公开(公告)号：DE69127335T2

公开(公告)日：1998-01-15

申请号：DE69127335

申请日：1991-10-01

Applicant: CANON KK

Inventor： UNNO YASUYUKI ,  ORII SEIJI ,  YONEKAWA MASAMI

IPC: G03F7/20 ,  G03F7/207

Abstract: A projection exposure apparatus which images a pattern (26) formed on an original (2) onto a substrate (4) at a predetermined magnification to form a pattern image on the substrate, includes an original support member (25), a substrate support member (5), and a projection lens (3) disposed between these support members for imaging the pattern onto the substrate. In the projection exposure apparatus, a partial deviation of positions of portions of the pattern image from regular positions are obtained in at least one of directions along and perpendicular to a surface of the pattern image, and the partial deviation is eliminated by deforming at least one of the original and the substrate based on the thus obtained result.

公开(公告)号：DE69127335D1

公开(公告)日：1997-09-25

申请号：DE69127335

申请日：1991-10-01

Applicant: CANON KK

Inventor： UNNO YASUYUKI ,  ORII SEIJI ,  YONEKAWA MASAMI

IPC: G03F7/20 ,  G03F7/207

Abstract: A projection exposure apparatus which images a pattern (26) formed on an original (2) onto a substrate (4) at a predetermined magnification to form a pattern image on the substrate, includes an original support member (25), a substrate support member (5), and a projection lens (3) disposed between these support members for imaging the pattern onto the substrate. In the projection exposure apparatus, a partial deviation of positions of portions of the pattern image from regular positions are obtained in at least one of directions along and perpendicular to a surface of the pattern image, and the partial deviation is eliminated by deforming at least one of the original and the substrate based on the thus obtained result.

公开(公告)号：JPH05144700A

公开(公告)日：1993-06-11

申请号：JP33443791

申请日：1991-11-22

Applicant: CANON KK

Inventor： ORII SEIJI ,  UNNO YASUYUKI ,  YONEKAWA MASAMI

IPC: G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To correct fluctuation of optical characteristics due to thermal change caused by the absorption of exposing light, and obtain a projection pattern image of high resolution. CONSTITUTION:When a pattern on the surface of a first object 2 is projected on the surface of a second object 3 and exposed by a projection optical system, at least one tightly closed lens space is formed in the projection optical system by using lens surfaces. While the inside gas pressure of the space is kept nearly equal to the outside gas pressure, the space is filled with mixed gas having at least two kinds of gas different in refractive index. By controlling the mixing ratio of the mixed gas, optical characteristics of the projection optical system is controlled.

公开(公告)号：JPH04142727A

公开(公告)日：1992-05-15

申请号：JP26593590

申请日：1990-10-03

Applicant: CANON KK

Inventor： ORII SEIJI ,  YONEKAWA MASAMI ,  SAKAMOTO EIJI

IPC: G03F7/207 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To air-cool multiple lenses effectively without wakening the lens tube structure by a method wherein the adjacent spaces out of the lens speces formed in a projection optical system are made to communicate with each other to be connected to an airconditioner through the intermediary of a vent hole made in the lens tube. CONSTITUTION:The multiple lenses (L1-L5) of a projection optical system 1 held by respective holding members 1a and press rings 1e are contained in a lens tube 1b forming multiple lens spaces. At this time, at least one opening 1c is formed on a part of the holding member 1a or a part out of the effective regions such as the end parts, etc., of the lenses so as to communicate the two adjacent lens spaces with each other. Furthermore, respective opening parts to be formed in the multiple holding members are juxtaposed around the holding members 1a e.g. at the same intervals. On the other hand, a vent hole 1d is made in a part of the lens tube 1b to be connected to an airconditioner 9 comprising a suction pump, etc. In such a constitution, air is sucked in from a part of the lens spaces so that external air may be zigzag fed to respective lens spaces. Through these procedures, the temperature size due to the heat absorption of exposed light of respective lenses can be avoided.

公开(公告)号：JPH04145442A

公开(公告)日：1992-05-19

申请号：JP26834690

申请日：1990-10-08

Applicant: CANON KK

Inventor： UNNO YASUYUKI ,  ORII SEIJI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To correct the distortion of the geometrical initial shape of a pattern formed on an original plate and the geometrical shape of a pattern image formed on a base plate and to reduce an influence by means of a symmetrical distortion occurs on a projecting lens by deforming the original plate toward the inside of a surface. CONSTITUTION:The geometrical initial shape of the pattern formed on the original plate and the geometrical shape of the pattern image formed on the base plate are deviated due to the symmetrical distortion of the projecting lens 3. However, deforming means 20 - 22 deforming the original plate toward the inside of the surface are controlled, and the original plate is deformed according to a deviation value calculated by a calculating means 11, so that the geometrical shapes of the pattern image and the pattern are in coincidence, data obtained by measuring the relation of the time between the start of symmetrical distortion of the photographing lens 3 and the starting of exposure, in advance, is housed in the calculating means 11. Memory 10 reading out the data when the time is inputted and a timer 15 measuring the time, are provided and the deviation value of the shapes can easily be calculated.

公开(公告)号：JPH0831712A

公开(公告)日：1996-02-02

申请号：JP15850594

申请日：1994-07-11

Applicant: CANON KK

Inventor： ORII SEIJI

IPC: G03F1/00 ,  G03F1/32 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To improve resolving power while ensuring focal depth by forming an optical attenuation pattern having amplitude transmittance within the range of a specific value to a mask and giving phase difference to other sections in the certain section of light passed through a pupil in a projection optical system. CONSTITUTION:An optical attenuation pattern is constituted so that amplitude transmittance is larger than 0% and smaller than 100% and phase difference in odd times as large as pi is not given between light passed through the pattern and light passed through other sections. A reticle 10 is used as a shifter-less halftone mask, and the amplitude transmittance of the section of a design pattern except the attenuation pattern is set in approximately 100% in the mask. The plane of optical incidence is formed in the doughnut shape of a plane in a filter 12a, and the filter 12a is designed so that phase difference at 180 deg. is generated between light passed through a zonal-shaped section and light passed through a circular notched section at a center.

公开(公告)号：JPH04214613A

公开(公告)日：1992-08-05

申请号：JP40987990

申请日：1990-12-12

Applicant: CANON KK

Inventor： YONEKAWA MASAMI ,  ORII SEIJI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To lighten the deterioration of the resolution by the image face curvature of a projecting lens by providing an image face curvature correction system. CONSTITUTION:The image curvature correction system comprises a reflection mirror 41, which is the image face position measuring means which measures the position of each image face of the detection mark being made on a reticle 10 by the exposure light passing through a projecting lens 3, a reflection mirror 41, a light receiver 50, an operating circuit 42, and a second driving circuit 43, which is the driving means for driving the curvature means of a wafer holder 20, according to the position of each image face of the detection mark measured with said image face position measuring means. Hereupon, the reflection mirror 41 is interposed between the projection lens 3 and the wafer 2 at the time of measurement of said image face position, and reflects the exposure light passing through the projecting lens 3 and enters it into a light receiver 50.

公开(公告)号：JPH08179513A

公开(公告)日：1996-07-12

申请号：JP32003994

申请日：1994-12-22

Applicant: CANON KK

Inventor： HAYATA SHIGERU ,  ORII SEIJI

IPC: G03F7/20 ,  H01L21/027

Abstract: PURPOSE: To make it possible to easily and rapidly determine unequal illuminance and to correct the unequal illuminance at need. CONSTITUTION: A real reticle drawn with circuit patterns is inserted into an optical path after the correction of the unequal illuminance is executed in the absent state of the reticle (step 1). The illuminance in a position on a wafer corresponding to a light transparent part for measurement is measured (step 2). Whether the illuminance is uniform or not is decided by a permissible value in an arithmetic section (step 3). This flow is ended in the case of YES and a member for correcting the unequal illuminance is selected and its driving quantity and direction are calculated from the quantitative relation of the illuminance at the respective measurement points in the case of NO (step 4). The member for correcting the unequal illuminance is driven according to the instruction of the arithmetic section and the operation is returned again to the step 2.

公开(公告)号：JPH05144699A

公开(公告)日：1993-06-11

申请号：JP33443691

申请日：1991-11-22

Applicant: CANON KK

Inventor： YONEKAWA MASAMI ,  UNNO YASUYUKI ,  ORII SEIJI

IPC: G02B7/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the change of optical characteristics due to thermal change caused by the absorption of exposing light, and obtain a pattern image of high resolution. CONSTITUTION:When a lens 10 is accommodated in a lens mirror cylinder 12 and held, the lens is retained by using a lens retaining part member 20 whose thermal conductivity is larger than that of the lens mirror cylinder, and the contact region between the lens and the lens retaining part member is filled with material 20a whose thermal conductivity is larger than that of the lens mirror cylinder, thereby holding the lens in the lens mirror cylinder.

公开(公告)号：JPH05144690A

公开(公告)日：1993-06-11

申请号：JP33443591

申请日：1991-11-22

Applicant: CANON KK

Inventor： UNNO YASUYUKI ,  ORII SEIJI ,  YONEKAWA MASAMI

IPC: G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To correct fluctuation of optical characteristics caused by thermal change due to exposure light absorption, and obtain a projection pattern image of high resolution. CONSTITUTION:When a pattern on the surface of a first object 2 is projected on the surface of a second object 3 and exposed by using a projection optical system 1, it is provided with an optical member in which transparent fluidic material is encapsulated, and data concerning thermal change of the optical member are measured with a measuring means 11. An adjusting means adjusts the change of optical characteristics of the projection optical system, on the basis of a signal from the measuring means.