公开(公告)号：DE69531568D1

公开(公告)日：2003-10-02

申请号：DE69531568

申请日：1995-06-22

Applicant: CANON KK

Inventor： SAKAI FUMIO ,  YAMADA YUICHI ,  HASEGAWA YASUO ,  UTAMURA SHINJI ,  OUTSUKA KAZUHITO ,  TAKAHASHI KAZUHIRO ,  NOGAWA HIDEKI

IPC: G03F7/20 ,  G03F7/207 ,  H01L21/027

Abstract: A projection exposure apparatus including a projection optical system (4) for projecting a pattern of a reticle (2) onto a substrate (5), an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device (21,22) for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

公开(公告)号：SG40012A1

公开(公告)日：1997-06-14

申请号：SG1995000723

申请日：1995-06-23

Applicant: CANON KK

Inventor： SAKAI FUMIO ,  NOGAWA HIDEKI ,  TAKAHASHI KAZUHIRO ,  OUTSUKA KAZUHITO ,  UTAMURA SHINJI ,  HASEGAWA YASUO ,  YAMADA YUICHI

IPC: G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  G03B27/53 ,  H01L21/30

Abstract: A projection exposure apparatus including a projection optical system (4) for projecting a pattern of a reticle (2) onto a substrate (5), an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device (21,22) for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

公开(公告)号：DE60136311D1

公开(公告)日：2008-12-11

申请号：DE60136311

申请日：2001-06-22

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  NOGAWA HIDEKI

IPC: G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/68 ,  H02K41/02 ,  H02K41/03

Abstract: Disclosed is a moving mechanism which includes a reference structure having a guide surface (6), a movable portion (3) being movable along the guide surface, and an actuator (8) having a movable element (2) disposed at the movable portion side and at least two stators (1,1'), the stators being separated from each other and being moved by a reaction force produced as the movable portion is driven.

公开(公告)号：DE69531568T2

公开(公告)日：2004-06-17

申请号：DE69531568

申请日：1995-06-22

Applicant: CANON KK

Inventor： SAKAI FUMIO ,  YAMADA YUICHI ,  HASEGAWA YASUO ,  UTAMURA SHINJI ,  OUTSUKA KAZUHITO ,  TAKAHASHI KAZUHIRO ,  NOGAWA HIDEKI

IPC: G03F7/20 ,  G03F7/207 ,  H01L21/027

Abstract: A projection exposure apparatus including a projection optical system (4) for projecting a pattern of a reticle (2) onto a substrate (5), an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device (21,22) for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

公开(公告)号：JP2002203773A

公开(公告)日：2002-07-19

申请号：JP2000401764

申请日：2000-12-28

Applicant: CANON KK

Inventor： FUJITA ITARU ,  NOGAWA HIDEKI ,  TAKABAYASHI YUKIO ,  TSUKAMOTO IZUMI

IPC: G03F7/22 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an aligner or the like wherein overlay precision can be improved by accurately calculating nonlinear shift of an alignment mark and an exposure shot which are caused by distortion in a substrate surface direction of chucking of a substrate like a wafer, and performing position correction. SOLUTION: This aligner is provided with an alignment detector 9 for detecting a position of an alignment mark formed on a part of sample shot out of a plurality of exposure shots, a storage part 16 or the like as a means for holding a hysteresis value of inclination difference between an alignment mark neighboring surface and a reference surface to be exposed when an alignment mark 6a is exposed and formed, a stage driving control system 11 as a means which corrects a measured value of a position of the alignment mark 6a by using difference between an inclination difference value and the hysteresis value of inclination difference, before position presumption of all exposure shots, a synchronous control system 12, a focus measuring system 13, etc.

公开(公告)号：JP2001060617A

公开(公告)日：2001-03-06

申请号：JP23359199

申请日：1999-08-20

Applicant: CANON KK

Inventor： NOGAWA HIDEKI ,  TAKABAYASHI YUKIO ,  FUJITA ITARU ,  TSUKAMOTO IZUMI

IPC: H01L21/683 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To reduce deterioration of the plurality of the surfaces of a substrate and the distor tion of the substrate, due to a deformation of the surface of the substrate, which is generated when the substrate, such as a wafer, is suction held using a plurality of protruding parts, to contrive to enable adsorptive holding of the substrate in an optimum state and to contrive the enhancement of the accuracy of the overlay of the substrate on a substrate suction holding device. SOLUTION: An array pitch La between central protruding parts 10 supporting the central part of a substrate 2, the adsorptivity Pa of the protruding parts 10 to the substrate, the array pitch Lb between outer peripheral protruding parts 13 supporting the outer peripheral part of the substrate 2 and central protruding parts 14 adjacent to each other on the insides of the protruding parts 13, and the suction force Pb of the substrate at the outer peripheral protruding parts 13 are set, so that when the allowable value of the distortion of the substrate 2, the longitudinal elastic coefficient of the substrate, the thickness of the substrate, a correction factor due to the array of the protruding parts and a neutral plane correction factor are respectively assumed to be dxdy, E, (h), (c) and (k), the la, the Pa, the Lb and the Pb respectively satisfy the relational expressions of Pa.La3

公开(公告)号：JPH0817900A

公开(公告)日：1996-01-19

申请号：JP17208594

申请日：1994-06-30

Applicant: CANON KK

Inventor： TAKABAYASHI YUKIO ,  NOGAWA HIDEKI ,  KOSUGI MASAO

IPC: B23Q1/00 ,  B23Q1/34 ,  B23Q1/44 ,  H01L21/027 ,  H01L21/68

Abstract: PURPOSE:To obtain a reticle stage that is light-weighed, has high precision and is excellent in stability. CONSTITUTION:Positioning in a Y-axis direction of a reticle holding board 2 holding a reticle R1 on an upper surface and a rotation angle theta round a Z-axis are decided by Y actuators 6, 7 for driving a left substage 3 and a right substage 4 pivoted at the both ends in a Y-axis direction. Further, positioning in an X-axis direction of the reticle holding board 2 is decided by an X actuator 5 for driving the right substage 4 in an X-axis direction. Drive members 51, 61, 71 of the X actuator 5 and the both Y actuators 6, 7 are guided normal to a driving direction along guide grooves 42, 32, 43 provided in the right and left substages 3, 4.

公开(公告)号：JP2001127145A

公开(公告)日：2001-05-11

申请号：JP2000182463

申请日：2000-06-19

Applicant: CANON KK

Inventor： TSUKAMOTO IZUMI ,  NOGAWA HIDEKI ,  TAKABAYASHI YUKIO ,  FUJITA ITARU

IPC: H01L21/683 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide a method and device for holding substrate with suction and an exposing device by which the influence of the coordinate errors of alignment marks caused by the surface deformation of a substrate which occurs when the substrate is held by suction on the working accuracy of the substrate can be reduced. SOLUTION: On a chuck 1 which holds a substrate 100 with suction, projecting sections 2a supporting the working areas of a substrate on a placing base which supports the substrate 100 are arranged so that a specific positional relation may be established between the sections 2a and the positions of alignment marks 10 and 11 which are used for alignment at the time of working the substrate 100 and the sections 2a, and the marks 10 and 11 may be positioned onto the projection sections 2a or to the central part of the arranged projecting sections 2a. Therefore, the coordinate errors of the marks 10 and 11 caused by the surface deformation of the substrate 100 which occurs when the substrate 100 is held by suction are eliminated or reduced and, accordingly, deterioration in working accuracy of the substrate 100 or registration precision of patterns can be prevented.

公开(公告)号：JP2001077012A

公开(公告)日：2001-03-23

申请号：JP25507199

申请日：1999-09-09

Applicant: CANON KK

Inventor： FUJITA ITARU ,  TAKABAYASHI YUKIO ,  NOGAWA HIDEKI ,  TSUKAMOTO IZUMI

IPC: H01L21/68 ,  G03B27/42 ,  G03F7/22 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To precisely calculate the non-linear shift of an alignment mark and an exposure shot due to the distortion in a substrate face direction, which is generated by the deformation of a substrate surface at the time of substrate chucking, to highly precisely conduct a positional correction and improve the overlay precision. SOLUTION: An AM focus detection system for measuring the nearby face of an alignment mark and the inclination is provided for an alignment detector 9 detecting the alignment mark formed in a wafer 6, and a storage part 16 holding the history value of the inclination of the nearby face of the mark at the time of exposing and forming the alignment mark is also provided. The measurement value of an alignment position is corrected from a difference between the inclination measured by the AM focus detection system 26 and the history value of the inclination stored in the storage part 16, non-linear shift generated by wafer face distribution stress due to the deformation of a wafer surface is precisely calculated, and exposure is executed after the position of non-linear shift is corrected, prior to the estimation of the position of a whole exposure shot based on a measurement result by the alignment detector 9.

公开(公告)号：JPH10149975A

公开(公告)日：1998-06-02

申请号：JP31861696

申请日：1996-11-15

Applicant: CANON KK

Inventor： INOUE MITSURU ,  IWAMOTO KAZUNORI ,  EBINUMA RYUICHI ,  NOGAWA HIDEKI

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To reduce the vibration due to an original plate stage by providing a lens barrel stool provided with a projection optical system and the original plate stage and a base frame which has a plurality of supports and supports the lens barrel stool through dampers positioned on the tops of the supports and coupling the supports of the base frame with each other with coupling, members 53. SOLUTION: A base frame 10 has coupling members 51 which couple the supports 12 of the frame 10 with each other. Each coupling member 51 is constituted of a triangular member 52 which is positioned adjacent to a damper 11 positioned on the top of each support 12 higher than the damper 11 and has such a size and shape that can surround each support 12 and damper 11 and a member 53 which couples the member 52 with the upper end of each support 12 on the outside of the damper 11 on each support 12. In addition, the base frame 10 is supported about 10cm high above a floor 55 so as to secure a space 54 between the bottom of the frame 10 and the floor 55 for returning air when a chamber is air-conditioned with a device positioned in the chamber.