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公开(公告)号：DE3856054D1
公开(公告)日：1997-12-04
申请号：DE3856054
申请日：1988-02-18
Applicant: CANON KK
Inventor： IKEDA TSUTOMU , WATANABE YUTAKA , SUZUKI MASAYUKI , HAYASHIDA MASAMI , FUKUDA YASUAKI , OGURA SHIGETARO , IIZUKA TAKASHI , NIIBE MASAHITO
Abstract: A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
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公开(公告)号：DE69026056T2
公开(公告)日：1997-01-23
申请号：DE69026056
申请日：1990-12-24
Applicant: CANON KK
Inventor： IIZUKA TAKASHI , WATANABE YUTAKA , FUKUDA YASUAKI
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公开(公告)号：DE3856054T2
公开(公告)日：1998-03-19
申请号：DE3856054
申请日：1988-02-18
Applicant: CANON KK
Inventor： IKEDA TSUTOMU , WATANABE YUTAKA , SUZUKI MASAYUKI , HAYASHIDA MASAMI , FUKUDA YASUAKI , OGURA SHIGETARO , IIZUKA TAKASHI , NIIBE MASAHITO
Abstract: A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
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公开(公告)号：DE69016147D1
公开(公告)日：1995-03-02
申请号：DE69016147
申请日：1990-10-03
Applicant: CANON KK
Inventor： IIZUKA TAKASHI , FUKUDA YASUAKI , HAYASHIDA MASAMI , NIIBE MASAHITO
Abstract: A method and apparatus for removing unclear matter on an optical element (7) used with a radiation beam, is disclosed. A filter (4) is used to introduce light of a desired wavelength into a chamber (6) in which the optical element is accommodated; and a gas (5) supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element (7); and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.
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公开(公告)号：DE69121972T2
公开(公告)日：1997-02-13
申请号：DE69121972
申请日：1991-05-31
Applicant: CANON KK
Inventor： HAYASHIDA MASAMI , WATANABE YUTAKA , NIIBE MASAHITO , IIZUKA TAKASHI , FUKUDA YASUAKI
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Patent Agency Ranking
公开(公告)号：DE69121972D1
公开(公告)日：1996-10-17
申请号：DE69121972
申请日：1991-05-31
Applicant: CANON KK
Inventor： HAYASHIDA MASAMI , WATANABE YUTAKA , NIIBE MASAHITO , IIZUKA TAKASHI , FUKUDA YASUAKI
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公开(公告)号：DE69026056D1
公开(公告)日：1996-04-25
申请号：DE69026056
申请日：1990-12-24
Applicant: CANON KK
Inventor： IIZUKA TAKASHI , WATANABE YUTAKA , FUKUDA YASUAKI
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公开(公告)号：DE69016147T2
公开(公告)日：1995-05-24
申请号：DE69016147
申请日：1990-10-03
Applicant: CANON KK
Inventor： IIZUKA TAKASHI , FUKUDA YASUAKI , HAYASHIDA MASAMI , NIIBE MASAHITO
Abstract: A method and apparatus for removing unclear matter on an optical element (7) used with a radiation beam, is disclosed. A filter (4) is used to introduce light of a desired wavelength into a chamber (6) in which the optical element is accommodated; and a gas (5) supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element (7); and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.
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公开(公告)号：JPH0438500A
公开(公告)日：1992-02-07
申请号：JP14387090
申请日：1990-06-01
Applicant: CANON KK
Inventor： HAYASHIDA MASAMI , WATANABE YUTAKA , NIIBE MASATO , IIZUKA TAKASHI , FUKUDA YOSHIAKI
Abstract: PURPOSE:To improve brightness of a lighting system and to enable highly graded observation of objects image by using a multi-layer membranes reflecting mirror at a part of the lighting system, in the case of observation of the objects which are irradiated by X-ray, with focusing the image thereof on a preset plane. CONSTITUTION:X-ray 1 is focused onto an object 3 surface by a multi-layer membranes convex reflection mirror 2, and, at the same time, is selected to wave length to be used. The X-ray permeating through the object 3 and being confused thereby, comes into a Fresnel ring zones plate 4, and the Fresnel ring zones plate 4 focuses image 6 of the object on a detector 5 surface. Also, a part of wave length of the X-ray reflected by the multi-layer membranes reflecting mirror 2, and a part of wave length of the X-ray diffracted by the Fresnel ring zones plate 4, are made to correspond each other. Consequently, a device having a large area, can be easily manufactured, and wave length resolution thereof is not so higher than required, and also a more brighter lighting system having more higher reflectivity, can be easily obtained.
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公开(公告)号：JPH03202802A
公开(公告)日：1991-09-04
申请号：JP34484289
申请日：1989-12-28
Applicant: CANON KK
Inventor： IIZUKA TAKASHI , WATANABE YUTAKA , FUKUDA YOSHIAKI
Abstract: PURPOSE:To obtain diffused light having a less wavelength distribution by continuously changing the period of the multilayered structure films on a substrate in the horizontal direction of the substrate and oscillating a reflecting mirror. CONSTITUTION:The period of the multilayered structure film 2 of the substrate 3 on the reflecting mirror 4 changes continuously in the horizontal direction and the thicknesses of the respective layers in the films increase continuously from the incident side toward the exit side of the radiant light 1. Such film formation is obtd. by controlling the shutter provided on the substrate side with time. The reflecting mirror 4 is oscillated in an arc shape around a revolving shaft 13 via a control computer 12, a controller 11, a driver 10, and a driving actuator 9. The diffused light having the less wavelength distribution of
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