公开(公告)号：JPH10228697A

公开(公告)日：1998-08-25

申请号：JP3201397

申请日：1997-02-17

Applicant: CANON KK

Inventor： YAJIMA MASATO ,  SAITO MAKOTO

IPC: G06K13/063 ,  G11B17/00 ,  G11B19/00

Abstract: PROBLEM TO BE SOLVED: To enable a card shaped recording medium to be ejected certainly even when a warped card shaped recording media is inserted by making the interval between upper and lower guiding plates of a carrier mechanism carrying the card shaped recording medium wider than the height of groove parts of a mounting base holding the medium and moreover providing tapered parts at edge parts of the guiding plates. SOLUTION: A card driving device is constituted of the carrier mechanism consisting of plural carrier rollers 4 carrying the card in an information recording and reproducing device and guiding plates 5 arranged up and down wards of a carrying path and a mounting base 3 having groove parts 3a for holding the carried card at both side parts. The interval h3 between the upper and lower guiding plates 5, the height h1 of the space of the inside of the groove part 3a and the thickness h2 of the card are set so as to satisfy the condition of h2

公开(公告)号：JPH02194521A

公开(公告)日：1990-08-01

申请号：JP1251489

申请日：1989-01-21

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  TERAJIMA SHIGERU ,  YAJIMA MASATO ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make a line width of a resist uniform by a method wherein, when an exposure is controlled at individual points on a wafer, it is controlled by giving consideration to a spectral intensity of X-rays, diffraction of a mask and the like. CONSTITUTION:In an X-ray aligner which transcribes and exposures a pattern on a mask 205 onto a wafer 203 coated with a photosensitizer by using X-rays, the following are installed: a mask chuck 206 which holds the mask 205; a wafer chuck 207 which holds the wafer 203 arranged so as to face the mask 205. The following are also provided: the mask 205 which is held by the mask chuck 206; an X-ray source 204 by which the water 203 held by the wafer chuck 207 is irradiated with X-rays. A spectral intensity of the X-rays generated from the X=ray source 204 is measured by a measuring means 209; an X-ray exposure to be applied to the wafer 203 is controlled by a control means 214 in accordance with its measured result. The control means 214 is arranged on an X-ray light path between the X=ray source 204 and the mask 205 by using a shutter means 210; it sets an exposure time on individual points on the wafer 203. Thereby, it is possible to obtain a desired line width of a resist.

公开(公告)号：JPH10293821A

公开(公告)日：1998-11-04

申请号：JP11516997

申请日：1997-04-17

Applicant: CANON KK

Inventor： SAITO MAKOTO ,  YAJIMA MASATO

IPC: G06K19/08 ,  G06K7/01 ,  G06K17/00

Abstract: PROBLEM TO BE SOLVED: To excellently clean the IC storage part of a card recording medium. SOLUTION: A mount 16 is provided with a cleaner 20 and a terminal 21 so that they go come into contact with the IC storage part C of the card, and the cleaner 20 is energized upward by a spring 22. The cleaner 20 is formed of a material which has superior absorptivity to, specially, an oil component such as cloth provided corresponding to the IC storage part C2 of the card C, and energized by the spring 22 in such a direction that it presses the IC storage part C2 of the card C.