Abstract:
PROBLEM TO BE SOLVED: To provide a powder coating composition with reduced glossiness. SOLUTION: The composition suitable for use in a powder coating process comprising a fluidization composition including a powdered polymer composition and a metal oxide as principle components, or a flatting agent including a metal oxide as a principle component is provided. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an ink jet recording medium which is excellent in glossiness, a water-absorbing property, and a fixability of a coloring agent. SOLUTION: The ink jet recording medium comprises a coating composition containing a product which is formed by making a fumed silica particle contact at least one aminoorganosiloxane chosen from 3-aminopropyltrimethoxy silane, N-(2-amino ethyl)-3-aminopropyltrimethoxy silane, (3-trimethoxysilylpropyl)-diethylenetriamine, 3-amino propyltriethoxy silane, N-(2-aminoethyl)-3-aminopropyltriethoxy silane, (3-triethoxysilylpropyl)-diethylenetriamine, or the like on the surface of at least one of a soft base material of poly(ethylene terephthalate) polymer, polyester, polyvinyl chloride, or the like. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a slurry for chemical and mechanical polishing which can polish titanium at far much higher speed than the conventional technique without damage or defect to the product, sustains high polishing speed comparable to that of tungsten and titanium nitride and shows slow polishing speed in silica. SOLUTION: This aqueous slurry for chemical and mechanical polishing contains an oxidizing agent, a polishing agent and a fluoridecontaining additive. In a preferable embodiment, the slurry contains about 0.01-2.0wt.% of the fluoride-containing additive, which is selected from a fluoride-containing acid and a fluoride salt. The fluoride-containing additive is preferably selected from hydrofluoric acid, fluorosilicic acid and fluorotitanic acid and the content of the fluoride-containing acid is about 0.01-0.3wt.% the fluoride salt is selected from ammonium fluoride, potassium fluoride, ammonium hydrogen difluoride and potassium hydrogen difluoride.
Abstract:
A chemical mechanical polishing slurry having a pH in the range 1.5 to 3.0 comprising an oxidizing agent such as ferric nitrate, a fluoride containing additive such as hydrofluoric acid in an amount ranging from 0.01 to 0.3 weight percent and an abrasive consisting of fine metal particles, such as fumed alumina and a method for using the fluoride containing additive chemical mechanical polishing slurry to remove tungsten and titanium from substrates.
Abstract:
A slurry for use in chemical-mechanical polishing of a metal layer comprising high purity fine metal oxide particles uniformly dispersed in a stable aqueous medium.
Abstract:
A chemical mechanical polishing slurry having a pH in the range 1.5 to 3.0 comprising an oxidizing agent such as ferric nitrate, a fluoride containing additive such as hydrofluoric acid in an amount ranging from 0.01 to 0.3 weight percent and an abrasive consisting of fine metal particles, such as fumed alumina and a method for using the fluoride containing additive chemical mechanical polishing slurry to remove tungsten and titanium from substrates.
Abstract:
A composition suitable for use in a powder coating process comprising a powdered polymer composition and a metal oxide based fluidization enhancer, or a metal oxide based flatting agent. 23 claims
Abstract:
A composition suitable for use in a powder coating process comprising a powdered polymer composition and a metal oxide based fluidization enhancer, or a metal oxide based flatting agent.
Abstract:
A composition suitable for use in a powder coating process comprising a powdered polymer composition and a metal oxide based fluidization enhancer, or a metal oxide based flatting agent.