Patent search ap:("BASF AG") AND inv:"MARUTEIN FUISHIYAA" Page 1

1.

发明专利
PHOTOPOLYMERIZABLE RECORDING MATERIAL AND PHOTORESIST LAYER AND LITHOGRAPHIC PLATE MAINLY COMPOSED OF THE SAME 失效

公开(公告)号：JPH01118833A

公开(公告)日：1989-05-11

申请号：JP12222488

申请日：1988-05-20

Applicant: BASF AG

Inventor： ANDOREASU BETOHIYAA , MARUTEIN FUISHIYAA , RAINHARUTO ARUDAKU , TOOMASU BURIYUUMERU

IPC: G03C1/00 , G03F7/031

Abstract: PURPOSE: To improve contrast and preservability by using an org. salt accompanied with an optionally substd. hetero arom. compd. as a photooxidizing agent, incorporating at least one specified group into the hetero arom. compd. and regulating the max. of the long wavelength absorption band of the org. salt to

2.

发明专利
MANUFACTURE OF 55*2*2*22TRIHALOGENOETHYL**4*44 DIALKYLLTETRAHYDROFURANN22ONE AND IMINIUM SALT THEREOF 失效

公开(公告)号：JPS5651467A

公开(公告)日：1981-05-09

申请号：JP12472780

申请日：1980-09-10

Applicant: BASF AG

Inventor： RUUDORUFU KUROTSUPU , MARUTEIN FUISHIYAA , KURAUSU HARUPURITSUTAA

IPC: C07D307/30 , C07D307/32 , C07D307/33

3.

发明专利
MANUFACTURE OF 55*2*22DIHALOGENOVINYL**4*44 DIALKYLLTETRAHYDROFURANN22ONE AND IMINIUM SALT THEREOF 失效

公开(公告)号：JPS5651466A

公开(公告)日：1981-05-09

申请号：JP12472680

申请日：1980-09-10

Applicant: BASF AG

Inventor： RUUDORUFU KUROTSUPU , MARUTEIN FUISHIYAA , KURAUSU HARUPURITSUTAA

IPC: C07D307/30 , C07D307/32 , C07D307/33

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