UNSATURATED CARBOXYLIC ACID HEMIACETAL ESTER, POLYMER, AND RESIN COMPOSITION FOR PHOTORESIST
    1.
    发明申请
    UNSATURATED CARBOXYLIC ACID HEMIACETAL ESTER, POLYMER, AND RESIN COMPOSITION FOR PHOTORESIST 审中-公开
    不饱和羧酸乙酯,聚合物和树脂组合物

    公开(公告)号:WO2005075446A9

    公开(公告)日:2005-10-06

    申请号:PCT/JP2005000794

    申请日:2005-01-17

    CPC classification number: C07D307/00 C07C69/54 C07D307/94 G03F7/0397

    Abstract: A polymer comprising repeating units corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1): (1) (wherein R represents hydrogen, halogeno, C1-6 alkyl, or C1-6 haloalkyl; R represents a hydrocarbon group having a hydrogen atom in the 1-position; R represents hydrogen or a hydrocarbon group; and R represents an organic group containing a cyclic skeleton). The polymer may further contain repeating units corresponding to at least one monomer selected among monomers having a lactone skeleton, monomers having a cyclic ketone skeleton, monomers having an acid anhydride group, and monomers having an imide group [excluding the repeating units corresponding to the unsaturated carboxylic acid hemiacetal ester] and/or repeating units corresponding to at least one monomer selected among monomers having a hydroxy group, etc. When used in a photoresist, this polymer has the excellent property to release an acid.

    Abstract translation: 包含对应于下式(1)表示的不饱和羧酸半缩醛酯的重复单元的聚合物:(1)(其中R a表示氢,卤代,C 1-6烷基或C 1-6卤代烷基; R b >表示在1位具有氢原子的烃基,R c表示氢或烃基,R d表示含有环状骨架的有机基团。 聚合物可以进一步含有对应于至少一种选自具有内酯骨架的单体,具有环酮骨架的单体,具有酸酐基的单体和具有酰亚胺基的单体的单体的重复单元[不包括与不饱和单体相应的重复单元 羧酸半缩醛酯]和/或对应于选自具有羟基的单体中的至少一种单体的重复单元等。当在光致抗蚀剂中使用时,该聚合物具有优异的脱酸性质。

    4.
    发明专利
    未知

    公开(公告)号:DE60308246T2

    公开(公告)日:2007-01-11

    申请号:DE60308246

    申请日:2003-03-06

    Applicant: DAICEL CHEM

    Abstract: A process produces an organic compound by allowing (A) a compound capable of generating a free radical to react with (B) at least one of esters and salts of nitrous acid in the presence of a nitrogen-containing cyclic compound constitutively having a skeleton represented by following Formula (i) in its ring: wherein X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group. Examples of the nitrogen-containing cyclic compound are cyclic imide compounds having a cyclic imide skeleton represented by following Formula (I): wherein n is 0 or 1; X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group.A process produces an organic compound by allowing (A) a compound capable of generating a free radical to react with (B) at least one of esters and salts of nitrous acid in the presence of a nitrogen-containing cyclic compound constitutively having a skeleton represented by following Formula (i) in its ring: wherein X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group. Examples of the nitrogen-containing cyclic compound are cyclic imide compounds having a cyclic imide skeleton represented by following Formula (I): wherein n is 0 or 1; X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group.

    7.
    发明专利
    未知

    公开(公告)号:DE60308246D1

    公开(公告)日:2006-10-26

    申请号:DE60308246

    申请日:2003-03-06

    Applicant: DAICEL CHEM

    Abstract: A process produces an organic compound by allowing (A) a compound capable of generating a free radical to react with (B) at least one of esters and salts of nitrous acid in the presence of a nitrogen-containing cyclic compound constitutively having a skeleton represented by following Formula (i) in its ring: wherein X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group. Examples of the nitrogen-containing cyclic compound are cyclic imide compounds having a cyclic imide skeleton represented by following Formula (I): wherein n is 0 or 1; X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group.A process produces an organic compound by allowing (A) a compound capable of generating a free radical to react with (B) at least one of esters and salts of nitrous acid in the presence of a nitrogen-containing cyclic compound constitutively having a skeleton represented by following Formula (i) in its ring: wherein X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group. Examples of the nitrogen-containing cyclic compound are cyclic imide compounds having a cyclic imide skeleton represented by following Formula (I): wherein n is 0 or 1; X is an oxygen atom or an -OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group.

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