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    COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING A PYRAZOLE-TYPE ANTIOXIDANT
    1.
    发明申请
    COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING A PYRAZOLE-TYPE ANTIOXIDANT 审中-公开

    公开(公告)号：WO2023088795A1

    公开(公告)日：2023-05-25

    申请号：PCT/EP2022/081571

    申请日：2022-11-11

    Applicant: BASF SE

    Inventor： FRISCHHUT, Sabine ,  GORGES, Jan Niclas ,  WATANABE, Soichi ,  ARNOLD, Marco

    IPC: C25D3/32 ,  C25D3/60 ,  C25D7/00 ,  C25D7/12 ,  C25D5/02

    Abstract: The present invention provides an aqueous composition comprising tin ions, optionally alloy metal ions, and at least one antioxidant of formula X1a, (X1a) or of formula L1b (X1b) or of formula L1c (X1c) or of formula L1d (X1d) or of formula L1e (X1e) or the tautomeric forms of formulas X1b, X1c, X1d, and X1e, wherein RX1, RX1a are independelty selected from (a) H, and (b) C1 to C6 alkyl, C1 to C6 alkenyl, C5 to C12 aryl, C6 to C15 alkylaryl, C6 to C15 arylalkyl, all of which are unsubstituted or substituted by OH, ORX3, -CO-RX3 - CO-ORX3, -SO2-ORX3, CN, halogen, or a combination thereof, with the proviso that if the antioxidant is of formula X1a then RX1 is not C5 to C12 aryl or C6 to C15 alkylaryl; RX2 is selected from (a) H, OH, ORX3, -CO-RX3 -CO-ORX33, -SO2-ORX3, and (b) C1 to C6 alkyl, C1 to C6 alkenyl, C5 to C12 aryl, C6 to C15 alkylaryl, C6 to C15 arylalkyl, all of which are unsubstituted or substituted by OH, ORX3, -CO-RX3 - CO-ORX3, -SO2-ORX3, CN, halogen, or a combination thereof, wherein in formula X1a at least one of RX2 is OH, with the proviso that if in formula X1a RX1 is t-butyl then RX22 is not C5 to C12 aryl or -CO-RX3; RX3 is H or C1 to C6 alkyl; and n is the number of groups RX2; wherein no further metal ions are present in the composition besides tin ions and at least one of silver, indium, and bismuth ions; and wherein the composition does not comprise any reducing agents besides the compounds of formulas X1a to X1e.

    METHOD FOR MAKING PRECURSORS OF CATHODE ACTIVE MATERIALS FOR LITHIUM ION BATTERIES
    2.
    发明申请
    METHOD FOR MAKING PRECURSORS OF CATHODE ACTIVE MATERIALS FOR LITHIUM ION BATTERIES 审中-公开

    公开(公告)号：WO2023285464A1

    公开(公告)日：2023-01-19

    申请号：PCT/EP2022/069469

    申请日：2022-07-12

    Applicant: BASF SE

    Inventor： BEIERLING, Thorsten ,  FRISCHHUT, Sabine ,  RAULS, Matthias ,  METZGER, Lukas Karl ,  WEIGUNY, Sabine ,  LENNARTZ, Michael ,  BERK, Rafael Benjamin

    IPC: C01G53/00

    Abstract: Process for making a particulate (oxy)hydroxide of TM wherein TM represents a combination of metals, and wherein TM comprises nickel and at least one metal selected from cobalt and aluminum and manganese, wherein said process comprises the steps of: (a) combining an aqueous slurry of metallic nickel and at least one metal selected from aluminum and transition metals other than nickel with an oxidant selected from oxygen and nitrate in a first reaction vessel or in a first group of reaction vessels at a temperature of from 5° to 40°C, (b) transferring aqueous reaction medium from the first reaction vessel to a second reaction vessel, wherein said second reaction vessel contains a slurry of a hydroxide of TM, wherein the pH value in step (b) is higher than in step (a) and the temperature is in the range of from 45° to 80°C, thereby forming and growing particles of hydroxide of TM, (c) removing the particles from step (b) from the liquid by a solid-liquid separation method, and drying the particles, (d) returning liquid phase obtained in step (c) to the first reaction vessel.

    METHOD FOR MAKING PRECURSORS OF CATHODE ACTIVE MATERIALS FOR LITHIUM ION BATTERIES
    3.
    发明申请
    METHOD FOR MAKING PRECURSORS OF CATHODE ACTIVE MATERIALS FOR LITHIUM ION BATTERIES 审中-公开

    公开(公告)号：WO2023046508A1

    公开(公告)日：2023-03-30

    申请号：PCT/EP2022/075233

    申请日：2022-09-12

    Applicant: BASF SE

    Inventor： FRISCHHUT, Sabine ,  BEIERLING, Thorsten ,  METZGER, Lukas Karl ,  RAULS, Matthias ,  DUCHARDT, Marc

    IPC: C01G53/00 ,  C01G53/50 ,  C01P2004/60 ,  C01P2004/61 ,  C01P2006/12

    Abstract: Process for making a particulate (oxy)hydroxide of TM wherein TM represents metals, and wherein TM comprises nickel and at least one metal selected from cobalt and aluminum and manganese, wherein said process comprises the steps of:(a) combining an aqueous slurry of metallic nickel and at least one metal selected from cobalt and manganese and aluminum with an oxidant selected from nitrate and peroxide in a re-action vessel under an atmosphere with less than 100 ppm O2, thereby obtaining an aqueous reaction medium with a pH value in the range of from 7.5 to 12 containing parti-cles,(b) removing the particles from step (a) from the liquid by a solid-liquid separation method, and drying the particles, and (c) returning mother liquor obtained in step (b) to the reaction vessel.

    PROCESS FOR PREPARATION OF CHLORINE FROM HYDROGEN CHLORIDE
    4.
    发明申请
    PROCESS FOR PREPARATION OF CHLORINE FROM HYDROGEN CHLORIDE 审中-公开

    公开(公告)号：WO2021074381A1

    公开(公告)日：2021-04-22

    申请号：PCT/EP2020/079217

    申请日：2020-10-16

    Applicant: BASF SE ,  UNIVERSITY OF CALIFORNIA, OAKLAND

    Inventor： MASSONNE, Klemens ,  DE WINNE, Hendrik ,  MATTKE, Torsten ,  DEHESTANI, Ahmad ,  WEIGUNY, Sabine ,  ZUEND, Stephan ,  MCFARLAND, Eric Wesley ,  TANGEYSH, Behzad ,  SU, Shizhao ,  FRISCHHUT, Sabine

    IPC: C01B7/04

    Abstract: The invention relates to a process for preparation of chlorine from hydrogen chloride comprising circulating a liquid melt comprising copper ions Cun+with n being a number in the range from 1 to 2, alkali cations and chloride ions Cl in a reactor system comprising three bubble lift reactors I, II and III, each comprising a reaction zone i, ii and iii respectively, wherein: • (a) in the reaction zone i of the first bubble lift reactor I, a liquid melt comprising copper ions Cu n+, alkali cations and chloride ions Cl- is contacted with oxygen at a temperature in the range from 395 to 405 °C so that the molar ratio Cu 2+ : Cu + in the liquid melt increases, obtaining a liquid melt having an increased molar ratio Cu 2+ : Cu + • (b) the liquid melt obtained in (a) is circulated to the reaction zone ii in the second bubble lift reactor II, where the liquid melt is contacted with hydrogen chloride at a temperature in the range from 395 to 405 °C so that water is formed, obtaining a liquid melt being enriched in chloride anions (CI-) compared to the liquid melt obtained according to (a); • (c) circulating the liquid melt obtained in (b) to the reaction zone iii in the third bubble lift reactor III, which is operated at a temperature in the range from 420 to 430 °C so that chlorine (Cl 2 ) is formed, wherein Cl 2 is removed from the reaction zone iii and the third bubble lift reactor III respectively in gaseous form, leaving a liquid melt depleted of Cl-compared to the liquid melt obtained according to (b). The invention further relates to a reactor system comprising three bubble lift reactors I, II and III.

    COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING LEVELING AGENT
    7.
    发明申请
    COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING LEVELING AGENT 审中-公开

    公开(公告)号：WO2022129238A1

    公开(公告)日：2022-06-23

    申请号：PCT/EP2021/086006

    申请日：2021-12-15

    Applicant: BASF SE

    Inventor： FRISCHHUT, Sabine ,  WATANABE, Soichi ,  FLUEGEL, Alexander ,  ARNOLD, Marco

    IPC: C25D3/32 ,  C25D3/60 ,  C25D7/00

    Abstract: The present invention provides an aqueous composition comprising tin ions, optionally alloy metal ions selected from silver, indium, and bismuth ions and at least one additive of formula L1a(L1a) or of formula L1b L1b wherein RL1 is, for each group RL1n independently, selected from -F, a linear or branched C1 to C6 alkyl that comprises one or more F substituents in C1 or C2 position;RL2 is a C1 to C6 alkyl, C1 to C6 alkenyl, C5 to C12 aryl, C6 to C15 alkylaryl, C6 to C15 arylalkyl, all of which may be substituted by CN, OH, C1 to C6 alkoxy or halogen, particularly F;RL3 is selected from H, C1 to C6 alkyl, C1 to C6 alkenyl, C1 to C6 alkoxy, halogen, CN, and OH;RL4 is, for each RL4 independently, selected from RL1 and RL3;RL11, RL12, RL13 are independently selected from RL1 and RL3, with the condition that at least one, preferably two, most preferably all of RL11, RL12, RL13 are RL1;XL1 is (a) a divalent saturated, unsaturated group selected from(a) a C3 to C5 alkanediyl group,(b) a C3 to C5 alkenediyl group,or (c) forms, together with the adjacent C=C double bond, a C5 to C12 aromatic ring system; andn is the number of groups RL1 selected from 1, 2 or 3.

    COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM MATERIAL
    8.
    发明申请
    COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM MATERIAL 审中-公开

    公开(公告)号：WO2022043165A1

    公开(公告)日：2022-03-03

    申请号：PCT/EP2021/072975

    申请日：2021-08-18

    Applicant: BASF SE

    Inventor： LOPEZ VILLANUEVA, Francisco Javier ,  KLIPP, Andreas ,  FRISCHHUT, Sabine ,  LO, Chih Hui ,  SHEN, Mary

    IPC: H01L21/306

    Abstract: A composition for selectively etching a layer comprising a silicon germanium alloy (SiGe) in the presence of a a layer comprising silicon, the composition comprising: (a) 5 to 15 % by weight of an oxidizing agent; (b) 5 to 20 % by weight of an etchant comprising a source of fluoride ions; (c) 0.001 to 3 % by weight of a first selectivity enhancer of formula S1(S1) and (d) water, wherein RS1 is selected from XS-OH and YS-(CO)-OHRS2 is selected from (i) RS1, (ii) H, (iii) C1 to C10 alkyl, (iv) C1 to C10 alkenyl, (v) C1 to C10 alkynyl, and (vi) -XS-(O-C2H3RS6)m-ORS6; RS6 is selected from H and C1 to C6 alkyl; XS is selected from a linear or branched C1 to C10 alkanediyl, a linear or branched C2 to C10 alkenediyl, linear or branched C2 to C10 alkynediyl, and -XS1-(O-C2H3R6)m-; YS1 is selected from a chemical bond and X; XS2 is a C1 to C6 alkanediyl;m is an integer of from 1 to 10.

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