Organic polymeric antireflective coatings deposited by chemical vapor deposition

    公开(公告)号:AU3329001A

    公开(公告)日:2001-09-03

    申请号:AU3329001

    申请日:2001-02-02

    Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mum or smaller) features.

    4.
    发明专利
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    公开(公告)号:AT541236T

    公开(公告)日:2012-01-15

    申请号:AT01905408

    申请日:2001-02-02

    Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mum or smaller) features.

    ORGANIC POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY CHEMICAL VAPOR DEPOSITION

    公开(公告)号:CA2400157A1

    公开(公告)日:2001-08-30

    申请号:CA2400157

    申请日:2001-02-02

    Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises t wo cyclic moieties joined to one another via a linkage group. The most preferre d monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. Th e CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals whi ch are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflecti ve coatings on large substrate surfaces having super submicron (0.25.mu.m or smaller) features.

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