公开(公告)号：DE112009001389T5

公开(公告)日：2011-04-28

申请号：DE112009001389

申请日：2009-06-01

Applicant: DAICEL CHEM

Inventor： OKUMURA ARIMICHI ,  INOUE KEIZO ,  OKAMOTO KAZUKI

IPC: C08F20/30 ,  C08F32/08 ,  G03F7/039 ,  H01L21/027

公开(公告)号：JP2010241912A

公开(公告)日：2010-10-28

申请号：JP2009090425

申请日：2009-04-02

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： OKUMURA ARIMICHI

IPC: C08G61/02 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a polyol compound for photoresists which can reduce line edge roughness (LER) and can efficiently obtain a high purity polyol compound for photoresists useful in preparing a resist composition having excellent resolving power and etching resistance. SOLUTION: This method for producing a polyol compound for photoresists is to produce a polyol compound for photoresists in which an aliphatic group and an aromatic group having a hydroxyl group on the aromatic ring are alternately linked, and includes a step of mixing a solution of the polyol compound for photoresists, in which an aliphatic group formed by the acid catalyst reaction between an aliphatic polyol and an aromatic polyol and an aromatic group having a hydroxyl group on the aromatic ring are alternately linked, with a poor solvent for the compound having the phenolic hydroxyl group to separate and remove the hydrophobic impurities by deposition or phase separation. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 解决问题的方法：提供一种能够降低线边缘粗糙度（LER）的光致抗蚀剂多元醇化合物的制造方法，能够有效地获得用于制备具有优异的分辨能力的抗蚀剂组合物的光致抗蚀剂的高纯度多元醇化合物， 耐腐蚀性。 解决方案：用于光致抗蚀剂的多元醇化合物的制造方法是制造芳族环上具有羟基的脂肪族基团和芳香族基团交替连接的光致抗蚀剂用多元醇化合物，其包括将 用于光致抗蚀剂的多元醇化合物的溶液，其中通过脂族多元醇和芳族多元醇之间的酸催化剂反应形成的脂族基团和在芳香环上具有羟基的芳族基团交替连接，化合物的不良溶剂 具有酚羟基以通过沉积或相分离分离和除去疏水性杂质。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JPH09202840A

公开(公告)日：1997-08-05

申请号：JP3262896

申请日：1996-01-26

Applicant: DAICEL CHEM

Inventor： OKUMURA ARIMICHI

IPC: C08L9/00 ,  C08F279/00 ,  C08F279/02 ,  C08L7/00 ,  C08L21/00 ,  C08L25/04 ,  C08L33/04 ,  C08L33/06 ,  C08L51/04

Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition specified in the size distribution range of included particles, and capable of giving a molded product having high impact resistance, excellent in surface luster and quality balance. SOLUTION: This composition comprises (A) a styrene-based polymer as continuous phase and (B) rubbery polymer particles dispersed as disperse phase, having the following characteristics: the weight-average particle diameter of the component B is 0.3-2.0 (esp. 0.3-1.5)μm: the component A is included in the form of particles in the component B; the proportion of the rubbery polymer particles each including three or more particles of the component A accounts for >=70% of the component B; and >=50% of the number of the included particles (A) are those having a diameter of >0.3μm.

公开(公告)号：JP2008158149A

公开(公告)日：2008-07-10

申请号：JP2006345460

申请日：2006-12-22

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： OKUMURA ARIMICHI

IPC: G03F7/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition for forming a protective film, the composition resulting in a protective film that has no affinity to an immersion liquid, can suppress elution of a low molecular weight component from a resist layer or suppress swelling of a resist film, is easily removed in an alkali development process after exposure and gives a preferable pattern profile, and to provide a method for forming a liquid immersion exposure pattern by using the above composition. SOLUTION: The resin composition for forming a resist protective film contains a polymer having a repeating unit expressed by formula (1). The resin composition preferably contains a polymer having a repeating unit expressed by formula (1) as well as a (meth)acrylate repeating unit having a fluorine atom. In the repeating unit expressed by formula (1), X is more preferably a carboxylic acid. In formula (1), R1 represents a 1-20C aliphatic straight-chain or cyclic group; R2 represents a 1-20C aliphatic straight-chain or cyclic group; and X represents an alkali-soluble functional group such as -COOH, -SO 3 H and -CH(CF 3 )OH. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题为了提供一种形成保护膜的树脂组合物，得到与浸渍液无亲和性的保护膜的组合物可以抑制低分子量组分从抗蚀剂层的溶出或抑制 抗蚀剂膜的溶胀在曝光后的碱显影处理中容易除去，得到优选的图案形状，并提供通过使用上述组成形成液浸曝光图案的方法。 解决方案：用于形成抗蚀剂保护膜的树脂组合物含有具有由式（1）表示的重复单元的聚合物。 树脂组合物优选含有具有由式（1）表示的重复单元的聚合物以及具有氟原子的（甲基）丙烯酸酯重复单元。 在由式（1）表示的重复单元中，X更优选为羧酸。 式（1）中，R1表示1-20C脂肪族直链或环状基团， R2代表1-20C脂族直链或环状基团; 并且X表示碱溶性官能团，例如-COOH，-SO 3 S 3 H和-CH（CF 3 SB 3）OH。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007069114A

公开(公告)日：2007-03-22

申请号：JP2005258487

申请日：2005-09-06

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： OKUMURA ARIMICHI ,  TAKAGI TSUTOMU ,  SAKATA YOSHIYO

IPC: B05D1/40 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method of suppressing a generation of striation without any need of adding a new component to a dropping polymer solution when a thin film is formed on a substrate by a spin coat method, furthermore with a simple operation.
SOLUTION: The method of forming the thin film by applying the polymer solution on the substrate by the spin coat method gives the polymer solution shearing immediately before supplying the polymer solution to the substrate. The polymer solution containing at least a monomer unit having a polar group can be used as a polymer solution. As an application means of shearing, for example, at least one means selected from a supersonic wave, a shaking, a stirring, and a passage inside a narrow tube is included.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 待解决的问题：提供一种抑制条纹产生的方法，而通过旋涂法在基板上形成薄膜时，无需向滴加聚合物溶液中添加新的组分，此外，通过简单的 操作。 解决方案：通过旋涂法将聚合物溶液涂覆在基材上形成薄膜的方法使聚合物溶液在将聚合物溶液供给到基材之前立即剪切。 含有至少具有极性基团的单体单元的聚合物溶液可以用作聚合物溶液。 作为剪切的应用手段，例如，包括选自超声波，摇动，搅拌和细管内的通道中的至少一种装置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JPH1180467A

公开(公告)日：1999-03-26

申请号：JP25165397

申请日：1997-09-17

Applicant: DAICEL CHEM

Inventor： ITO MASAAKI ,  OKUMURA ARIMICHI ,  ARAI TAKASHI

IPC: C08L21/00 ,  C08L25/04

Abstract: PROBLEM TO BE SOLVED: To obtain a rubber-modified styrene resin compsn. improved in impact resistance, stiffness and surface gloss by dispersing a rubberlike polymer in a styrene polymer so that the resultant compsn. has a core-shell structure, that the soft component has specified average particle size and rubber fraction and that the uncrosslinked rubber has a specified hydrogen-nucleus spin-spin relaxation time. SOLUTION: A rubberlike polymer is dispersed in a styrene polymer to obtain the objective compsn. In the compsn., each of soft component particles having an average particle size of 0.1-1.0 μm has a core shell structure comprising a shell consisting of a rubberlike polymer and a core consisting of a single continuous phase of a styrene resin and included therein; the fraction (%) of a crosslinked rubber, Fs/(Fs+Ft) [wherein Fs is the FID strength of the component (L) which is obtd. by dividing an FID strength curve obtd. by H-NMR analysis into a component (L) having a long hydrogen-nucleus spin-spin relaxation time and a component (S) having a short hydrogen-nucleus spin-spin relaxation time; and Ft is the FID strength of the component (S)], is 60-80%; and when the time-vs-FID strength curve of an FID component corresponding to the rubber phase in the soft component particle is divided into two components different in T2 , the hydrogen-nucleus spin-spin relaxation time of L is 2.5-20.0 ms.

公开(公告)号：JPH09202839A

公开(公告)日：1997-08-05

申请号：JP3262796

申请日：1996-01-26

Applicant: DAICEL CHEM

Inventor： OKUMURA ARIMICHI

IPC: C08L9/00 ,  C08F279/00 ,  C08F279/06 ,  C08L7/00 ,  C08L21/00 ,  C08L25/04 ,  C08L33/04 ,  C08L33/06 ,  C08L51/04

Abstract: PROBLEM TO BE SOLVED: To obtain a transparent rubber-modified styrene resin having highly balanced impact strength and resistance to whitening in bending or impacting. SOLUTION: This transparent rubber-modified styrene resin having highly balanced impact strength and whitening resistance is a rigid thermoplastic resin having a continuous phase consisting of a copolymer composed mainly of an aromatic vinyl compound and a (meth)acrylic acid (ester) and a disperse phase consisting of dispersed particles of a conjugated diene elastomer. The weight-average particle diameter of the dispersed particle is 0.01-0.1μm.

公开(公告)号：JP2008260873A

公开(公告)日：2008-10-30

申请号：JP2007105505

申请日：2007-04-13

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： OKUMURA ARIMICHI

IPC: C08F20/10 ,  G03F7/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an anti-reflection film forming composition used for formation of the anti-reflection film improved in a close adhesion property with a photoresist and etching characteristic and capable of suppressing falling of a pattern at development/dissolution of the photoresist, and a polymer used for it. SOLUTION: The polymer for forming the anti-reflection film having at least one monomer unit represented by formula (1) (wherein R1, R2, R3, R4 and R5 each represent a 1-6C alkyl group, X represents a mono-cyclic aliphatic hydrocarbon which may be substituted by a 1-5C alkyl group, a halogen atom, a hydroxyl group, a 1-5C alkoxy group, an acetyl group or a cyano group) is provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于形成抗反射膜的抗反射膜形成组合物，其与光致抗蚀剂的密合性和蚀刻特性提高，并且能够抑制显影/溶解时的图案的下降 的光致抗蚀剂，以及用于其的聚合物。 解决方案：用于形成具有至少一个由式（1）表示的单体单元的抗反射膜用聚合物（其中R1，R2，R3，R4和R5各自表示1-6C烷基，X表示单 可以被1-5C烷基，卤素原子，羟基，1-5C烷氧基，乙酰基或氰基取代的环状脂族烃）。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007284368A

公开(公告)日：2007-11-01

申请号：JP2006111911

申请日：2006-04-14

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： KOYAMA YUTAKA ,  OKUMURA ARIMICHI

IPC: C07C69/54 ,  C07C67/29 ,  C07C309/66 ,  C08F20/28 ,  C08F20/38 ,  G03F7/027 ,  G03F7/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a methacrylic or acrylic monomer for synthesizing a resin useful as a photoresist, an antireflection film for manufacturing a semiconductor and a protective film for a photoresist resin, and a resin comprising the monomer; a resin for a resist protective film, which is excellent in water resistance, can form an even coating film on a photoresist resin layer, and furthermore can be dissolved and treated with an alkali developing solution; and a method of manufacturing a semiconductor which uses the protective film. SOLUTION: The methacrylic or acrylic monomer is expressed by formula (1). By the invention, a monomer for the photoresist resin and a resin useful for the antireflection film for manufacturing a semiconductor and the protective film for a photoresist resin and a resin comprising the monomer, can be provided. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供用于合成可用作光致抗蚀剂的树脂的甲基丙烯酸或丙烯酸单体，用于制造半导体的防反射膜和用于光致抗蚀剂树脂的保护膜，以及包含该单体的树脂; 用于抗蚀剂保护膜的树脂，其耐水性优异，可以在光致抗蚀剂树脂层上形成均匀的涂膜，并且还可以用碱性显影液溶解和处理; 以及使用该保护膜的半导体的制造方法。 解决方案：甲基丙烯酸或丙烯酸单体由式（1）表示。 通过本发明，可以提供用于光致抗蚀剂树脂的单体和用于制造半导体的防反射膜的树脂和用于光致抗蚀剂树脂的保护膜和包含单体的树脂。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006335777A

公开(公告)日：2006-12-14

申请号：JP2005158353

申请日：2005-05-31

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： OKUMURA ARIMICHI ,  SHIGA MASAMICHI

IPC: C08F220/10 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an appropriate manufacturing method of an acrylic polymer compound used for a photoresist related to an ArF excimer laser.
SOLUTION: The method for manufacturing a solution of a polymer compound for a photoresist comprises dissolving monomers comprising at least a monomer A bearing a group convertible into alkali-soluble by elimination by an acid and a monomer B having a polar group-bearing alicyclic skeleton and a polymerization initiator in a solvent, adding dropwise the resultant solution to a solvent having been raised to the polymerization temperature to allow the monomers to polymerize, adding the polymerization solution to a poor solvent (precipitation solvent) to cause the polymer to precipitate, centrifuging the precipitate by means of a centrifuge to remove the solvent, subsequently dissolving the wet crystal in a solvent, and concentrating the resultant solution by reduced-pressure distillation, where the molar ratio of methacrylate esters is at least 60 mol% based on the whole monomer used for polymerization.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供用于与ArF准分子激光器相关的光致抗蚀剂的丙烯酸类聚合物化合物的适当制造方法。 解决方案：用于制造光致抗蚀剂用高分子化合物的溶液的方法包括：将含有至少可带有可转换基团的单体A的单体溶解在单体中，单体B具有极性基团的单体 脂肪族骨架和聚合引发剂在溶剂中，将所得溶液滴加到已经升高到聚合温度的溶剂中，使单体聚合，将聚合溶液加入到不良溶剂（沉淀溶剂）中以使聚合物沉淀 ，通过离心机离心沉淀物以除去溶剂，随后将湿结晶溶解在溶剂中，并通过减压蒸馏浓缩所得溶液，其中甲基丙烯酸酯的摩尔比为至少60mol％，基于 用于聚合的全单体。 版权所有（C）2007，JPO＆INPIT