公开(公告)号：FR2865314A1

公开(公告)日：2005-07-22

申请号：FR0450101

申请日：2004-01-20

Applicant: CIT ALCATEL

Inventor： BERNARD ROLAND ,  KAMBARA HISANORI ,  FAVRE ARNAUD

IPC: B65G49/00 ,  B65D81/20 ,  B65G49/07 ,  H01L21/00 ,  H01L21/02 ,  H01L21/673 ,  H01L21/677

Abstract: The device has a purge station (2) with manipulator units (4) for displacement of substrate wafers (3) between an enclosure (1) of mini-environment and a purging airtight compartment (2b). Distribution units (5) diffuse purging gas in the direction of the edges of the substrate wafers parallel to their main face. Collectors (6) collect the diffused gas flow to the opposed units (5) after passage between the wafers. The enclosure (1) of mini-environment is of standardized mechanical interface type.

公开(公告)号：FR2901546B1

公开(公告)日：2010-10-15

申请号：FR0604668

申请日：2006-05-24

Applicant: CIT ALCATEL

Inventor： FAVRE ARNAUD ,  BELLET BERTRAND ,  BERNARD ROLAND ,  METAIS XAVIER

IPC: B65D81/20

公开(公告)号：FR2865314B1

公开(公告)日：2006-04-28

申请号：FR0450101

申请日：2004-01-20

Applicant: CIT ALCATEL

Inventor： BERNARD ROLAND ,  KAMBARA HISANORI ,  FAVRE ARNAUD

IPC: B65G49/00 ,  H01L21/00 ,  B65D81/20 ,  B65G49/07 ,  H01L21/02 ,  H01L21/673 ,  H01L21/677

Abstract: The device has a purge station (2) with manipulator units (4) for displacement of substrate wafers (3) between an enclosure (1) of mini-environment and a purging airtight compartment (2b). Distribution units (5) diffuse purging gas in the direction of the edges of the substrate wafers parallel to their main face. Collectors (6) collect the diffused gas flow to the opposed units (5) after passage between the wafers. The enclosure (1) of mini-environment is of standardized mechanical interface type.