中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

10 records (took 0.021 seconds)

    Polyolefin moulding compsns - contg. cyclopentadienyl metal carbonyls to accelerate decompsn by light
    1.
    发明专利
    Polyolefin moulding compsns - contg. cyclopentadienyl metal carbonyls to accelerate decompsn by light 未知

    公开(公告)号：DE2331773A1

    公开(公告)日：1975-01-23

    申请号：DE2331773

    申请日：1973-06-22

    Applicant: BASF AG

    Inventor： BARZYNSKI HELMUT DIPL CHEM DR ,  SAENGER DIETRICH DIPL CHEM DR

    IPC: C08K5/56 ,  C08L23/00

    Abstract: Polyolefin moulding compsns. contg. (1) a thermoplastic, synthetic, high-polymer polyolefin and (2) 0.01 to 3 wt% (w.r.t. the polyolefin) of >=1 sensitisers of formula: cyclopentadienyl-Mn(CO)3, cyclopentadienyl-Co(CO)2, cyclopentadienyl-V(CO)4, cyclopentadienyl-Cr(CO)3 2, cyclopentadienyl-Mo(CO)3 2, cyclopentadienyl-W(CO)3 2, and/or cyclopentadienyl-Ni(CO)2 2. The high polymer olefins are polymers of e.g. ethylene or propylene from which disposable prods., e.g. packing foil, are produced in large quantities. Such polymers include polyethylene, polypropylene and polybutylene-(1). The polymers may also contain expanding agents for forming foamed prods., lubricating agents, pigments, dyes. The sensitisers may be used singly or as mixts. of >2. These additives may be incorporated into the polyolefin compsns. by conventional methods, e.g. using rolls or extruders. The compsns. can be moulded using conventional appts. The sensitisers accelerate the decompsn. of the polymer prods. under the influence of light without effecting other props. adversely.

    Light-sensitive phenolic resin for resist and printing plate mfr. - contains (ortho)-quinone-diazide-sulphonic ester or amide gps.
    3.
    发明专利
    Light-sensitive phenolic resin for resist and printing plate mfr. - contains (ortho)-quinone-diazide-sulphonic ester or amide gps. 未知

    公开(公告)号：DE2545957A1

    公开(公告)日：1977-04-21

    申请号：DE2545957

    申请日：1975-10-14

    Applicant: BASF AG

    Inventor： WALLBILLICH GUENTER DIPL CHEM ,  SAENGER DIETRICH DIPL CHEM DR ,  BRONSTERT BERND DIPL CHEM DR

    IPC: G03F7/023 ,  G03F7/10

    Abstract: Light-sensitive material for positive-working photoresists and for the prodn. of printing plates is based on a water-insol. polycondensate (I) of phenol(s) with an aldehyde and contains o-quinone-diazide-sulphonyl gps. In addn. to condensed units of phenolic cpd(s). (II), (I) also contains condensed units of phenolic cpd(s). (III) in which the OH or NH2 gps. are (partly) reacted to o-quinone-diazide-sulphonic ester or amide gps. which is strongly absorbing in the 300-400 nm wavelength range and pref. has a molar extinction coefft. epsilon >103 in that range. The material has higher sensitivity and gives faster printing plates than compsns. contg. naphthoquinone-1,2-diazide-5-sulphonic ester. It adheres well to substrates, has good film-forming properties and can be produced easily and cheaply. Pref. (I) has a mol. wt. of 1000-10000 and contains a (III) unit to every 2-15 phenolic units. In an example a light-sensitive phenolic resin was prepd. from a o-quinonediazide-sulphonic diester of 2,2',4,4'-tetrahydroxybenzophenone monoacetate, bisphenol A and HCHO.

    Process and equipment for regenerating aqueous washing-out solutions of water-developable photosensitive recording materials
    5.
    发明专利
    Process and equipment for regenerating aqueous washing-out solutions of water-developable photosensitive recording materials 未知

    公开(公告)号：DE3143106A1

    公开(公告)日：1983-05-11

    申请号：DE3143106

    申请日：1981-10-30

    Applicant: BASF AG

    Inventor： SAENGER DIETRICH DIPL CHEM DR ,  KLINSMANN UWE DIPL CHEM DR

    IPC: B01D61/14 ,  C02F1/44 ,  G03F7/30 ,  G03C11/00 ,  G03D3/06

    Abstract: In a process and device for the regeneration of aqueous washing-out solutions and water-developable photosensitive recording materials, the washing-out solution (2) loaded with washed-out material is continuously purified by ultrafiltration, the filtrate (7) is recycled as washing-out solution to the developing machine (1) for re-use and the concentrate (8) with the washed-out material is added to the washing-out solution (2). The following arrangement can be used for carrying out the process: The overflow branch of the developing machine (1) is connected via an interposed tank (3), a pump (4) and a prefilter (5) to the ultrafiltration unit (6), while the filtrate outlet branch is connected to the developing machine (1) and the concentrate outlet branch is connected to the tank. This process ensures that the environment is not polluted by spent washing-out solution.

    6.
    发明专利
    未知

    公开(公告)号：DE2922746A1

    公开(公告)日：1980-12-11

    申请号：DE2922746

    申请日：1979-06-05

    Applicant: BASF AG

    Inventor： SAENGER DIETRICH DIPL CHEM DR ,  BARZYNSKI HELMUT DIPL CHEM DR

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  G03C1/495

    Abstract: A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.

    Light sensitive material for prepn. of printing plates - contg. polymer with (ortho)-quinone-diazide-sulphonyl side gps.
    7.
    发明专利
    Light sensitive material for prepn. of printing plates - contg. polymer with (ortho)-quinone-diazide-sulphonyl side gps. 未知

    公开(公告)号：DE2545697A1

    公开(公告)日：1977-04-21

    申请号：DE2545697

    申请日：1975-10-11

    Applicant: BASF AG

    Inventor： WALLBILLICH GUENTER DIPL CHEM ,  SAENGER DIETRICH DIPL CHEM DR ,  BRONSTERT BERND DIPL CHEM DR

    IPC: G03F7/023 ,  G03F7/10

    Abstract: The material for positively acting photographic coatings is based on polymes having a -C-C- chain carrying O-quinonediazide-sulphonyl side-gps. These are introduced by means of a cpd. (I) having >2-OH and/or -NH2 gps. which absorbs strongly in the wavelength range of 300-400 nm and pref. has a molar extinction coefft. epsilon >103. (I) is partially converted to an o-quinonediazide sulphonic acid ester and/or amide by reaction of some of the -OH and/or -NH2 gps. The resulting prod. (II) still having >=1 -OH or -NH2 gp. is then combined with the reactive gps. of a polymer. The material has improved light-sensitivity and gives mechanically stable printing plates at an increased rate. In an example a light-sensitive polymer was obtd. by reacting 2,2',4,4'-tetrahydroxybenzophenone and 2,1,5-diazonaphthaquinone-sulphonyl chloride with successive addns. of NEt3, acetic anhydride, NEt3, styrene-maleic anhydride copolymer (5% in acetone) and finally more NEt3.

Patent Agency Ranking