METHOD AND APPARATUS FOR MEASURING DEVIATION

    公开(公告)号:CA2075253A1

    公开(公告)日:1993-02-06

    申请号:CA2075253

    申请日:1992-08-04

    Applicant: CANON KK

    Abstract: A method for measuring the deviation ( ) between elements (22a,22b,22c) on an object (2) includes the steps of forming at least a first optical element (22a,22b) on the object; forming at least a second optical element (22c) on the object, the first and second optical elements having lens fonctions; projecting light beams onto the first and second optical elements on the object and detecting the incident positions of light beams (B1,B2,B3) travelling from the first and second optical elements, having been subjected to the lens functions of the first and second optical elements, on a predetermined surface; and detecting the deviation between the first and second optical elements on the object from the relationship between the detected incident positions of the light beams.

    2.
    发明专利
    未知

    公开(公告)号:DE69937933T2

    公开(公告)日:2008-05-21

    申请号:DE69937933

    申请日:1999-10-29

    Applicant: CANON KK

    Abstract: A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device, wherein one of divided light beams is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the surface of the object, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

    3.
    发明专利
    未知

    公开(公告)号:DE69129732T2

    公开(公告)日:1998-12-17

    申请号:DE69129732

    申请日:1991-11-29

    Applicant: CANON KK

    Abstract: A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.

    4.
    发明专利
    未知

    公开(公告)号:DE69222382T2

    公开(公告)日:1998-02-05

    申请号:DE69222382

    申请日:1992-07-31

    Applicant: CANON KK

    Abstract: A method for measuring the deviation ( ) between elements (22a,22b,22c) on an object (2) includes the steps of forming at least a first optical element (22a,22b) on the object; forming at least a second optical element (22c) on the object, the first and second optical elements having lens fonctions; projecting light beams onto the first and second optical elements on the object and detecting the incident positions of light beams (B1,B2,B3) travelling from the first and second optical elements, having been subjected to the lens functions of the first and second optical elements, on a predetermined surface; and detecting the deviation between the first and second optical elements on the object from the relationship between the detected incident positions of the light beams.

    8.
    发明专利
    未知

    公开(公告)号:DE69940765D1

    公开(公告)日:2009-06-04

    申请号:DE69940765

    申请日:1999-11-30

    Applicant: CANON KK

    Abstract: An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

    9.
    发明专利
    未知

    公开(公告)号:DE69937933D1

    公开(公告)日:2008-02-21

    申请号:DE69937933

    申请日:1999-10-29

    Applicant: CANON KK

    Abstract: A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device, wherein one of divided light beams is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the surface of the object, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

    10.
    发明专利
    未知

    公开(公告)号:DE69129732D1

    公开(公告)日:1998-08-13

    申请号:DE69129732

    申请日:1991-11-29

    Applicant: CANON KK

    Abstract: A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.

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