,  C08K5/29 ,  C08K5/32 ,  C08L33/04 ,  C08L33/14 ,  C08L67/00 ,  C08L67/02 ,  C09K19/34 ,  C09K19/38 ,  C09K19/58 ,  G03G5/07

公开(公告)号：JPH02248408A

公开(公告)日：1990-10-04

申请号：JP4274090

申请日：1990-02-26

Applicant: BASF AG

Inventor： RAINHORUTO IYOTSUTO REIRAA ,  HAARARUTO RAUKE ,  BERUNHARUTO NITSUKU ,  PEETAA SHIYUTOROORIIGURU ,  DEIITORITSUHI HAARAA

IPC: C08F20/34 ,  G03G5/05 ,  G03G5/07 ,  G03G13/26 ,  G03G13/28

公开(公告)号：JPH0221576B2

公开(公告)日：1990-05-15

申请号：JP4302482

申请日：1982-03-19

Applicant: BASF AG

Inventor： ARUBUREHITO EKERU ,  HAINTSU AIRINGUSUFUERUTO ,  ARUBERUTO ERUTSUAA ,  FURANTSU FUAIHITOMAIRU ,  GEERUHARUTO HOFUMAN ,  RAINHORUTO IYOTSUTO REIRAA ,  PEETAA NOIMAN

IPC: G03G5/00 ,  C07D209/44 ,  G03G5/06

公开(公告)号：JPS60150048A

公开(公告)日：1985-08-07

申请号：JP24472884

申请日：1984-11-21

Applicant: BASF AG

Inventor： RAINHORUTO IYOTSUTO REIRAA ,  GEERUHARUTO BUEGUNAA ,  MIHIAERU MIYURAA

IPC: G03C1/72 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/26

公开(公告)号：JPS57192958A

公开(公告)日：1982-11-27

申请号：JP4302982

申请日：1982-03-19

Applicant: BASF AG

Inventor： GEERUHARUTO HOFUMAN ,  FURITSUTSU GURAASAA ,  RAINHORUTO IYOTSUTO REIRAA

IPC: C09B5/62 ,  G03G5/06 ,  G03G5/07 ,  G03G5/14

公开(公告)号：JPH0215272A

公开(公告)日：1990-01-18

申请号：JP30044188

申请日：1988-11-28

Applicant: BASF AG

Inventor： MATEIASU DOUSUTO ,  PEETAA NOIMAN ,  RAINHORUTO IYOTSUTO REIRAA

IPC: G03G5/09 ,  C07D209/90 ,  C07D401/00 ,  C07D403/08 ,  C07D405/06 ,  C07D417/00 ,  C07D495/06 ,  C07D519/00 ,  G03G5/06 ,  G03G13/26

Abstract: PURPOSE: To obtain an excellent original picture reproducing characteristic in picture forming exposure by forming a photoconductive layer from a sensitizer as a naphtholactam dye of specified composition and an photoconductor. CONSTITUTION: This electrophotographic recording element consists of a conductive carrier A and at least one photoconductive layer B. The layer B is formed with at least one kind of binder, at least one kind of sensitizer constituting a charge carrier by the exposure of the layer B and selected from a group of naphtholactam dyes shown by formula I and at least one kind of photoconductor for transferring the formed charge carrier. In formula I, R is 1-23C alkyls, 5-7C cycloalkyls, etc., R is a group shown by formula II. In the formulas, R and R are hydrogen, R or an alkane-1-yl-ω-carboxylic acid alkyl ester, Q is 1,4-phenylene, 2-alkyl-1, etc., X is an anion, and (n) is 0, 1/3, 1/2, 2/3, 1, 2 or 3.