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    Method of producing substrate for extreme ultraviolet lithography
    1.
    发明专利
    Method of producing substrate for extreme ultraviolet lithography 审中-公开
    生产用于极端超紫外光刻的基材的方法

    公开(公告)号：JP2009091246A

    公开(公告)日：2009-04-30

    申请号：JP2009011710

    申请日：2009-01-22

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： HRDINA KENNETH E ,  RUSSO NIKKI J ,  WASILEWSKI MICHAEL H

    IPC: C03B8/04 ,  G02B1/00 ,  C03B19/14 ,  C03B20/00 ,  G03F1/14 ,  G03F1/16 ,  H01L21/027

    CPC classification number: C03B19/1453 ,  C03B19/1407 ,  C03B19/1484 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/42 ,  C03B2207/32

    Abstract: PROBLEM TO BE SOLVED: To reduce the deviation of a thermal expansion coefficient in a method of forming a glass substrate for extreme ultraviolet lithography.
    SOLUTION: This method includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (28) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少用于形成用于极紫外光刻的玻璃基板的方法中的热膨胀系数的偏差。 解决方案：该方法包括将二氧化硅前体（28）输送到燃烧器（16）并使二氧化硅前体（28）通过燃烧器（16）的火焰（36）以形成二氧化硅颗粒（38），沉积 平坦表面（14）上的二氧化硅颗粒（38）以形成平坦的多孔EUV光刻大尺寸预成型件（40），并将平面多孔EUV平版印刷大尺寸预制件（40）固结成平面致密的EUV平版印刷大尺寸均匀玻璃体 。 版权所有（C）2009，JPO＆INPIT

    High purity fused silica with low absolute refractive index
    3.
    发明专利
    High purity fused silica with low absolute refractive index 审中-公开
    具有低绝对折射率的高纯度二氧化硅

    公开(公告)号：JP2010155778A

    公开(公告)日：2010-07-15

    申请号：JP2010000130

    申请日：2010-01-04

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： DURAN CARLOS ,  FIACCO RICHARD MICHAEL ,  HRDINA KENNETH E ,  SEMPOLINSKI DANIEL RAYMOND

    IPC: C03B20/00 ,  C03C3/06 ,  G02B1/02 ,  G03F1/14 ,  H01L21/027

    CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C2201/22 ,  C03C2201/23

    Abstract: PROBLEM TO BE SOLVED: To provide fused silica glass which has excellent birefringence and resistance to laser damage. SOLUTION: The fused silica article has combined concentration of protium-containing hydroxy groups and deuteroxy groups less than about 10 ppm, and also has an absolute refractive index of less than or equal to 1.560835 at a wavelength of about 193.368 nm. A method of annealing fused silica glass is also provided. The method comprises the steps of: heating provided fused silica glass to a first temperature above the anneal point; cooling the fused silica glass to a second temperature below the strain point at a progressively decreasing cooling rate that is less than the anneal rate, wherein the progressively decreasing cooling rate is lower than the anneal rate of the fused silica glass; and cooling the fused silica glass from the second temperature to room temperature at a third cooling rate. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供具有优异的双折射和耐激光损伤的熔融石英玻璃。 解决方案：熔融二氧化硅制品具有小于约10ppm的含腙羟基和氘代基的组合浓度，并且在约193.368nm的波长下具有小于或等于1.560835的绝对折射率。 还提供了退火熔融石英玻璃的方法。 该方法包括以下步骤：将熔融石英玻璃加热至退火点之上的第一温度; 以小于退火速率的逐渐降低的冷却速率将熔融石英玻璃冷却至低于应变点的第二温度，其中逐渐降低的冷却速率低于熔融石英玻璃的退火速率; 并以第三冷却速度将熔融石英玻璃从第二温度冷却至室温。 版权所有（C）2010，JPO＆INPIT

    Fused silica glass and method for making the same
    4.
    发明专利
    Fused silica glass and method for making the same 审中-公开
    熔融二氧化硅玻璃及其制造方法

    公开(公告)号：JP2007084427A

    公开(公告)日：2007-04-05

    申请号：JP2006252500

    申请日：2006-09-19

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： HARPER BRIAN L ,  HRDINA KENNETH E ,  LASALA JOHN E

    IPC: C03B20/00 ,  C03C3/06 ,  G03F7/20 ,  H01L21/027

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  G03F7/708 ,  Y10S501/905

    Abstract: PROBLEM TO BE SOLVED: To provide an efficient and effective process for hydrogen-loading a silica glass material to produce a material that meets the requirements of lithographic applications operating at a wavelength within a range of about 248 nm and 193 nm. SOLUTION: A method includes a process for treating the glass material in a hydrogen-containing atmosphere such that at the end of the treatment a hydrogen concentration gradient exists through a depth of the glass material. The hydrogen concentration gradient causes a refractive index gradient (δn). All δn are within an acceptable range for the intended use. The δn satisfies following relationship: 0≤δn≤5 ppm. It is preferable the partial pressure of hydrogen can be varied during the process for treating the silica glass in the hydrogen-containing atmosphere. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种有效和有效的方法，用于氢气负载石英玻璃材料以产生满足在约248nm和193nm范围内波长工作的光刻应用的要求的材料。 解决方案：一种方法包括在含氢气氛中处理玻璃材料的方法，使得在处理结束时，通过玻璃材料的深度存在氢浓度梯度。 氢浓度梯度引起折射率梯度（δn）。 所有δn在预期用途的可接受范围内。 δn满足以下关系：0≤δn≤5ppm。 优选在含氢气氛中处理石英玻璃的工艺期间氢的分压可以改变。 版权所有（C）2007，JPO＆INPIT

    Synthetic silica glass with uniform fictive temperature
    5.
    发明专利
    Synthetic silica glass with uniform fictive temperature 有权
    合成二氧化硅玻璃具有均匀的温度

    公开(公告)号：JP2011088815A

    公开(公告)日：2011-05-06

    申请号：JP2010236245

    申请日：2010-10-21

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： DURAN CARLOS ,  HRDINA KENNETH E ,  NEUKIRCH ULRICH WILHELM HEINZ

    IPC: C03B20/00 ,  C03B25/02 ,  C03B32/00

    CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/23

    Abstract: PROBLEM TO BE SOLVED: To provide a method for making silica glass with a uniform fictive temperature which makes glass in which variation in a refractive index and birefringence is reduced.
    SOLUTION: The silica glass has a strain point T
    s , a fictive temperature and a relaxation rate at the fictive temperature, and also has hydroxy group concentration of less than 800 mass ppm. The hydroxy group concentration varies only at least by 0.5 ppm. The silica glass is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3°C of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3°C after the annealing step.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有均匀的假想温度的制造石英玻璃的方法，其使得折射率和双折射率的变化减小的玻璃。

    解决方案：二氧化硅玻璃具有应变点T S S S / SB，假想温度和假想温度下的松弛率，并且还具有小于800质量ppm的羟基浓度。 羟基浓度至少仅改变0.5ppm。 将石英玻璃在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C的目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，该冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 版权所有（C）2011，JPO＆INPIT

    TUNING Tzc BY ANNEALING OF ULTRA LOW EXPANSION GLASS
    6.
    发明专利
    TUNING Tzc BY ANNEALING OF ULTRA LOW EXPANSION GLASS 审中-公开
    通过减少超低膨胀玻璃来调节Tzc

    公开(公告)号：JP2011073961A

    公开(公告)日：2011-04-14

    申请号：JP2010193335

    申请日：2010-08-31

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： DURAN CARLOS ,  HRDINA KENNETH E

    IPC: C03B25/02 ,  C03B32/00 ,  C03C3/06 ,  C03C3/076 ,  G02B1/00 ,  H01L21/027

    CPC classification number: C04B35/14 ,  C03B25/025 ,  C03B25/08 ,  C03C3/06 ,  C03C3/076 ,  Y02P40/57

    Abstract: PROBLEM TO BE SOLVED: To provide a method by which the Tzc of a silica-titania glass EUVL mirror substrate (or an other) can be tuned to within a specific range.
    SOLUTION: The method by which the Tzc of the EUVL mirror substrate can be tuned to within the specific range by means of a selected final anneal that shifts Tzc of the substrate to the desired Tzc value is provided. In addition, since different mirrors in a set can be specified at different values of Tzc, this method can be used to produce a glass sample on glass pieces to make parts with different Tzc values from the same boule of glass, thus reducing the number of separate boules required to fill an order.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供二氧化硅 - 二氧化钛玻璃EUVL镜面基板（或另一种）的Tzc可以在特定范围内调节的方法。 解决方案：提供了通过使基板的Tzc移动到期望的Tzc值的所选择的最终退火，可以将EUVL镜面基板的Tzc调谐到特定范围内的方法。 另外，由于可以在不同的Tzc值中指定一组中的不同的反射镜，所以该方法可以用于在玻璃片上制造玻璃样品以从相同的玻璃杯制成具有不同Tzc值的部件，从而减少 单独的毛坯需要填写订单。 版权所有（C）2011，JPO＆INPIT

    Low thermal expansion glass for euvl application
    7.
    发明专利
    Low thermal expansion glass for euvl application 有权
    用于EUVL应用的低热膨胀玻璃

    公开(公告)号：JP2011063505A

    公开(公告)日：2011-03-31

    申请号：JP2010192019

    申请日：2010-08-30

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： HRDINA KENNETH E ,  MUELLER MICHAEL A ,  STAINBROOK BARBARA L

    IPC: C03C3/06 ,  C03C19/00

    CPC classification number: C03C3/076 ,  C03C4/0085 ,  C03C17/02 ,  C03C23/007 ,  Y10T428/24355 ,  Y10T428/2495

    Abstract: PROBLEM TO BE SOLVED: To provide a low thermal expansion glass which has stable thermal expansion in a temperature range wider than that in the present ULE glass and can be polished so as to satisfy surface roughness requirements. SOLUTION: The low thermal expansion glass includes a base glass material 3 having a front surface 5, a back surface 7, and a thickness T; and a glass coating material 9 applied on at least the front surface 5 of the base glass material 3. The base glass material 3 consists essentially of 10 wt.% to 20 wt.% titania and 80 wt.% to 90 wt.% silica. The glass coating material 9 also consists essentially of titania and silica, but the total amount of titania in the glass coating material 9 is lower than the total amount of titania in the base glass material 3. The base glass material 3 preferably has a coefficient of thermal expansion of substantially zero in the temperature range of about 10 to 100°C. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供在比本发明的ULE玻璃更宽的温度范围内具有稳定的热膨胀的低热膨胀玻璃，并且可以被抛光以满足表面粗糙度要求。 解决方案：低热膨胀玻璃包括具有前表面5，后表面7和厚度T的基础玻璃材料3; 以及涂覆在基材玻璃材料3的至少前表面5上的玻璃涂层材料9.基础玻璃材料3基本上由10重量％至20重量％的二氧化钛和80重量％至90重量％的二氧化硅 。 玻璃涂层材料9也基本上由二氧化钛和二氧化硅组成，但是玻璃涂层材料9中的二氧化钛的总量低于基础玻璃材料3中的二氧化钛的总量。基础玻璃材料3优选具有 在大约10至100℃的温度范围内的热膨胀基本为零。 版权所有（C）2011，JPO＆INPIT

    Synthetic silica material having low fluence-dependent transmission and manufacturing method of the same
    8.
    发明专利
    Synthetic silica material having low fluence-dependent transmission and manufacturing method of the same 审中-公开
    合成二氧化硅材料具有低磁性相关传输及其制造方法

    公开(公告)号：JP2014028752A

    公开(公告)日：2014-02-13

    申请号：JP2013146404

    申请日：2013-07-12

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： BOOKBINDER DANA C ,  HRDINA KENNETH E ,  GLENN E KOHNKE ,  MOORE LISA A ,  ULRICH NEUKIRCH ,  SUSAN L SCHIEFELBEIN ,  SMITH CHARLENE M

    IPC: C03B20/00 ,  G02B1/02 ,  H01L21/027

    CPC classification number: C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/54

    Abstract: PROBLEM TO BE SOLVED: To provide a synthetic silica material having an optical property improved against dependence of transmission on strength of ultra violet radiation, and a manufacturing method of the silica material.SOLUTION: In synthetic silica material having an OH concentration of less than 900 mass ppm, and having Hof from 1×10to 6×10molecular/cm, an annealing treatment which includes 1) heating to 1100°C, 2)then, cooling to 800°C at a rate of 1°C per hour, and 3) furthermore, cooling to 25°C at a rate of 30°C per hour is performed to the synthetic silica material. With this treatment, the synthetic silica has a measured FDT(dK/dF) of less than 5.10×10cm pulse/mJ when exposed to excimer laser at 193 nm.

    Abstract translation: 要解决的问题：提供具有改进的抗紫外线辐射强度下的透射依赖性的光学性质的合成二氧化硅材料和二氧化硅材料的制造方法。溶液：在OH浓度小于900的合成二氧化硅材料中 质量ppm，Hof为1×10〜6×10分子/ cm，退火处理包括1）加热至1100℃，2）然后以1℃/小时的速度冷却至800℃，3 ），然后对合成二氧化硅材料进行以30℃/小时的速度冷却至25℃。 通过这种处理，当在193nm的准分子激光暴露时，合成二氧化硅具有小于5.10×10cm脉冲/ mJ的测量FDT（dK / dF）。

    High transmission synthetic silica glass and method of making same
    10.
    发明专利
    High transmission synthetic silica glass and method of making same 有权
    高传输合成二氧化硅玻璃及其制备方法

    公开(公告)号：JP2006188424A

    公开(公告)日：2006-07-20

    申请号：JP2005378650

    申请日：2005-12-28

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： BOOKBINDER DANA CRAIG ,  FIACCO RICHARD MICHAEL ,  HRDINA KENNETH E ,  MOORE LISA A ,  SCHIEFELBEIN SUSAN L

    IPC: C03B20/00 ,  C03B8/04 ,  C03C3/06

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  G03F7/70958

    Abstract: PROBLEM TO BE SOLVED: To provide a method of improving the refractive index homogeneity of a high transmission synthetic silica glass. SOLUTION: The synthetic glass material having an OH concentration from 0.1 to 1,300 ppm by mass with a variation in OH concentration in a plane perpendicular to at least one axis thereof of less than 20 ppm by mass is manufactured by (i) providing high purity silica soot particles, (ii) forming a porous preform having bulk density of 0.2 to 1.6 g/cm 3 , preferably 0.25-1.0 g/cm 3 from the soot particles, (iii) optionally purifying the porous preform, (iv) consolidating the preform into dense silica in the presence of H 2 O and/or O 2 in a furnace having an internal surface exposed to the consolidation atmosphere which is inert to H 2 O and O 2 . COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提高高透射率合成石英玻璃的折射率均匀性的方法。 解决方案：通过（i）提供具有OH浓度为0.1至1,300质量ppm的合成玻璃材料，其中OH浓度在垂直于至少一个轴的平面中的OH浓度小于20质量ppm 高纯度二氧化硅烟灰颗粒，（ii）从烟灰形成多孔预型体，其堆积密度为0.2-1.6g / cm 3，优选为0.25-1.0g / cm 3， 颗粒，（iii）任选地净化多孔预型体，（iv）在H SB 2 O和/或O SB SB 2的存在下将预成型体固结成致密二氧化硅，在具有 暴露于固化气氛的内表面，其对H 2 SBO 2和O SB 2是惰性的。 版权所有（C）2006，JPO＆NCIPI

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