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    2.
    发明专利
    未知

    公开(公告)号：DE60034645D1

    公开(公告)日：2007-06-14

    申请号：DE60034645

    申请日：2000-11-15

    Applicant: CANON KK

    Inventor： TANABE MASAYUKI ,  FUKUDA YASUAKI ,  TSUKAMOTO MASAMI

    IPC: G03F7/20 ,  H01L21/027

    Abstract: Disclosed is an exposure apparatus which includes an optical element (1), a gas supplying unit (4) for supplying a predetermined gas around the optical element (1), and an organic compound decomposition mechanism (7,8) for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element (1) without a necessity of using many filters in combination.

    REFLECTION-TYPE X-RAY MASK STRUCTURE, APPARATUS FOR X-RAY EXPOSURE AND METHOD THEREFOR, AND DEVICE MANUFACTURED BY USING THE REFLECTION-TYPE X-RAY MASK STRUCTURE
    3.
    发明专利
    REFLECTION-TYPE X-RAY MASK STRUCTURE, APPARATUS FOR X-RAY EXPOSURE AND METHOD THEREFOR, AND DEVICE MANUFACTURED BY USING THE REFLECTION-TYPE X-RAY MASK STRUCTURE 失效

    公开(公告)号：JPH09232203A

    公开(公告)日：1997-09-05

    申请号：JP3237796

    申请日：1996-02-20

    Applicant: CANON KK

    Inventor： MAEHARA HIROSHI ,  TSUKAMOTO MASAMI

    IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To prevent a multiple exposure region from being generated in the boundary part between adjacent exposure regions on a wafer even when a step-and-scan exposure operation is performed by a method wherein an X-ray reflectance in regions other than a pattern transfer region is made lower than an X-ray reflectance in the pattern transfer region. SOLUTION: Molybdenum films and silicon films are laminated alternately in respective film thicknesses on a support substrate 31 for a reflection-type X-ray mask by using an RF magnetron sputtering method, and a multilayer film 32 for X-ray reflection is obtained. At this time, the film formation region of the multilayer film 32 is used as a transfer region in an X-ray exposure operation, its outside part is covered with a mask so as to become a region 200mm square at the inside of the mask support substrate 31, and the X-ray reflection multilayer film 32 is formed only in a pattern transfer region. Then, a tungsten X-ray absorber pattern 33 in a prescribed film thickness and an alignment mark are formed on the multilayer film 32, and an X-ray reflectance in regions other than the pattern transfer region on the X-ray reflection multilayer film 32 is made lower than an X-ray reflectance in the pattern transfer region.

    X-RAY GENERATOR, ALIGNER EMPLOYING IT AND FABRICATION OF DEVICE
    4.
    发明专利
    X-RAY GENERATOR, ALIGNER EMPLOYING IT AND FABRICATION OF DEVICE 失效

    公开(公告)号：JPH09115813A

    公开(公告)日：1997-05-02

    申请号：JP27272795

    申请日：1995-10-20

    Applicant: CANON KK

    Inventor： MIYAKE AKIRA ,  TSUKAMOTO MASAMI

    IPC: H05G1/00 ,  G03F7/20 ,  H01J35/22 ,  H01L21/027 ,  H05G2/00

    Abstract: PROBLEM TO BE SOLVED: To ensure a better focus performance by irradiating an object with X-rays generated from an X-ray generator having a light emitting part of variable shape. SOLUTION: A plurality of plasma exciting laser light sources 9 and laser light condensing optical systems 10 are provided in order to produce a plurality of plasma X-ray emission points 1 simultaneously on a target. At the same time, size of each emission point is controlled through the zooming and defocusing mechanisms of laser light condensing optical system thus setting the shape of light emitting part of light source arbitrarily. Size of the light source is decreased, for example, by decreasing the spot of laser light and superposing the spots and coherent illumination is realized. Size of the light source is increased when enlarged laser light spots are arranged and incoherent illumination is realized. Size of the light source is also increased effectively when decreased laser light spots are arrange through intervals and substantially incoherent illumination is realized.

    INKJET PRINTED MATTER AND ITS IMAGE PROTECTING METHOD
    5.
    发明专利
    INKJET PRINTED MATTER AND ITS IMAGE PROTECTING METHOD 审中-公开

    公开(公告)号：JP2006240229A

    公开(公告)日：2006-09-14

    申请号：JP2005062308

    申请日：2005-03-07

    Applicant: CANON KK

    Inventor： TSUKAMOTO MASAMI ,  KOBAYASHI MASAYA ,  OKUDA KOSHO ,  KUNIMINE NOBORU

    IPC: B41M5/00 ,  B41J2/01 ,  B41M5/50 ,  B41M5/52

    Abstract: PROBLEM TO BE SOLVED: To provide an inkjet printed matter having high density, high gloss, excellent migration resistance and gas resistance. SOLUTION: In the inkjet printed matter which is subjected to a laminate processing after the ink receiving layer is print recorded by a dye-containing ink, the receiving layer comprises at least two or more layers wherein the surface layer has cracks, with its thickness not higher than 3/4 that of the receiving layer, and the laminate processing layer comprises at least two or more layers of a surface protection layer and a permeation layer wherein the permeation layer contain a hot-melt resin and permeates into the ink receiving layer with its permeation depth being at least 1/4 or more of the surface layer of the ink receiving layer or 2 μm or more. COPYRIGHT: (C)2006,JPO&NCIPI

    X-RAY MASK, X-RAY ALIGNER USING THE X-RAY MASK, MANUFACTURE OF SEMICONDUCTOR DEVICE WHICH USES THE X-RAY MASK, AND SEMICONDUCTOR DEVICE MANUFACTURED BY USING THE X-RAY MASK
    6.
    发明专利
    X-RAY MASK, X-RAY ALIGNER USING THE X-RAY MASK, MANUFACTURE OF SEMICONDUCTOR DEVICE WHICH USES THE X-RAY MASK, AND SEMICONDUCTOR DEVICE MANUFACTURED BY USING THE X-RAY MASK 失效

    公开(公告)号：JPH09320935A

    公开(公告)日：1997-12-12

    申请号：JP13351696

    申请日：1996-05-28

    Applicant: CANON KK

    Inventor： TSUKAMOTO MASAMI ,  WATANABE YUTAKA

    IPC: G21K5/02 ,  G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  G03F1/16

    Abstract: PROBLEM TO BE SOLVED: To prevent foreign matter from attaching to a mask pattern without damaging the pattern in dealing such as carriage and exposure by installing a mask pattern protecting part member which covers a mask pattern formed on an X-ray mask and can remove a part position hindering an exposure optical path from the x-ray mask. SOLUTION: An X-ray mask 1 is a transmission type mask wherein an Au mask pattern 3 turning to an absorbing body absorbing X-ray is formed on a membrane 2 applying an Si substrate to a retainer 4. On both surfaces of the X-ray mask 1, mask protecting part members 5 are installed, after the deffect inspection of the X-ray mask 1. The X-ray mask 1 is housed in a mask cassette, stored and carried in a state of the mask protecting part member 5 being attached. At the exposure, desired X-ray masks 1 are taken out one by one from a mask slot by a mask carrier, and carried to a predetermined position on an aligner. In the mask slot, the mask pattern protecting part member 5 is removed, and only the mask 1 is carried in the aligner.

    X-RAY OPTICAL APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明专利
    X-RAY OPTICAL APPARATUS AND DEVICE MANUFACTURING METHOD 失效

    公开(公告)号：JPH09298140A

    公开(公告)日：1997-11-18

    申请号：JP10932696

    申请日：1996-04-30

    Applicant: CANON KK

    Inventor： MIYAKE AKIRA ,  TSUKAMOTO MASAMI

    IPC: G03F7/20 ,  G21K1/06 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an X-ray optical apparatus and device manufacturing method which has an illumination optical system which realizes incoherent illumination and allows the max. performance of its image-forming system to be exhibited. SOLUTION: This X-ray optical system scans an X-ray beam 703 at angles by two oblique incident total reflection mirrors, one nearly perpendicular incident beam deflection mirror or quasi-conical internal beam deflection mirror 705, its angle distribution is adequately set to control the angle distribution of the X-rays illuminating an object whereby the coherence factor σ of an illumination optical system is freely adjustable and the deformed illumination such as ring or oblique illumination can be made. It enables illumination in an optimum condition for the shape and size of a pattern to be transferred and exposure condition such as resist characteristic or nature of an observation sample and hence the image-forming performance such as resolution and depth of focus can be improved.

    FOREIGN SUBSTANCE REMOVAL DEVICE FOR MASK
    8.
    发明专利
    FOREIGN SUBSTANCE REMOVAL DEVICE FOR MASK 失效

    公开(公告)号：JPH09260245A

    公开(公告)日：1997-10-03

    申请号：JP6412296

    申请日：1996-03-21

    Applicant: CANON KK

    Inventor： TSUKAMOTO MASAMI ,  AMAMIYA MITSUAKI

    IPC: G03F1/82 ,  H01L21/027 ,  H01L21/66 ,  G03F1/08

    Abstract: PROBLEM TO BE SOLVED: To reduce the number to times of cleaning of a mask for exposure use and the number of times of correction of the mask for exposure use and to make the use efficiency of the mask enhance by a method wherein a foreign substance removal device for the mask is provided with a means for electrifying a foreign substance adhering to the mask or a means for making the foreign substance polarize. SOLUTION: A mechanism, which removes the simplest foreign substance, is one provided with an electrode in opposition to a mask pattern. A reflection type mask 1 is formed into a structure, wherein a multilayer film 2 is formed on a substrate 3 as a reflective surface and moreover, absorber layers 4, which are desired patterns, are formed on the layer 2. The electrode 5 is arranged in opposition to the mask pattern of the mask 1 and a high voltage is applied to the electrode 5. The layer 2 is regarded as roughly a conductor and the surface of the layer 2 is charged with a charge reverse to that in the electrode. As a result, in the case where a foreign substance adhered to the surface of the layer 2 is a conductor, the foreign substance is electrified integrally with the surface of the layer 2, repulses the layer 2 to separate from the surface of the layer 2 and is attracted to the electrode 5. In the case where the foreign substance is an insulator, the foreign substance is dielectrically polarized and is attracted to the electrode 5 according to a field gradient.

    MEMBER FOR LAMINATION AND LAMINATE PRINTING MATERIAL
    9.
    发明专利
    MEMBER FOR LAMINATION AND LAMINATE PRINTING MATERIAL 审中-公开

    公开(公告)号：JP2003231217A

    公开(公告)日：2003-08-19

    申请号：JP2002028514

    申请日：2002-02-05

    Applicant: CANON KK

    Inventor： TSUKAMOTO MASAMI ,  IWATA SATORU ,  KUNIMINE NOBORU

    IPC: B41M5/00 ,  B32B27/00 ,  B41M5/50 ,  B41M5/52 ,  C08K7/16 ,  C08L83/04

    Abstract: PROBLEM TO BE SOLVED: To prevent each film from sticking in a case where a film for lamination (a laminate member) is brought in a wound state not to thereby cause the wrinkle and the misregistration of the film at the time of lamination and film processing. SOLUTION: The transparent film layer of the member for lamination that has the transparent film layer provided on and strippable from a heat resistant base material and the heat resistant base material for the formation of a laminate layer on the image face of a printing material is composed of a first layer that becomes the surface protection layer of the image face provided on the heat resistant base material and a second layer provided on the first layer that becomes an adhesion layer to the image face. And a polysiloxane based material is contained in the second layer and a spherical bead is distributed in the layer. COPYRIGHT: (C)2003,JPO

    LAMINATE FILM AND LAMINATING METHOD THEREFOR
    10.
    发明专利
    LAMINATE FILM AND LAMINATING METHOD THEREFOR 审中-公开

    公开(公告)号：JP2003145913A

    公开(公告)日：2003-05-21

    申请号：JP2002253931

    申请日：2002-08-30

    Applicant: CANON KK

    Inventor： KOBAYASHI MASAYA ,  TSUKAMOTO MASAMI ,  NAGATA TORU ,  SUZUKI KENJI

    IPC: B41M5/00

    Abstract: PROBLEM TO BE SOLVED: To provide a laminate film, in which an image having an excellent optical density and glossiness after laminate treatment is obtained and, at the same time, which has a thin base material processible with low energy, and a laminating method employing thereof. SOLUTION: The laminate film is produced by stacking an image protective layer, on the surface of which at least a bonding layer bondable to an image surface is provided, on a base material having its thickness of 1.5 μm or more to 6.0 μm or less, its arithmetical mean roughness (Ra) of 50 nm or less and its ten-point mean roughness (Rz) of 1,200 nm or more to 2,000 nm or less according to JIS B0601.

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