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    PERMANENT BONDING AND PATTERNING MATERIAL
    1.
    发明申请
    PERMANENT BONDING AND PATTERNING MATERIAL 审中-公开

    公开(公告)号：WO2021026035A1

    公开(公告)日：2021-02-11

    申请号：PCT/US2020/044634

    申请日：2020-07-31

    Applicant: BREWER SCIENCE, INC.

    Inventor： SEJOUBSARI, Reihaneh ,  FLAIM, Tony D. ,  LIU, Xiao

    IPC: C09J201/08 ,  C09J11/00 ,  C08K5/12 ,  C08K5/00 ,  B32B7/12

    Abstract: Methods are disclosed to prepare permanent materials that can be coated onto microelectronic substrates or used for other structural or optical applications. The materials are thermally stable to at least about 300°C, curable using a photo or thermal process, exhibit good chemical resistance (including during metal passivation), and have a lifespan of at least about 5 years, preferably at least about 10 years, in the final device. Advantageously, these materials can also be bonded at room temperature. The materials exhibit no movement or squeeze-out after bonding and adhere to a variety of substrate types.

    LASER ABLATIVE DIELECTRIC MATERIAL
    3.
    发明申请
    LASER ABLATIVE DIELECTRIC MATERIAL 审中-公开
    激光消融介电材料

    公开(公告)号：WO2018013976A1

    公开(公告)日：2018-01-18

    申请号：PCT/US2017/042225

    申请日：2017-07-14

    Applicant: BREWER SCIENCE INC.

    Inventor： MATOS-PEREZ, Cristina R. ,  FLAIM, Tony D. ,  SOUTHARD, Arthur O. ,  KIRCHNER, Lisa M. ,  BLUMENSHINE, Deborah

    IPC: H01L21/02 ,  H01L21/768 ,  H01L21/324

    Abstract: Dielectric materials with optimal mechanical properties for use in laser ablation patterning are proposed. These materials include a polymer selected from the group consisting of polyureas, polyurethane, and polyacylhydrazones. New methods to prepare suitable polyacylhydrazones are also provided. Those methods involve mild conditions and result in a soluble polymer that is stable at room temperature and can be incorporated into formulations that can be coated onto microelectronic substrates. The dielectric materials exhibit high elongation, low CTE, low cure temperature, and leave little to no debris post-ablation.

    Abstract translation: 提出了用于激光烧蚀图案化的具有最佳机械性能的电介质材料。 这些材料包括选自聚脲，聚氨酯和聚酰腙的聚合物。 还提供了制备合适的聚酰腙的新方法。 这些方法涉及温和条件并产生在室温下稳定的可溶性聚合物，并且可以掺入可涂布到微电子基材上的制剂中。 介电材料表现出高伸长率，低CTE，低固化温度以及消融后很少或没有残余物。

    METHOD OF MAKING RADIATION-SENSITIVE SOL-GEL MATERIALS
    4.
    发明申请
    METHOD OF MAKING RADIATION-SENSITIVE SOL-GEL MATERIALS 审中-公开
    制造辐射敏感性溶胶凝胶材料的方法

    公开(公告)号：WO2012142126A2

    公开(公告)日：2012-10-18

    申请号：PCT/US2012/033073

    申请日：2012-04-11

    Applicant: BREWER SCIENCE INC. ,  LIN, Qin ,  WANG, Yubao ,  FLAIM, Tony D.

    Inventor： LIN, Qin ,  WANG, Yubao ,  FLAIM, Tony D.

    IPC: H01L21/027

    CPC classification number: G03F7/075 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/20

    Abstract: Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon. Upon exposure to radiation, the base generator generates a strong base, which crosslinks the sol-gel compound in the compositions to yield a crosslinked layer that is insoluble in developers or solvents. The unexposed portions of the layer can be removed to yield a patterned sol-gel layer. The invention can be used to form patterns from sol-gel materials comprising features having feature sizes of less than about 1 m.

    Abstract translation: 提供了辐射敏感的溶胶 - 凝胶组合物，以及形成微电子结构和如此形成的结构的方法。 组合物包含分散或溶解在溶剂体系中的溶胶 - 凝胶化合物和碱产生剂。 溶胶 - 凝胶化合物包括具有与硅结合的可交联部分的包含硅的重复单体单元。 暴露于辐射后，基底发生器产生强碱，其使组合物中的溶胶 - 凝胶化合物交联，得到不溶于显影剂或溶剂的交联层。 可以除去该层的未曝光部分以产生图案化的溶胶 - 凝胶层。 本发明可以用于形成包含特征尺寸小于约1μm的特征的溶胶 - 凝胶材料的图案。

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