公开(公告)号：DE3131766A1

公开(公告)日：1983-02-24

申请号：DE3131766

申请日：1981-08-11

Applicant: BASF AG

Inventor： SCHORNICK GUNNAR DR DIPL CHEM ,  JUN MONG-JON DR DIPL CHEM ,  SANNER AXEL DR DIPL CHEM ,  LEHNER AUGUST ING GRAD ,  LENZ WERNER DR DIPL CHEM ,  RICHTER PETER DR DIPL CHEM ,  ECKELL ALBRECHT DR DIPL CHEM

IPC: G03F7/035 ,  C08F299/06 ,  C08G18/66 ,  C08G18/67 ,  G03F7/027 ,  G03F7/032 ,  G03F7/26 ,  G03F7/10 ,  G03C1/70

公开(公告)号：DE3168165D1

公开(公告)日：1985-02-21

申请号：DE3168165

申请日：1981-09-21

Applicant: BASF AG

Inventor： HOFFMANN GERHARD DR DIPL CHEM ,  KLEUSER DIETER DR DIPL CHEM ,  LENZ WERNER DR DIPL CHEM

IPC: G03F7/09 ,  G03F7/027 ,  G03F7/038 ,  G03F7/11 ,  G03F7/10 ,  G03C1/70

Abstract: Photopolymer relief plates are produced by applying a photopolymerizable relief-forming layer R, which contains a thermal polymerization inhibitor liberating nitrosyl free radicals on ultraviolet irradiation, to a dimensionally stable base which bears an adhesive layer A for the layer R, the layer A containing 0.01 to 10 percent by weight of a compound where R1, R2, R3 and R4 are identical or different and each is alkyl or R5-(O-alkylene)x-, R5 being H or alkyl and x being 1, 2, 3, 4 or 5, and then exposing, and developing, the layer R in a conventional manner.