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    2.
    发明专利
    未知

    公开(公告)号：DE69712256D1

    公开(公告)日：2002-06-06

    申请号：DE69712256

    申请日：1997-06-03

    Applicant: CANON KK

    Inventor： INOUE MITSURU ,  EBINUMA RYUICHI ,  IWAMOTO KAZUNORI ,  OSANAI EIJI ,  TAKEISHI HIROAKI

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A scanning exposure apparatus wherein a portion of a pattern of an original is projected on to a substrate through a projection optical system and wherein the original and the substrate are scanningly moved relatively to the projection optical system whereby the pattern of the original is transferred on to the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting system for supporting the base at three positions, through dampers and pillar.

    5.
    发明专利
    未知

    公开(公告)号：DE69207450D1

    公开(公告)日：1996-02-22

    申请号：DE69207450

    申请日：1992-02-24

    Applicant: CANON KK

    Inventor： KORENAGA NOBUSHIGE ,  IWAMOTO KAZUNORI

    IPC: G03F7/20 ,  G05D19/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/677 ,  H01L21/687 ,  F16F15/00 ,  H01L21/00

    Abstract: A supporting device for supporting a member having an inside movable portion, includes a main frame (511) and a supporting reference plate (530) on which the member is to be placed. A plurality of driving mechanisms are disposed between the main frame and the supporting reference plate, each having a high-rigidity displacement providing element (540) and a low-rigidity supporting element (550) with a low damping factor, disposed in series. The supporting device has particular application with an attitude control device for an X-ray exposure apparatus.

    6.
    发明专利
    未知

    公开(公告)号：DE68922798T2

    公开(公告)日：1995-11-16

    申请号：DE68922798

    申请日：1989-07-31

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKAO ,  EBINUMA RYUICHI ,  CHIBA HIROSHI ,  OHKAWA SHINKICHI

    IPC: G03F7/20 ,  G12B5/00

    Abstract: A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container. It is particularly applicable to a SOR-X ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument in hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given a latitude only in the x direction. By this, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

    7.
    发明专利
    未知

    公开(公告)号：DE60136311D1

    公开(公告)日：2008-12-11

    申请号：DE60136311

    申请日：2001-06-22

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  NOGAWA HIDEKI

    IPC: G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/68 ,  H02K41/02 ,  H02K41/03

    Abstract: Disclosed is a moving mechanism which includes a reference structure having a guide surface (6), a movable portion (3) being movable along the guide surface, and an actuator (8) having a movable element (2) disposed at the movable portion side and at least two stators (1,1'), the stators being separated from each other and being moved by a reaction force produced as the movable portion is driven.

    8.
    发明专利
    未知

    公开(公告)号：DE69128207T2

    公开(公告)日：1998-04-16

    申请号：DE69128207

    申请日：1991-03-12

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  EBINUMA RYUICHI

    IPC: G03F7/20 ,  G21K1/02 ,  H01L21/027

    Abstract: A method of manufacture of semiconductor devices wherein a radiation beam is projected from a synchrotron orbit radiation source into an ambience maintained substantially at a vacuum, wherein a first beam which is a portion of the radiation beam is directed to a wafer through a window effective to isolate the ambience to thereby print a circuit pattern on an X-ray sensitive layer on the wafer with the first beam, wherein an opening is formed at least in a portion of a support for supporting the window, wherein a second beam which is another portion of the radiation beam is extracted through the opening, and wherein, by using the second beam, any deviation of the first beam with respect to the wafer is detected and corrected.

    10.
    发明专利
    未知

    公开(公告)号：DE69207450T2

    公开(公告)日：1996-06-13

    申请号：DE69207450

    申请日：1992-02-24

    Applicant: CANON KK

    Inventor： KORENAGA NOBUSHIGE ,  IWAMOTO KAZUNORI

    IPC: G03F7/20 ,  G05D19/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/677 ,  H01L21/687 ,  F16F15/00 ,  H01L21/00

    Abstract: A supporting device for supporting a member having an inside movable portion, includes a main frame (511) and a supporting reference plate (530) on which the member is to be placed. A plurality of driving mechanisms are disposed between the main frame and the supporting reference plate, each having a high-rigidity displacement providing element (540) and a low-rigidity supporting element (550) with a low damping factor, disposed in series. The supporting device has particular application with an attitude control device for an X-ray exposure apparatus.

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