公开(公告)号：JPH10123345A

公开(公告)日：1998-05-15

申请号：JP11280297

申请日：1997-04-30

Applicant: CORNING INC

Inventor： BEGUIN ALAIN MARCEL JEAN ,  BOEK HEATHER ,  MASCHMEYER RICHARD ORR ,  TROUCHET DENIS M

IPC: C03B19/06 ,  C03B23/025 ,  C03C17/02 ,  C03C17/04 ,  C03C17/23 ,  G02B6/12 ,  G02B6/13 ,  G02B6/132 ,  H01L27/14

Abstract: PROBLEM TO BE SOLVED: To form substantially flat plane type optical circuits by treating a glass body to overcome troubles, such as distortion curling. SOLUTION: A substantially flat plane type silica substrate is formed and plural layers of oxide compds. are formed on this substrate. These oxide layers are sintered to form glassy optical waveguide layers on the silica substrate. The structural body formed in such a manner is heated to a high temp. for the time sufficient for flattening the structural body and the optical circuits are formed in the glassy layer by the conventional photolithography and etching. The surface formed in such a manner is clad with a glass layer covering the surface having the refractive index substantially equal to the refractive index of the substrate.

公开(公告)号：DE69502262T2

公开(公告)日：1998-09-24

申请号：DE69502262

申请日：1995-12-06

Applicant: CORNING INC

Inventor： BOEK HEATHER ,  BORRELLI NICHOLAS FRANCIS ,  HARES GEORGE BIGELOW

IPC: C03C3/095 ,  C03C4/00 ,  C03C4/08 ,  H01J29/24 ,  H01J29/86

Abstract: The glass compsn. free of easily reducible metal oxides other than Sb2O3 consists of (wt.% on an oxide basis): 55-60 SiO2; 5.75-10 K2O; 1-3 Al2O3; 10.5-14 K2O + Na2O; 0-3.5 ZrO2; 1.6-2.6 K2O/Na2O (wt); 0.6-2 Li2O; = 1 K2O/Na2O (mol); 7.5-13.5 SrO; 0.5-1 CeO2; 14-16 BaO; 0.25-1 TiO2; 3-5 Na2O; 0.15-0.5 Sb2O3. It shows no browning discolouration on exposure to high voltage electrons, has a linear coefft. of thermal expansion of 97-100 x 10-7[deg]C over the range 25-300[deg]C, an annealing point not lower than 475[deg]C, a strain point not lower than 440[deg]C, an electrical resistivity expressed as Log R >= 9 at 250[deg]C and >= 7 at 350[deg]C, and a liquidus temp 1100[deg]C.

公开(公告)号：AU1908697A

公开(公告)日：1997-11-06

申请号：AU1908697

申请日：1997-04-28

Applicant: CORNING INC

Inventor： BEGUIN ALAIN MARCEL JEAN ,  BOEK HEATHER ,  MASCHMEYER RICHARD ORR ,  TROUCHET DENIS M

IPC: C03B19/06 ,  C03B23/025 ,  C03C17/02 ,  C03C17/04 ,  C03C17/23 ,  G02B6/12 ,  G02B6/13 ,  G02B6/132 ,  H01L27/14

Abstract: A method for forming a substantially flat planar lightwave optical circuit which has a substantially flat planar silica substrate and a sintered glassy lightguiding layer over the silica substrate. The structure is given a post treatment at an elevated temperature for a time sufficient to flatten said structure and compensate for distortion. Alternatively, the silica substrate may be heated and presagged to a predetermined degree to compensate for distortion or warpage which will occur in later processing.

公开(公告)号：CA2202216A1

公开(公告)日：1997-10-30

申请号：CA2202216

申请日：1997-04-09

Applicant: CORNING INC

Inventor： TROUCHET DENIS M ,  MASCHMEYER RICHARD ORR ,  BOEK HEATHER ,  BEGUIN ALAIN MARCEL JEAN

IPC: C03B19/06 ,  C03B23/025 ,  C03C17/02 ,  C03C17/04 ,  C03C17/23 ,  G02B6/12 ,  G02B6/13 ,  G02B6/132 ,  H01L27/14 ,  C03B32/00 ,  H01L33/00 ,  H01L31/18

Abstract: A method for forming a substantially flat planar lightwave optical circuit which has a substantially flat planar silica substrate and a sintered glassy lightguiding layer over the silica substrate. The structure is given a post treatment at an elevated temperature for a time sufficient to flatten said structure and compensate for distortion. Alternatively, the silica substrate may be heated and presagged to a predetermined degree to compensate for distortion or warpage which will occur in later processing.

公开(公告)号：FR2759465A1

公开(公告)日：1998-08-14

申请号：FR9701606

申请日：1997-02-12

Applicant: CORNING INC

Inventor： BEGUIN ALAIN ,  BOEK HEATHER ,  MASCHMEYER RICHARD ORR ,  TROUCHET DENIS MARCEL

IPC: C03B19/06 ,  C03B23/025 ,  C03C17/02 ,  C03C17/04 ,  C03C17/23 ,  G02B6/12 ,  G02B6/13 ,  G02B6/132 ,  H01L27/14

Abstract: A flat planar light wave optical circuit is formed by a method(A) comprising: (i) forming a layer of a plurality of oxide compounds on the surface of a flat planar silica substrate, (ii) sintering the oxide layer to form a glassy light guide layer, (iii) heating the structure at an elevated temperature for a time sufficient to flatten the structure, (iv) forming an optical circuit into the glassy layer by photolithography and etching, and (v) cladding the surface with a glassy layer having the same index of refraction as the substrate.

公开(公告)号：MX9200410A

公开(公告)日：1992-10-01

申请号：MX9200410

申请日：1992-01-30

Applicant: CORNING INC

Inventor： BOEK HEATHER ,  HARES GEORGE BIGELOW

IPC: C03C3/095 ,  C03C4/08 ,  H01J29/86 ,  C03C3/083

Abstract: A cathode ray tube faceplate glass that is essentially free from fluorine and the oxides of lead arsenic and zirconium, exhibits linear X-radiation absorption coefficients of at least 28 cm at a wavelength of 0.6 Angstroms and at least 8.5cm at 0.3 Angstroms, undergoes essentially no "browning" discoloration when subjected to high velocity electrons, has a viscosity at the internal liquidus of at least 100,000 poises (10,000 Pa.s), has a coefficient of thermal expansion (25-300 DEG C) in the range of 97-100x10-7/ DEG C, has an annealing point not lower than about 500 DEG C and a strain point not lower than about 455 DEG C, has an electrical resistivity expressed in log R, that is greater than 9 at 250 DEG C and greater than 7 at 350 DEG C, the glass consisting essentially, expressed in terms of weight percent as oxide basis, of Si02 60-65 Al203 0-3 Na20 6.5-8 K20 6.5-10 CaO+MgO 0-3 Sb2O3 0.1-1 Sr0 8-12 Ba0 8-12 Ba0+Sr0 16-21 Zn0 1-8 Ce02 0.1-1 Ti02 0.1-1

公开(公告)号：FR2759465B1

公开(公告)日：1999-04-30

申请号：FR9701606

申请日：1997-02-12

Applicant: CORNING INC

Inventor： BEGUIN ALAIN ,  BOEK HEATHER ,  MASCHMEYER RICHARD ORR ,  TROUCHET DENIS MARCEL

IPC: C03B19/06 ,  C03B23/025 ,  C03C17/02 ,  C03C17/04 ,  C03C17/23 ,  G02B6/12 ,  G02B6/13 ,  G02B6/132 ,  H01L27/14

Abstract: A method for forming a substantially flat planar lightwave optical circuit which has a substantially flat planar silica substrate and a sintered glassy lightguiding layer over the silica substrate. The structure is given a post treatment at an elevated temperature for a time sufficient to flatten said structure and compensate for distortion. Alternatively, the silica substrate may be heated and presagged to a predetermined degree to compensate for distortion or warpage which will occur in later processing.

公开(公告)号：MX9703234A

公开(公告)日：1998-04-30

申请号：MX9703234

申请日：1997-04-29

Applicant: CORNING INC

Inventor： BEGUIN ALAIN MARCEL JEAN ,  BOEK HEATHER ,  MASCHMEYER RICHARD ORR ,  TROUCHET DENIS M

IPC: C03B19/06 ,  C03B23/025 ,  C03C17/02 ,  C03C17/04 ,  C03C17/23 ,  G02B6/12 ,  G02B6/13 ,  G02B6/132 ,  H01L27/14 ,  C03C15/00

Abstract: Un método para formar un circuito optico de onda luminosa plano, substancialmente liso, que tiene un substrato de sílice plano substancialmente liso y una capa de guía de onda cristalina concrecionada sobre el substrato de sílice; se da un tratamiento posterior a la estructura a una temperatura elevada durante un tiempo suficiente para alisar dicha estructura y compensar distorsion; alternativamente, el substrato de sílice puede calentarse y combarse previamente hasta un grado predeterminado para compensar la distorsion o combadura que ocurre en tratamiento posterior.

公开(公告)号：DE69209689T2

公开(公告)日：1996-10-24

申请号：DE69209689

申请日：1992-01-16

Applicant: CORNING INC

Inventor： BOEK HEATHER ,  HARES GEORGE BIGELOW

IPC: C03C3/095 ,  C03C4/08 ,  H01J29/86

Abstract: A cathode ray tube faceplate glass that is essentially free from fluorine and the oxides of lead arsenic and zirconium, exhibits linear X-radiation absorption coefficients of at least 28 cm at a wavelength of 0.6 Angstroms and at least 8.5cm at 0.3 Angstroms, undergoes essentially no "browning" discoloration when subjected to high velocity electrons, has a viscosity at the internal liquidus of at least 100,000 poises (10,000 Pa.s), has a coefficient of thermal expansion (25-300 DEG C) in the range of 97-100x10-7/ DEG C, has an annealing point not lower than about 500 DEG C and a strain point not lower than about 455 DEG C, has an electrical resistivity expressed in log R, that is greater than 9 at 250 DEG C and greater than 7 at 350 DEG C, the glass consisting essentially, expressed in terms of weight percent as oxide basis, of Si02 60-65 Al203 0-3 Na20 6.5-8 K20 6.5-10 CaO+MgO 0-3 Sb2O3 0.1-1 Sr0 8-12 Ba0 8-12 Ba0+Sr0 16-21 Zn0 1-8 Ce02 0.1-1 Ti02 0.1-1

公开(公告)号：DE69009166D1

公开(公告)日：1994-06-30

申请号：DE69009166

申请日：1990-11-15

Applicant: CORNING INC

Inventor： AMUNDSON WILLIAM DUANE ,  BOEK HEATHER ,  HARES GEORGE BIGELOW ,  PFITZENMAIER ROBERT WILLIAM

IPC: C03C3/095 ,  C03C3/112 ,  C03C4/02 ,  C03C10/00 ,  C03C10/12 ,  C03C10/16

Abstract: This invention relates to the production of opaque, beige-tinted glass-ceramic articles consisting essentially, in weight percent, of