COSMETIC OR DERMATIC SUNSCREEN PREPARATION

    公开(公告)号:JP2001261539A

    公开(公告)日:2001-09-26

    申请号:JP2001040851

    申请日:2001-02-16

    Applicant: BASF AG

    Abstract: PROBLEM TO BE SOLVED: To provide a new type cosmetic or dermatological composition for protecting the skin, having improved stability and good formulation characteristics and also exhibiting good functional characteristics and high sunburn preventive factor. SOLUTION: This composition as the subject sunscreen preparation comprises (A) a copolymer and (B) an inorganic UV filter; wherein the copolymer A is such as to be obtained by (i) free radical solution polymerization of a monomer mixture comprising (a) 0.01-99.99 wt.% of a monomer selected from the group consisting of N-vinylimidazoles and diallylamines, (b) 0.01-99.99 wt.% of a neutral or basic water-soluble monomer, (c) 0-50 wt.% of an unsaturated acid (anhydride), (d) 0-50 wt.% of a free radical-copolymerizable monomer differing from the components (a), (b) and (c), and (e) 0-10 wt.% of a monomer acting as a crosslinking agent and having at least ethylenically unsaturated nonconjugated double bonds, and (ii) partially or wholly quaternizing or protonating the resultant polymer.

    4.
    发明专利
    未知

    公开(公告)号:PT1008586E

    公开(公告)日:2003-12-31

    申请号:PT99122878

    申请日:1999-11-18

    Applicant: BASF AG

    Abstract: New oligomeric 4,4-diarylbutadiene carboxylic acid ester or amide sunscreen compounds. Oligomeric 4,4-diarylbutadiene carboxylic acid esters or amides of formula (I) are new. R1, R2 = H; aliphatic-, cycloaliphatic-, aromatic- or araliphatic- group; or carboxylate, sulfonate or ammonium; R3 = aliphatic, cycloaliphatic, aromatic, araliphatic or heterocyclic group; carbonyl, sulfonyl, phosphonyl, carboxylic acid ester or CN; Y = O or N(R4); R4 = H or aliphatic-, cycloaliphatic-, aromatic-,araliphatic or heterocyclic group; m = 2-10; n = 1-3 X = the residue of a polyol with 2-10 OH groups (corresponding to m). Am Independent claim is included for preparation of (I).

    COSMETIC FORMULATIONS CONTAINING PHOTOSTABLE UV-A FILTERS

    公开(公告)号:CA2234121C

    公开(公告)日:2005-07-05

    申请号:CA2234121

    申请日:1996-10-25

    Applicant: BASF AG

    Abstract: Described are cosmetic preparations containing light-screening agents designed to protect the human epidermis against UV light in the region from 280 to 400 nm. The light-screening agents are contained in a carrier compound suitable for cosmetic purposes together with compounds of the formula (I): (see formula I) where R1 and R2 are identical or different straight-chain or branched aliphatic or cycloaliphatic radicals which are in the para and/or ortho position and have 1 to 18 carbon atoms, R1 may additionally be a hydrogen atom, and n is 1 or 2, and with compounds which absorb in the UV-B region. The above mentioned compounds of the formula I are in amounts which make them active as photostable UV-A filters.

    Use of cyclic enamines as light protection agents

    公开(公告)号:AU778388B2

    公开(公告)日:2004-12-02

    申请号:AU4089900

    申请日:2000-06-16

    Applicant: BASF AG

    Abstract: Use of new and known bicyclic and tricyclic enamines as UV filters in cosmetic and pharmaceutical preparations is new. Also new is their use for the protection of plastics. Use of bicyclic and tricyclic enamines as UV filters in cosmetic and pharmaceutical preparations is new. R and R = CN; alkylcarbonyl; alkoxycarbonyl; aryloxycarbonyl; or optionally substituted aminocarbonyl; R = H; 1-20C alkyl; 3-20C cycloalkyl; or -CH2-CH2-SO3 M ; M = cation; X = -O-; -S-; or -N(R )-; Z' = group of formula (ii) or (iii): R = H; alkyl, cycloalkyl, alkoxy, cycloalkoxy, alkoxycarbonyl, alkyl-NH-CO-, (alkyl)2-NH-CO-, alkyl-NH- or (alkyl)2N- (each with up to 20C); CN; NH2; or SO3 M and more than 1 R can be present. Independent claims are also included for: (1) the use of compounds (I) as light screening agents for the protection of plastics; (2) (I; Z' = (iii); and (3) (I; Z' = (ii); R4 = R40; R1, R2 = R10, R20 respectively) R and R = CN or 2-10C alkoxycarbonyl optionally substituted with -(CH2)n-SO3 M ; R = H; CH3; or -(CH2)n-SO3 M ; R = H; 1-8C alkyl; 1-8C alkoxy; or -SO3 M ; n = 2 or 3; M = H or HN(R )(R )(R ) ; R -R = H lower alkyl optionally substituted with OH; or a metal cation; but at least one -(CH2)n-SO3 M or -SO3 M must be present.

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