Method and apparatus for thin film quality control
    1.
    发明公开
    Method and apparatus for thin film quality control 审中-公开
    Verfahren und Vorrichtung zurDünnfilmqualitätskontrolle

    公开(公告)号:EP2385362A1

    公开(公告)日:2011-11-09

    申请号:EP10192451.2

    申请日:2010-11-24

    Inventor: Finarov, Moshe

    Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The source forms on the thin film an illuminated line. The light collected from discrete sampled points located on the illuminated line is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor, processed and photovoltaic thin film parameters applicable to the quality control are derived e.g. thin film thickness, index of refraction, extinction coefficient, absorption coefficient, energy gap, conductivity, crystallinity, surface roughness, crystal phase, material composition and photoluminescence spectrum and intensity. Manufacturing equipment parameters influencing the material properties may be changed to provide a uniform thin film layer with pre-defined properties.

    Abstract translation: 获得光电薄膜质量控制,其中薄膜由支撑体支撑并且膜的一部分被多色或单色照明源照射。 源在薄膜上形成一条照明线。 从位于照明线上的离散采样点收集的光通过光学开关转移到光敏传感器。 由采样点反射,传播或散射的光的光谱信号由传感器收集,处理和适用于质量控制的光伏薄膜参数例如被导出。 薄膜厚度,折射率,消光系数,吸收系数,能隙,导电率,结晶度,表面粗糙度,结晶相,材料组成和光致发光光谱和强度。 可以改变影响材料性能的制造设备参数,以提供具有预定特性的均匀薄膜层。

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