公开(公告)号：JPH01120551A

公开(公告)日：1989-05-12

申请号：JP12222588

申请日：1988-05-20

Applicant: BASF AG

Inventor： RAINHARUTO ARUDAKU ,  PEETAA NOIMAN ,  ANDOREASU BETOHIYAA ,  TOOMASU BURIYUUMERU ,  FURIIDORIHI ZAITSU

IPC: G03C1/00 ,  B41N1/14 ,  C07D239/91 ,  G03F7/004 ,  G03F7/031 ,  G03F7/105 ,  G03F7/26

Abstract: PURPOSE: To give a sharp contrast in a short exposure time by incorporating a specified compd. whose max. of the long wavelength absorption band is a specified wavelength or below as a sensitizer into photopolymerizable recording material. CONSTITUTION: A compd. represented by the formula is used as a sensitizer in a photopolymerizable recording material contg. at least one kind of photopolymerizable olefinic unsatd. org. compd., etc. In the formula, R is 1-12C alkyl, cycloalkyl, etc., R is 1-12C alkyl, cycloalkyl, phene-1-6C alkyl, etc., and R is H, 1-12C alkoxy, OH, etc. The max. of the long wavelength absorption band of the compd. represented by the formula is

公开(公告)号：JPS63311243A

公开(公告)日：1988-12-20

申请号：JP11940888

申请日：1988-05-18

Applicant: BASF AG

Inventor： RAINHARUTO ARUDAKU ,  PEETAA NOIMAN ,  ANDOREASU BETOHIYAA ,  TOOMASU BURIYUUMERU ,  FURIIDORIHI ZAITSU

IPC: G03C1/00 ,  G03F7/004 ,  G03F7/031

公开(公告)号：JPH01118833A

公开(公告)日：1989-05-11

申请号：JP12222488

申请日：1988-05-20

Applicant: BASF AG

Inventor： ANDOREASU BETOHIYAA ,  MARUTEIN FUISHIYAA ,  RAINHARUTO ARUDAKU ,  TOOMASU BURIYUUMERU

IPC: G03C1/00 ,  G03F7/031

Abstract: PURPOSE: To improve contrast and preservability by using an org. salt accompanied with an optionally substd. hetero arom. compd. as a photooxidizing agent, incorporating at least one specified group into the hetero arom. compd. and regulating the max. of the long wavelength absorption band of the org. salt to

公开(公告)号：JPS63311246A

公开(公告)日：1988-12-20

申请号：JP11940788

申请日：1988-05-18

Applicant: BASF AG

Inventor： RAINHARUTO ARUDAKU ,  PEETAA NOIMAN ,  ANDOREASU BETOHIYAA ,  TOOMASU BURIYUUMERU ,  FURIIDORIHI ZAITSU ,  FURIIDORIHIIBUIRUHERUMU RAURUF

IPC: G03C1/00 ,  G03C1/73 ,  G03F7/00 ,  G03F7/004 ,  G03F7/031

公开(公告)号：JPH01112237A

公开(公告)日：1989-04-28

申请号：JP11940688

申请日：1988-05-18

Applicant: BASF AG

Inventor： RAINHARUTO ARUDAKU ,  PEETAA NOIMAN ,  ANDOREASU BETOHIYAA ,  TOOMASU BURIYUUMERU ,  FURIIDORIHI ZAITSU

IPC: G03C1/00 ,  G03C1/73 ,  G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/031

Abstract: PURPOSE: To provide a strong color contrast between exposed and unexposed regions and prevent the leaving of a residual layer on a metallic substrate by incorporating a specified compd. as a sensitizer into a recording material. CONSTITUTION: At least, one kind of compd. represented by formula I is incorporated as a sensitizer into a recording material. The max. of the long wavelength absorption band of the compd. is is 1-12C alkyl, 1-12C alkoxy, etc., R is H, 1-12C alkyl, etc., (n) is 1 or 2 and each of R and R is 1-8C alkyl, cycloalkyl, etc. A sharp strong contrast between exposed and unexposed regions is given in a relatively short chemical ray exposure time necessary for a photopolymerizable recording material, satisfactory preservability is ensured and a residual layer is not left on a metallic substrate.

公开(公告)号：JPS6435433A

公开(公告)日：1989-02-06

申请号：JP16277088

申请日：1988-07-01

Applicant: BASF AG

Inventor： RAINHORUTO SHIYUBUARUMU ,  ANDOREASU BETOHIYAA ,  HORUSUTO BINDAA

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: PURPOSE: To improve the photochemical reactivity by forming a photosensitive layer from a mixture of a polymer binder which is insoluble with water and soluble with a water-based alkali solvent and an org. compd. which has an acid decomposing group and can be changed into strong acid by irradiation. CONSTITUTION: The radiation-sensitive mixture is prepared from a polymer binder which is insoluble with water and insoluble with a water-based alkali solvent phenolic resin such as a novolac polymer and an org. compd. having an acid decomposing group which forms strong acid by irradiation such as a compd. having onium salt group and t-butylcarbonate group. The mixture is applied to form a thin film on a base body, and the thin film is heated to remove the residual solvent, exposed for an image and heated again. By this treatment, the exposed part has complete durability against a water-base alkali soln., while durability in the unexposed part decreases. Thus, the obtd. radiation- sensitive compsn. has high photochemical reactivity in a wide sensitivity range.

公开(公告)号：JPS6426550A

公开(公告)日：1989-01-27

申请号：JP16277188

申请日：1988-07-01

Applicant: BASF AG

Inventor： RAINHORUTO SHIYUBUARUMU ,  ANDOREASU BETOHIYAA

IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26