Abstract:
The invention relates to scratch-resistant coatings obtainable by radiative curing, by reaction of (meth)acrylates with mercapto groups, to processes for production thereof and to use thereof.
Abstract:
The present invention relates to aqueous polymer-silicon oil hybrid compositions in the form of aqueous dispersions of finely divided polymer-silicon oil hybrid particles which comprise at least one water-insoluble polymer P made of ethylenically unsaturated monomers M, at least one surface-active substance and at least non-polymerizable, non-polar silicon oil. The present invention relates in particular to the use of these compositions as additives in aqueous coating and printing ink compositions.
Abstract:
The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H2C═C(R1)(C(O)ORF−1) (I) wherein R1 is H or methyl; and RF−1 is an organic residue containing a perfluorinated C4-6 alkyl group, a fluorinated alpha-olefin having the following formula (II): H2C═CH(RF−2) (II) wherein RF−2 is an organic residue containing a perfluorinated C4-6 alkyl group, i.e., —(CF2)3-5—CF3 or any mixture thereof.
Abstract:
The invention relates to the use of a composition comprising a C1 to C6 alkanol and a carboxylic acid ester of formula (I) wherein R1 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; R2 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; X21, X22 are independently selected from C1 to C6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C1 to C6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.
Abstract:
The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.
Abstract:
The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH-terminated oligo- or polyalkylene ethers in the presence of an alkanesulfonic acid as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.
Abstract:
The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH— terminated oligo- or polyalkylene ethers in the presence of the tetra-n-C1-C6-alkoxy- titanate as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.
Abstract:
The invention relates to scratch-resistant coatings obtainable by radiative curing, by reaction of (meth)acrylates with mercapto groups, to processes for production thereof and to the use thereof.
Abstract:
The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X—[O—C(O)NH—Y—NH—C(O)—O-M-B]k}n (I). In formula (I), the variables have the following meanings: n is a number in the range from 1 to 40 or 2 to 40, particularly 1 to 10 or 2 to 10 and especially 2 to 5; k is 1 or 2; A is a poly(dimethylsiloxane) block; B is a polymer block constructed of ethylenically unsaturated monomers, which optionally comprises a terminal group different from hydrogen; X is a bivalent or trivalent group having 2 to 20 C atoms, which is saturated or unsaturated and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and halogen; Y is a bivalent hydrocarbon group having 2 to 20 C atoms, which is saturated or unsaturated, and M is a chemical bond or C2-C10 alkylene, which can be interrupted by one or two groups not directly adjacent, selected from among O, C(═O)O, and (C═O)NH and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and phenyl.