Method of making silicon halides
    1.
    发明授权
    Method of making silicon halides 失效
    制造硅胶的方法

    公开(公告)号:US3681036A

    公开(公告)日:1972-08-01

    申请号:US3681036D

    申请日:1970-08-18

    Applicant: DEGUSSA

    CPC classification number: C01B33/113

    Abstract: SILICON HALIDES ARE FORMED IN A CONTINUOUS PROCESS BY REACTING SILICON OR A SILICON-CONTAINING COMPOUND WITH HYDROGEN HALIDE AT A TEMPERATURE BETWEEN 350 AND 1200*C. THE SILICON HALIDE IS THEN RECOVERED AND THE HYDROGEN FORMED IN THE REACTION IS RECYCLED IN AN AMOUNT TO PROVIDE A RATIO OF PARTIAL PRESSURES IN THE RE-

    ACTION MIXTURE BETWEEN HYDROGEN HALIDE AND HYDROGEN IN THE RANGE BETWEEN 1:1 AND 1:50 AT A PREDETERMINED REACTION TEMPERATURE WITHIN THE STATED RANGE.

Patent Agency Ranking