公开(公告)号：WO2007123249A3

公开(公告)日：2008-05-22

申请号：PCT/JP2007058898

申请日：2007-04-18

Applicant: CANON KK ,  SUEHIRA NOBUHITO ,  SEKI JUNICHI ,  INA HIDEKI ,  SENTOKU KOICHI

Inventor： SUEHIRA NOBUHITO ,  SEKI JUNICHI ,  INA HIDEKI ,  SENTOKU KOICHI

IPC: G03F9/00 ,  B81C99/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00 ,  G03F9/703 ,  G03F9/7049 ,  G03F9/7088

Abstract: In an alignment method for effecting alignment between two plate-like objects, a first plate-like object provided with a first alignment mark and a second plate-like object provide with a second alignment mark are disposed opposite to each other. A first area and a second area are provided at mutually nonoverlapping positions in an image pickup area for being observed through an image pickup > device. Images of the first and second alignment marks are picked up by the image pickup device from a direction substantially perpendicular to an in-plane direction of the first and second plate-like objects. Alignment control is effected by using first information about a deviation of the first alignment mark from a predetermined position in the first area and second information about a deviation of the second alignment mark from a predetermined position in the second area.

Abstract translation: 在用于实现两个板状物体之间的对准的对准方法中，设置有第一对准标记的第一板状物体和提供有彼此相对设置的第二对准标记的第二板状物体。 第一区域和第二区域设置在图像拾取区域中的相互非重叠位置处，以通过图像拾取装置观察。 第一和第二对准标记的图像由图像拾取装置从基本上垂直于第一和第二板状物体的面内方向的方向拾取。 通过使用关于第一对准标记与第一区域中的预定位置的偏差的第一信息和关于第二对准标记与第二区域中的预定位置的偏差的第二信息来实现对准控制。

公开(公告)号：WO2007046528B1

公开(公告)日：2007-08-30

申请号：PCT/JP2006321187

申请日：2006-10-18

Applicant: CANON KK ,  SUEHIRA NOBUHITO ,  SEKI JUNICHI ,  INA HIDEKI

Inventor： SUEHIRA NOBUHITO ,  SEKI JUNICHI ,  INA HIDEKI

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B29C35/08 ,  B29C59/16 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G03F9/703 ,  G03F9/7042 ,  G03F9/7065

Abstract: An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

Abstract translation: 一种用于将提供给模具的图案压印到衬底或衬底上的构件上的压印装置包括：光源，用于用光照射与衬底相对设置的模具的表面和衬底的表面; 光学系统，用于将来自光源的光引导至模具的表面和基板的表面，并将来自这些表面的反射光引导至分光器; 分光镜，用于将由光学系统引导的反射光分散为光谱; 以及分析器，用于分析模具表面和基板表面之间的距离。 分析器通过测量模具表面和形成在远离模具表面的位置处的表面之间的距离来计算模具表面与基板表面之间的距离。

公开(公告)号：WO2007046528A3

公开(公告)日：2007-07-19

申请号：PCT/JP2006321187

申请日：2006-10-18

Applicant: CANON KK ,  SUEHIRA NOBUHITO ,  SEKI JUNICHI ,  INA HIDEKI

Inventor： SUEHIRA NOBUHITO ,  SEKI JUNICHI ,  INA HIDEKI

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B29C35/08 ,  B29C59/16 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G03F9/703 ,  G03F9/7042 ,  G03F9/7065

Abstract: An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

Abstract translation: 用于将提供给模具的图案压印到基板或基板上的部件上的印模装置包括用于照射与基板相对设置的模具的表面的光源和具有光的基板的表面; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。 分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

公开(公告)号：AT470889T

公开(公告)日：2010-06-15

申请号：AT02257487

申请日：2002-10-29

Applicant: CANON KK

Inventor： OISHI SATORU ,  INA HIDEKI ,  SUZUKI TAKEHIKO ,  SENTOKU KOICHI

IPC: G02B17/08 ,  G03F9/00 ,  G03F1/22 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light; an optical unit for guiding the alignment light, which has been emitted by the light source, to an alignment mark provided on the reticle and a reference mark provided on a reticle stage that holds the reticle; and detecting unit for detecting the alignment light reflected from the alignment mark and the reference mark, wherein the reticle is aligned on the basis of the result of detection by the detection unit.

公开(公告)号：DE69940765D1

公开(公告)日：2009-06-04

申请号：DE69940765

申请日：1999-11-30

Applicant: CANON KK

Inventor： INA HIDEKI ,  YOSHII MINORU ,  HASEGAWA MASANOBU ,  SATOH TAKASHI

IPC: G03F9/00 ,  H01L21/027

Abstract: An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

公开(公告)号：DE69937933D1

公开(公告)日：2008-02-21

申请号：DE69937933

申请日：1999-10-29

Applicant: CANON KK

Inventor： INA HIDEKI ,  YOSHII MINORU ,  HASEGAWA MASANOBU ,  SATOH TAKASHI

IPC: G03F9/00 ,  H01L21/027 ,  G03F7/20

Abstract: A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device, wherein one of divided light beams is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the surface of the object, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

公开(公告)号：DE3410421C2

公开(公告)日：1995-12-07

申请号：DE3410421

申请日：1984-03-21

Applicant: CANON KK

Inventor： INA HIDEKI ,  SHINKAI HIROSHI

IPC: G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01B11/27 ,  H01L21/68

Abstract: A method and apparatus for aligns two members each having an alignment mark which has mark elements extending in different directions. The marks are scanned with two linear illumination areas which are spaced apart by a predetermined distance and extend in different directions.

公开(公告)号：GB2139753B

公开(公告)日：1987-01-14

申请号：GB8407502

申请日：1984-03-22

Applicant: CANON KK

Inventor： INA HIDEKI ,  SHINKAI HIROSHI

IPC: G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01B11/27 ,  G02B27/17

Abstract: A method and apparatus for aligns two members each having an alignment mark which has mark elements extending in different directions. The marks are scanned with two linear illumination areas which are spaced apart by a predetermined distance and extend in different directions.

公开(公告)号：GB2133874B

公开(公告)日：1986-09-03

申请号：GB8331674

申请日：1983-11-28

Applicant: CANON KK

Inventor： SUZUKI AKIYOSHI ,  INA HIDEKI

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/27

Abstract: An observation apparatus includes a laser beam source for producing a laser beam, a condensing optical system for constituting an optical path to condense the laser beam onto an object, a scanner for repeatedly scanning the object with the laser beam, an observation optical system for allowing an operator to observe the object, a photoreceptor for receiving the laser beam reflected by the object and producing an electric signal, a retractable refracting or diffusing optical element, across the condensing optical path, wherein the beam reflected by the object is detected by the photoreceptor when the object is scanned with the condensed laser beam, and the beam reflected by the object is observed through the observation optical system when the object is scanned with the diffused laser beam.

公开(公告)号：DE69226217D1

公开(公告)日：1998-08-20

申请号：DE69226217

申请日：1992-04-15

Applicant: CANON KK

Inventor： MORI TETSUYA ,  SUZUKI AKIYOSHI ,  INA HIDEKI

IPC: G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30