公开(公告)号：US20240052515A1

公开(公告)日：2024-02-15

申请号：US18256972

申请日：2021-12-15

Applicant: BASF SE

Inventor： Sabine FRISCHHUT ,  Soichi WATANABE ,  Alexander FLUEGEL ,  Marco ARNOLD ,  Helen ROTHER-NOEDING ,  Jochen Eckhard WILLERSINN

IPC: C25D3/60

CPC classification number: C25D3/60

Abstract: Disclosed herein is an aqueous composition including tin ions, optionally alloy metal ions selected from the group consisting of silver, indium, and bismuth ions and at least one additive of formula L1a




or of formula L1b

公开(公告)号：US20250011961A1

公开(公告)日：2025-01-09

申请号：US18703738

申请日：2022-11-11

Applicant: BASF SE

Inventor： Sabine FRISCHHUT ,  Jan Niclas GORGES ,  Soichi WATANABE ,  Marco ARNOLD

IPC: C25D3/32

Abstract: Disclosed herein is an aqueous composition including tin ions, optionally alloy metal ions, and at least one antioxidant of formula X1a or of formula L1b or of formula L1c or of formula L1d or of formula L1e or the tautomeric forms of formulas X1b, X1c, X1d, and X1e, where no further metal ions are present in the composition besides tin ions and at least one of silver, indium, and bismuth ions; and where the composition does not include any reducing agents besides the compounds of formulas X1a to X1e.

公开(公告)号：US20230326759A1

公开(公告)日：2023-10-12

申请号：US18042315

申请日：2021-08-18

Applicant: BASF SE

Inventor： Francisco Javier LOPEZ VILLANUEVA ,  Andreas KLIPP ,  Sabine FRISCHHUT ,  Chih Hui LO ,  Mei Chin SHEN

IPC: H01L21/306

CPC classification number: H01L21/30608

Abstract: Disclosed herein is a composition for selectively etching a layer including a silicon germanium alloy (SiGe) in the presence of a layer including silicon, the composition including:



(a) 5 to 15% by weight of an oxidizing agent;
(b) 5 to 20% by weight of an etchant comprising a source of fluoride ions;
(c) 0.001 to 3% by weight of a first selectivity enhancer of formula S1
and
(d) water.

公开(公告)号：US20240425385A1

公开(公告)日：2024-12-26

申请号：US18570726

申请日：2022-07-12

Applicant: BASF SE

Inventor： Thorsten BEIERLING ,  Sabine FRISCHHUT ,  Matthias RAULS ,  Lukas Karl METZGER ,  Sabine WEIGUNY ,  Michael LENNARTZ ,  Rafael Benjamin BERK

IPC: C01G53/00

Abstract: Disclosed herein is a process for making a particulate (oxy)hydroxide of TM, where TM represents a combination of metals and includes nickel and at least one metal selected from cobalt and aluminum and manganese. The process includes: (a) combining an aqueous slurry of metallic nickel and at least one metal selected from aluminum and transition metals other than nickel with an oxidant selected from oxygen and nitrate in a first reaction vessel or in a first group of reaction vessels at a temperature of from 5° to 40° C., (b) transferring aqueous reaction medium from the first reaction vessel to a second reaction vessel, where the second reaction vessel contains a slurry of a hydroxide of TM, (c) removing the particles from step (b) from the liquid by a solid-liquid separation method, and drying the particles, and (d) returning liquid phase obtained in step (c) to the first reaction vessel.

公开(公告)号：US20240351912A1

公开(公告)日：2024-10-24

申请号：US18683954

申请日：2022-09-12

Applicant: BASF SE

Inventor： Sabine FRISCHHUT ,  Thorsten BEIERLING ,  Lukas Karl METZGER ,  Matthias RAULS ,  Marc DUCHARDT

IPC: C01G53/00 ,  C01G53/04 ,  H01M4/02 ,  H01M4/525

CPC classification number: C01G53/42 ,  C01G53/04 ,  C01G53/40 ,  H01M4/525 ,  C01P2002/52 ,  C01P2006/40 ,  H01M2004/028

Abstract: Disclosed herein is a process for making a particulate (oxy)hydroxide of TM, where TM represents metals and includes nickel and at least one metal selected from cobalt and aluminum and manganese. The process includes the steps of:



(a) combining an aqueous slurry of metallic nickel and at least one metal selected from cobalt and manganese and aluminum with an oxidant selected from nitrate and peroxide in a reaction vessel under an atmosphere with less than 100 ppm O2, thereby obtaining an aqueous reaction medium with a pH value in the range of from 7.5 to 12 containing particles,
(b) removing the particles from step (a) from the liquid by a solid-liquid separation method, and drying the particles, and
(c) returning mother liquor obtained in step (b) to the reaction vessel.

公开(公告)号：US20240228279A9

公开(公告)日：2024-07-11

申请号：US17769400

申请日：2020-10-16

Applicant: BASF SE ,  UNIVERSITY OF CALIFORNIA, OAKLAND

Inventor： Klemens MASSONNE ,  Hendrik DE WINNE ,  Torsten MATTKE ,  Ahmad DEHESTANI ,  Sabine WEIGUNY ,  Stephan ZUEND ,  Eric Wesley MCFARLAND ,  Behzad TANGEYSH ,  Shizhao SU ,  Sabine FRISCHHUT

IPC: C01B7/04 ,  B01J10/00 ,  B01J19/02 ,  B01J19/24 ,  B01J27/08

CPC classification number: C01B7/04 ,  B01J10/005 ,  B01J19/02 ,  B01J19/2465 ,  B01J27/08 ,  B01J2219/0263

Abstract: The invention relates to a process for preparation of chlorine from hydrogen chloride comprising circulating a liquid melt comprising copper ions Cun+ with n being a number in the range from 1 to 2, alkali cations and chloride ions Cl in a reactor system comprising three bubble lift reactors I, II and III, each comprising a reaction zone i, ii and iii respectively, wherein: ⋅(a) in the reaction zone i of the first bubble lift reactor I, a liquid melt comprising copper ions Cun+, alkali cations and chloride ions Cl— is contacted with oxygen at a temperature in the range from 395 to 405° C. so that the molar ratio Cun+:Cu+ in the liquid melt increases, obtaining a liquid melt having an increased molar ratio Cun+:Cu+ ⋅(b) the liquid melt obtained in (a) is circulated to the reaction zone ii in the second bubble lift reactor II, where the liquid melt is contacted with hydrogen chloride at a temperature in the range from 395 to 405° C. so that water is formed, obtaining a liquid melt being enriched in chloride anions (CI-) compared to the liquid melt obtained according to (a); ⋅(c) circulating the liquid melt obtained in (b) to the reaction zone iii in the third bubble lift reactor III, which is operated at a temperature in the range from 420 to 430° C. so that chlorine (Cl2) is formed, wherein Cl2 is removed from the reaction zone iii and the third bubble lift reactor III respectively in gaseous form, leaving a liquid melt depleted of Cl-compared to the liquid melt obtained according to (b). The invention further relates to a reactor system comprising three bubble lift reactors I, II and III.

公开(公告)号：US20240132350A1

公开(公告)日：2024-04-25

申请号：US17769400

申请日：2020-10-15

Applicant: BASF SE ,  UNIVERSITY OF CALIFORNIA, OAKLAND

Inventor： Klemens MASSONNE ,  Hendrik DE WINNE ,  Torsten MATTKE ,  Ahmad DEHESTANI ,  Sabine WEIGUNY ,  Stephan ZUEND ,  Eric Wesley MCFARLAND ,  Behzad TANGEYSH ,  Shizhao SU ,  Sabine FRISCHHUT

IPC: C01B7/04 ,  B01J10/00 ,  B01J19/02 ,  B01J19/24 ,  B01J27/08

CPC classification number: C01B7/04 ,  B01J10/005 ,  B01J19/02 ,  B01J19/2465 ,  B01J27/08 ,  B01J2219/0263

Abstract: The invention relates to a process for preparation of chlorine from hydrogen chloride comprising circulating a liquid melt comprising copper ions Cun+ with n being a number in the range from 1 to 2, alkali cations and chloride ions Cl in a reactor system comprising three bubble lift reactors I, II and III, each comprising a reaction zone i, ii and iii respectively, wherein: ⋅(a) in the reaction zone i of the first bubble lift reactor I, a liquid melt comprising copper ions Cun+, alkali cations and chloride ions Cl— is contacted with oxygen at a temperature in the range from 395 to 405° C. so that the molar ratio Cun+:Cu+ in the liquid melt increases, obtaining a liquid melt having an increased molar ratio Cun+:Cu+ ⋅(b) the liquid melt obtained in (a) is circulated to the reaction zone ii in the second bubble lift reactor II, where the liquid melt is contacted with hydrogen chloride at a temperature in the range from 395 to 405° C. so that water is formed, obtaining a liquid melt being enriched in chloride anions (CI-) compared to the liquid melt obtained according to (a); ⋅(c) circulating the liquid melt obtained in (b) to the reaction zone iii in the third bubble lift reactor III, which is operated at a temperature in the range from 420 to 430° C. so that chlorine (Cl2) is formed, wherein Cl2 is removed from the reaction zone iii and the third bubble lift reactor III respectively in gaseous form, leaving a liquid melt depleted of Cl-compared to the liquid melt obtained according to (b). The invention further relates to a reactor system comprising three bubble lift reactors I, II and III.