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    Photoempfindliche Hartmaske für die Mikrolithographie
    2.
    发明专利
    Photoempfindliche Hartmaske für die Mikrolithographie 未知

    公开(公告)号：DE112009000979B4

    公开(公告)日：2014-12-11

    申请号：DE112009000979

    申请日：2009-04-21

    Applicant: BREWER SCIENCE INC

    Inventor： MERCADO RAMIL-MARCELO L ,  XU HAO ,  GUERRERO DOUGLAS J

    IPC: G03F7/20

    Abstract: Verfahren zum Bilden einer mikroelektronischen Struktur, bei dem (a) ein Substrat mit einer Oberfläche bereitgestellt wird, (b) gegebenenfalls eine oder mehrere Zwischenschichten auf der Oberfläche gebildet werden, (c) eine Hartmaskenzusammensetzung angrenzend an die Zwischenschichten, falls vorhanden, oder angrenzend an die Substratoberfläche, falls keine Zwischenschichten vorhanden sind, aufgebracht wird, wobei die Hartmaskenzusammensetzung nichtpolymere Nanopartikel enthält, die in einem Lösungsmittelsystem gelöst oder dispergiert sind, (d) die Hartmaskenzusammensetzung gebacken wird, um eine Hartmaskenschicht zu ergeben, (e) die Hartmaskenschicht Strahlung ausgesetzt wird, um einen bestrahlten Teil der Hartmaske zu erhalten und (f) die Hartmaskenschicht mit einem Entwickler in Kontakt gebracht wird, um so den bestrahlten Teil der Hartmaskenschicht zu entfernen.

    ACID-SENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS
    3.
    发明专利
    ACID-SENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS 未知

    公开(公告)号：SG173730A1

    公开(公告)日：2011-09-29

    申请号：SG2011059177

    申请日：2010-02-19

    Applicant: BREWER SCIENCE INC

    Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

    Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

    PHOTOIMAGEABLE BRANCHED POLYMER
    4.
    发明申请
    PHOTOIMAGEABLE BRANCHED POLYMER 审中-公开
    可光照分支聚合物

    公开(公告)号：WO2009059031A2

    公开(公告)日：2009-05-07

    申请号：PCT/US2008081831

    申请日：2008-10-30

    Applicant: BREWER SCIENCE INC ,  XU HAO ,  MERCADO RAMIL-MARCELO L ,  GUERRERO DOUGLAS J ,  MEADOR JIM D

    Inventor： XU HAO ,  MERCADO RAMIL-MARCELO L ,  GUERRERO DOUGLAS J ,  MEADOR JIM D

    IPC: C08G65/30 ,  C08G65/48 ,  C08J3/28 ,  G03F7/038 ,  G03F7/16

    CPC classification number: G03F7/091 ,  C08L25/18 ,  Y10S430/151

    Abstract: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).

    Abstract translation: 提供了新颖的显影剂可溶的抗反射涂层组合物和使用这些组合物的方法。 该组合物包含与多官能乙烯基醚反应形成支化聚合物或低聚物的多官能酸。 在使用中，将组合物施加到基材上并热交联。 在曝光和曝光后烘烤后，固化的聚合物/低聚物将发生解交联和解聚，使该层溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。

    ACID-SENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS
    6.
    发明申请
    ACID-SENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATINGS 审中-公开
    酸敏感，显影剂可溶底部防反射涂层

    公开(公告)号：WO2010096615A3

    公开(公告)日：2010-12-09

    申请号：PCT/US2010024664

    申请日：2010-02-19

    Applicant: BREWER SCIENCE INC ,  MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

    Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

    IPC: G03F7/11 ,  H01L21/027

    CPC classification number: G03F7/091

    Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomelic units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti- reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

    Abstract translation: 提供酸敏敏的显影剂可溶性底部抗反射涂层组合物，以及使用这种组合物和由其形成的微电子结构的方法。 该组合物优选包含溶解或分散在溶剂体系中的可交联聚合物。 该聚合物优选包含具有金刚烷基的重复单体单元。 该组合物还优选包含与聚合物一起分散或溶解在溶剂体系中的交联剂，例如乙烯基醚交联剂。 在一些实施方案中，组合物还可以包含光酸产生剂（PAG）和/或猝灭剂。 底部抗反射涂料组合物是可热交联的，但可以在酸存在下解交联以使显影剂可溶。

    CURABLE HIGH REFRACTIVE INDEX RESINS FOR OPTOELECTRONIC APPLICATIONS
    7.
    发明申请
    CURABLE HIGH REFRACTIVE INDEX RESINS FOR OPTOELECTRONIC APPLICATIONS 审中-公开
    光电应用的可固化高折射率树脂

    公开(公告)号：WO2006137884A3

    公开(公告)日：2007-06-28

    申请号：PCT/US2005034270

    申请日：2005-09-26

    Applicant: BREWER SCIENCE INC ,  MERCADO RAMIL-MARCELO L ,  MORFORD ROBERT V ,  PLANJE CURTIS ,  PEREZ WILLIE ,  FLAIM TONY D ,  BASS TAYLOR R

    Inventor： MERCADO RAMIL-MARCELO L ,  MORFORD ROBERT V ,  PLANJE CURTIS ,  PEREZ WILLIE ,  FLAIM TONY D ,  BASS TAYLOR R

    IPC: G02B1/00 ,  G02B1/10

    CPC classification number: C08G59/245 ,  C08F283/10 ,  C08G59/226 ,  C08G59/38 ,  C08G65/18 ,  C08L63/00 ,  C08L63/04 ,  H01L51/5262 ,  Y10T428/31511

    Abstract: Novel compositions and methods of using those compositions to form high refractive index coatings are provided. The compositions preferably comprise both a reactive solvent and a high refractive index compound. Preferred reactive solvents include aromatic resins that are functionalized with one or more reactive groups (e.g., epoxides, vinyl ethers, oxetane), while preferred high refractive index compounds include aromatic epoxides, vinyl ethers, oxetanes, phenols, and thiols. An acid or crosslinking catalyst is preferably also included. The inventive compositions are stable under ambient conditions and can be applied to a substrate to form a layer and cured via light and/or heat application. The cured layers have high refractive indices and light transmissions.

    Abstract translation: 提供了使用这些组合物形成高折射率涂层的新型组合物和方法。 组合物优选包含反应性溶剂和高折射率化合物。 优选的反应性溶剂包括用一个或多个反应性基团（例如环氧化物，乙烯基醚，氧杂环丁烷）官能化的芳族树脂，而优选的高折射率化合物包括芳族环氧化物，乙烯基醚，氧杂环丁烷，酚和硫醇。 优选还包括酸或交联催化剂。 本发明的组合物在环境条件下是稳定的，并且可以施加到基底以形成层并通过光和/或热应用固化。 固化层具有高折射率和光透射。

    POLYIMIDES FOR USE AS HIGH REFRACTIVE INDEX, THIN FILM MATERIALS
    9.
    发明申请
    POLYIMIDES FOR USE AS HIGH REFRACTIVE INDEX, THIN FILM MATERIALS 审中-公开
    用作高折射指数的薄膜，薄膜材料

    公开(公告)号：WO2005045475A3

    公开(公告)日：2006-03-09

    申请号：PCT/US2004029564

    申请日：2004-09-07

    Applicant: BREWER SCIENCE INC ,  MERCADO RAMIL-MARCELO L ,  DIMENNA WILLIAM L

    Inventor： MERCADO RAMIL-MARCELO L ,  DIMENNA WILLIAM L

    IPC: C08G73/10 ,  C08K3/00 ,  C08L79/08 ,  G02B20060101 ,  C08K5/07 ,  C08L81/00

    CPC classification number: C08L79/08 ,  C08G73/1042 ,  C08G73/1057 ,  C08G73/1064

    Abstract: New compositions for use as high refractive index layers are provided. The compositions comprise a polyimide dispersed or dissolved in a solvent system. The polyimide can be prepared from commercially available dianhydrides and diamines. Preferred polymer include recurring monomers selected from the group consisting of formula (I) and (II). The inventive compositions can form strong, thin films and have high refractive indices making them useful in a wide range of optical applications.

    Abstract translation: 提供了用作高折射率层的新组合物。 组合物包含分散或溶解在溶剂体系中的聚酰亚胺。 聚酰亚胺可以由市售的二酐和二胺制备。 优选的聚合物包括选自式（I）和（II）的重复单体。 本发明的组合物可以形成强的薄膜并且具有高折射率，使得它们在广泛的光学应用中是有用的。

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