公开(公告)号：SG173730A1

公开(公告)日：2011-09-29

申请号：SG2011059177

申请日：2010-02-19

Applicant: BREWER SCIENCE INC

Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

公开(公告)号：WO2010096615A3

公开(公告)日：2010-12-09

申请号：PCT/US2010024664

申请日：2010-02-19

Applicant: BREWER SCIENCE INC ,  MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

IPC: G03F7/11 ,  H01L21/027

CPC classification number: G03F7/091

Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomelic units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti- reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

Abstract translation: 提供酸敏敏的显影剂可溶性底部抗反射涂层组合物，以及使用这种组合物和由其形成的微电子结构的方法。 该组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。 该聚合物优选包含具有金刚烷基的重复单体单元。 该组合物还优选包含与聚合物一起分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。 在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。 底部抗反射涂料组合物是可热交联的，但可以在酸存在下解交联以使显影剂可溶。

公开(公告)号：EP2399169A4

公开(公告)日：2012-10-10

申请号：EP10744334

申请日：2010-02-19

Applicant: BREWER SCIENCE INC

Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

IPC: G03F7/11 ,  H01L21/027

CPC classification number: G03F7/091

Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

Abstract translation: 提供了酸敏感的，显影剂可溶的底部抗反射涂层组合物，以及使用这些组合物的方法和由其形成的微电子结构。 组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。 聚合物优选包含具有金刚烷基的重复单体单元。 组合物还优选包含与聚合物分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。 在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。 底部抗反射涂层组合物是可热交联的，但可以在酸的存在下去交联以显影剂可溶。