公开(公告)号：SG11201605280UA

公开(公告)日：2016-08-30

申请号：SG11201605280U

申请日：2015-01-20

Applicant: CANON KK

Inventor： SATO KAZUHIRO ,  HASEGAWA NORIYASU ,  MATSUMOTO TAKAHIRO

IPC: H01L21/027 ,  B29C59/02 ,  G03F7/20

Abstract: The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.