LOW INCLUSION TIO2-SIO2 GLASS OBTAINED BY HOT ISOSTATIC PRESSING

    公开(公告)号:NL2027828B1

    公开(公告)日:2022-09-09

    申请号:NL2027828

    申请日:2021-03-24

    Applicant: CORNING INC

    Abstract: A silica-titania glass substrate comprising: (i) a composition comprising 5 weight percent to 10 weight percent T102, (ii) a coefficient of thermal expansion (CTE) at 20 °C in a range from - 45 ppb/K to +20 ppb/K; (iii) a crossover temperature (Tzc) in a range from 10 °C to 50 °C; (iv) a 5 slope of CTE at 20 °C in a range from 1.20 ppb/K2 to 1.75 ppb/KZ; (V) a refractive index variation of less than 140 ppm; and (vi) 600 ppm OH group concentration or greater. The substrate can have a mass of 1 kg or greater and 0.05 gas inclusions, or less, per 16.4 cm3 (cubic inch) via a method comprising (i) forming the substrate from soot particles comprising SiOz and TiOz, and (ii) subjecting the substrate to an environment having an elevated temperature and an elevated pressure 10 for a period of time until the substrate comprises 0.05 gas inclusions, or less, per 16.4 cm3 (cubic inch).

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