Micro-electro-mechanical-system (mems) mirror device and methods for fabricatingthe same

    公开(公告)号:AU3322801A

    公开(公告)日:2001-08-14

    申请号:AU3322801

    申请日:2001-02-01

    Abstract: A micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same allow for a large range of angular motion for a center mirror component. The large range of angular motion for a center mirror component is dictated simply by a thickness of a substrate used or a thickness of a thick film used in making a support structure to support the center mirror component. The MEMS mirror device and methods for fabricating the same allow a large number mirror devices to be fabricated on a substrate. The MEMS mirror device includes a substrate. Electrodes are formed supported by the substrate. A support structure is formed adjacent to the electrodes. A hinge pattern and a mirror pattern having a center mirror component are formed such that the support structure supports the hinge pattern and mirror pattern. The support structure also supports the hinge pattern and mirror pattern such that a bottom surface of the center mirror component in a stationary non-rotating position is capable of exceeding a height of 50 mum above the electrodes.

    MICRO-ELECTRO-MECHANICAL-SYSTEM (MEMS) MIRROR DEVICE AND METHODS FOR FABRICATING THE SAME
    2.
    发明申请
    MICRO-ELECTRO-MECHANICAL-SYSTEM (MEMS) MIRROR DEVICE AND METHODS FOR FABRICATING THE SAME 审中-公开
    微电子机械系统(MEMS)镜子装置及其制造方法

    公开(公告)号:WO0156919A3

    公开(公告)日:2002-03-28

    申请号:PCT/US0103357

    申请日:2001-02-01

    CPC classification number: B81B3/004 B81B2201/042 G02B26/0841

    Abstract: A micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same allow for a large range of angular motion for a center mirror component. The large range of angular motion for a center mirror component is dictated simply by a thickness of a substrate used or a thickness of a thick film used in making a support structure to support the center mirror component. The MEMS mirror device and methods for fabricating the same allow a large number mirror devices to be fabricated on a substrate. The MEMS mirror device includes a substrate. Electrodes are formed supported by the substrate. A support structure is formed adjacent to the electrodes. A hinge pattern and a mirror pattern having a center mirror component are formed such that the support structure supports the hinge pattern and mirror pattern. The support structure also supports the hinge pattern and mirror pattern such that a bottom surface of the center mirror component in a stationary non-rotating position is capable of exceeding a height of 50 mu m above the electrodes.

    Abstract translation: 微机电系统(MEMS)镜装置及其制造方法允许中心镜部件的大范围的角运动。 用于中心镜部件的大范围的角运动简单地由所使用的基板的厚度或用于制造支撑结构以支撑中心镜部件的厚膜的厚度决定。 MEMS镜装置及其制造方法允许在衬底上制造大量镜装置。 MEMS反射镜装置包括基板。 电极由衬底支撑形成。 在电极附近形成支撑结构。 形成具有中心镜部件的铰链图案和反射镜图案,使得支撑结构支撑铰链图案和反射镜图案。 支撑结构还支撑铰链图案和镜面图案,使得在静止非旋转位置的中心镜部件的底面能够超过电极上方50μm的高度。

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