IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD

    公开(公告)号:SG11201607890SA

    公开(公告)日:2016-10-28

    申请号:SG11201607890S

    申请日:2015-04-07

    Applicant: CANON KK

    Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.

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