ZNO SUBSTRATE FOR SOLAR CELLS AND MANUFACTURING PROCESS
    1.
    发明申请
    ZNO SUBSTRATE FOR SOLAR CELLS AND MANUFACTURING PROCESS 审中-公开
    太阳能电池的ZNO基板和制造工艺

    公开(公告)号:WO0247175A3

    公开(公告)日:2003-02-20

    申请号:PCT/JP0110581

    申请日:2001-12-04

    CPC classification number: H01L31/022425 C23C14/086 Y02E10/50

    Abstract: A substrate for a solar cell is provided which comprises a support having a metal surface and a zinc oxide film formed on the metal surface and having a water content of 7.5 H 10-3 mol/cm3 or less, preferably 4.0 H 10-4 mol/cm3 or more. Thereby, the increase of series resistance and the generation of shunt are prevented and the efficiency such as Jsc and the chemical stability are improved, thus obtaining a solar cell with a zinc oxide film having optimal overall characteristics.

    Abstract translation: 提供了一种用于太阳能电池的基板,其包括具有金属表面的支撑体和形成在金属表面上的水分含量为7.5H×10 -3 mol / cm 3以下,优选为4.0H 10 -4 mol / cm3以上。 由此,防止了串联电阻的增加和分路的产生,提高了Jsc等的效率和化学稳定性,从而得到具有最佳整体特性的具有氧化锌膜的太阳能电池。

    Process and apparatus for forming zinc oxide film, and process and apparatus for producing photovoltaic device

    公开(公告)号:AU7186100A

    公开(公告)日:2001-05-31

    申请号:AU7186100

    申请日:2000-11-28

    Applicant: CANON KK

    Abstract: Disclosed are an electrodeposition process comprising the steps of transporting a substrate (2006) in an electrodeposition bath, and forming a film on the substrate, which process further comprises the step of removing particles from the surface of the substrate; and an electrodeposition apparatus comprising an electrodeposition tank (2066) for holding therein an electrodeposition bath, a mechanism for transporting a continuous-length substrate while holding the substrate thereon, and an opposing electrode (2026 to 2049), which apparatus further comprises a mechanism for removing particles from the surface of the continuous-length substrate. These can provide a process and an apparatus by and in which dust in the bath or any particles due to film-peeling from electrodes can be prevented from causing difficulties such as impact marks in a film-deposited substrate during its transport, to form a good-quality electrodeposited film.

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