公开(公告)号：MY157203A

公开(公告)日：2016-05-13

申请号：MYPI2013000526

申请日：2011-08-25

Applicant: BASF SE

Inventor： SIMON BRAUN ,  ANDREAS KLIPP ,  CORNELIA RÖGER-GÖPFERT ,  CHRISTIAN BITTNER ,  MEICHIN SHEN ,  CHENGWEI LIN

IPC: H01L31/18

Abstract: AN AQUEOUS ACIDIC SOLUTION AND AN AQUEOUS ACIDIC ETCHING SOLUTION SUITABLE FOR TEXTURIZING THE SURFACE OF SINGLE CRYSTAL AND POLYCRYSTAL SILICON SUBSTRATES, - HYDROFLUORIC ACID; - NITRIC ACID; AND - AT LEAST ONE ANIONIC POLYETHER, WHICH IS SURFACE ACTIVE; A METHOD FOR TEXTURIZING THE SURFACE OF SINGLE CRYSTAL AND POLYCRYSTAL SILICON SUBSTRATES COMPRISING THE STEP OF (1) CONTACTING AT LEAST ONE MAJOR SURFACE OF A SUBSTRATE WITH THE SAID AQUEOUS ACIDIC ETCHING SOLUTION; (2) ETCHING THE AT LEAST ONE MAJOR SURFACE OF THE SUBSTRATE FOR A TIME AND AT A TEMPERATURE SUFFICIENT TO OBTAIN A SURFACE TEXTURIZATION CONSISTING OF RECESSES AND PROTRUSIONS; AND (3) REMOVING THE AT LEAST ONE MAJOR SURFACE OF THE SUBSTRATE FROM THE CONTACT WITH THE AQUEOUS ACIDIC ETCHING SOLUTION; AND A METHOD FOR MANUFACTURING PHOTOVOLTAIC CELLS AND SOLAR CELLS USING THE SAID SOLUTION AND THE SAID TEXTURIZING METHOD.