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公开(公告)号:KR20180054477A
公开(公告)日:2018-05-24
申请号:KR20170150384
申请日:2017-11-13
Applicant: CANON KK
Inventor: CHOI BYUNG JIN , CHERALA ANSHUMAN , MEISSL JOHANNES MARIO
IPC: G03F7/00 , G03F1/66 , G03F7/20 , H01L21/027
CPC classification number: G03F7/0002 , B29C43/021 , B29C43/58 , B29C59/022 , B29C2043/5808
Abstract: 템플릿의제1 활성영역의차원속성을식별하고; 적어도부분적으로제1 활성영역의차원속성에기초하여, 기판의제2 활성영역의원하는배율보정을결정하고; 템플릿, 기판또는양자모두의면외왜곡을결정하고; 템플릿, 기판또는양자모두의면외왜곡을보상하기위해템플릿, 기판또는양자모두에배압을인가하고; 템플릿, 기판또는양자모두의면외왜곡을보상한후에, i) 제1 활성영역의패턴특징부가임프린트레지스트로충전되도록기판에위치결정된임프린트레지스트를템플릿과접촉시키고, ii) 템플릿, 기판또는양자모두에추가배압을인가하며, 추가배압은제2 활성영역이원하는배율보정을나타내도록선택되는방법, 시스템및 장치.
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公开(公告)号:KR20180071970A
公开(公告)日:2018-06-28
申请号:KR20170174767
申请日:2017-12-19
Applicant: CANON KK
Inventor: MEISSL JOHANNES MARIO , CHERALA ANSHUMAN , CHOI BYUNG JIN
CPC classification number: G03F9/7042 , G03F7/0002
Abstract: 임프린트리소그래피템플릿의형상을조정하는방법, 시스템, 및장치이며, 템플릿의제1 측면상에위치된활성영역의형상을식별하는것으로서, 활성영역은패터닝특징부를포함하는, 활성영역의형상을식별하는것; 적응성척의형상과템플릿의제1 측면상에위치된활성영역의형상사이의대응성을결정하는것으로서, 적응성척은템플릿의제2 측면에결합되고, 제2 측면은템플릿의제1 측면에대향하는, 적응성척의형상과활성영역의형상사이의대응성을결정하는것; 및적응성척에결합된작동시스템에의해, 템플릿의제1 측면상에위치된활성영역의타겟형상을얻기위해대응성에기초하여적응성척의형상을조정하는것을포함한다.
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公开(公告)号:SG11201607890SA
公开(公告)日:2016-10-28
申请号:SG11201607890S
申请日:2015-04-07
Applicant: CANON KK
Inventor: CHOI BYUNG-JIN , CHERALA ANSHUMAN , YE ZHENGMAO , LU XIAOMING , LUO KANG , KAWAHARA NOBUTO , MIYAJIMA YOSHIKAZU
IPC: H01L21/027 , B29C59/02
Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.
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