公开(公告)号：AU2003217896A1

公开(公告)日：2003-09-22

申请号：AU2003217896

申请日：2003-03-04

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM ,  LAMB JAMES E

IPC: H01L21/28 ,  B32B3/10 ,  G03C5/00 ,  G03F7/00 ,  G03F7/16 ,  G03F7/40 ,  H01L21/00 ,  H01L21/027 ,  H01L21/312 ,  H01L21/768

公开(公告)号：AT541236T

公开(公告)日：2012-01-15

申请号：AT01905408

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  GUERRERO DOUGLAS ,  SABNIS RAM ,  SPENCER MARY

IPC: G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G03F7/00 ,  G03F7/09 ,  G11B7/24

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mum or smaller) features.

公开(公告)号：AT488784T

公开(公告)日：2010-12-15

申请号：AT03719720

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM ,  SHIH WU-SHENG

IPC: G03F7/30

公开(公告)号：AT479198T

公开(公告)日：2010-09-15

申请号：AT03747615

申请日：2003-04-28

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM

IPC: G03F7/11 ,  H01L21/20 ,  B05D7/24 ,  C09D4/00 ,  C09D165/00 ,  G02B1/11 ,  G03F7/09 ,  G03F7/16 ,  H01L21/027 ,  H01L21/312 ,  H01L21/36

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The PECVD processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof, with assistance of plasma energy, onto the surface of a substrate. The most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：EP1397260A4

公开(公告)日：2006-03-08

申请号：EP01946350

申请日：2001-06-12

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM ,  GUERRERO DOUGLAS J

IPC: G03F7/09 ,  G03F7/11 ,  C08F2/46 ,  C23C14/12 ,  C23C14/28 ,  G02B1/11 ,  H01L21/027

CPC classification number: G02B1/11 ,  G03F7/091 ,  H01L21/0276

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene,2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mu m or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

Abstract translation: 提供了一种将聚合物抗反射涂层应用于基底表面和所得前体结构的改进方法。 广泛地，这些方法包括在衬底表面上的等离子体增强化学气相沉积（PECVD）聚合物。 最优选的起始单体是4-氟苯乙烯，2,3,4,5,6-五氟苯乙烯和烯丙基五氟苯。 PECVD方法包括使单体经受足够的电流和压力，以使单体升华以形成蒸汽，然后通过施加电流将其转化为等离子体状态。 蒸发的单体随后在沉积室中聚合到基底表面上。 本发明的方法可用于在具有超亚微米（0.25μm或更小）特征的大表面基底上提供高保形抗反射涂层。 该方法提供比常规化学气相沉积（CVD）方法更快的沉积速率，是环境友好的并且是经济的。