公开(公告)号：JPH05144226A

公开(公告)日：1993-06-11

申请号：JP1086092

申请日：1992-01-24

Applicant: BASF MAGNETICS GMBH

Inventor： ROORANTO ROOSU ,  BURUFU MIYUNTSUNAA ,  KURAUSU SHIETORE

IPC: G11B23/087

Abstract: PURPOSE: To surely reduce attraction force based on static electricity by providing an antistatic material on a part or the whole of at least the surface of the inner wall of a cover flap and making the surface resistance value be smaller than a specified value. CONSTITUTION: A front side inner wall 15 provided with hatching for which a metal processing is indicated over the entire surface, an upper side inner wall 16 and side walls 17 and 18 are indicated. Then, since the front side inner wall 15 is arranged almost parallelly to a tape 14 near the tape when the cover flap 13 is closed, it is very advantageous when the front side inner wall 15 is provided with a layer made of the antistatic material for partially or entirely covering the inner wall. Further, the upper side inner wall 16, and the side part inner walls 17 and 18 as well depending on a case, are similarly processed. In this case, by making the resistance value of the surface of the antistatic material be smaller than 10 Ω, the influence of the static electricity is weakened and the damage of the tape or the like is prevented.