公开(公告)号：US20220372647A1

公开(公告)日：2022-11-24

申请号：US17641767

申请日：2020-07-07

Applicant: EBARA CORPORATION

Inventor： Masaya SEKI ,  Kiyoshi SUZUKI ,  Masayuki SATAKE

IPC: C25D17/00 ,  C25D17/06

Abstract: Provided is a substrate holder for plating on a surface of a substrate, provided with an electrical contact that is easy to replace. A substrate holder 1 includes: a first holding member 2; a second holding member 3 that has an opening portion 3a for exposing the surface of a substrate W and holds the substrate W in a sandwiched manner with the first holding member 2; a plurality of engaging shaft portions 36 each having a head portion 36b in an expanded head shape at a tip end portion, provided in a circumferential direction of the second holding member 3; and an electrical contact 32 having a contact portion 32a to be in contact with an edge portion of the substrate W, and having an engagement reception portion 32b in a notch shape to be engaged with the adjacent engaging shaft portion 36 for arrangement along a circumference of the opening portion 3a of the second holding member 3.

公开(公告)号：US20220325430A1

公开(公告)日：2022-10-13

申请号：US17763858

申请日：2020-08-20

Applicant: EBARA CORPORATION

Inventor： Masaya SEKI ,  Kiyoshi SUZUKI ,  Masayuki SATAKE

IPC: C25D17/08 ,  C25D7/12 ,  H01L21/687

Abstract: Provided is a substrate holder and a substrate treatment apparatus capable of positioning a substrate even in a case in which the substrate receives a frictional force and the like from a support surface. A substrate holder 200 according to the present invention includes: a first holding member 300; a second holding member 500 adapted to pinch a substrate W with the first holding member 300; three or more positioning members 360 including contact surfaces 342 that come into contact with side end portions of the substrate W; a first moving member 380 including a plurality of engaging portions 384 that are engaged with the positioning members 360 such that the positioning members 360 with a state in which distances of an ideal axis L and contact surfaces 376 of the positioning members 360 are equal to each other maintained; and a first biasing member 310 adapted to bias the first moving member 380, in which the first moving member 380 delivers a biasing force of the first biasing member 310 to each of the positioning members 360, and the positioning members 360 are biased in a direction in which the contact surfaces 376 approaches the ideal axis L with the delivered biasing force.

公开(公告)号：US20180155847A1

公开(公告)日：2018-06-07

申请号：US15824192

申请日：2017-11-28

Applicant: EBARA CORPORATION

Inventor： Matsutaro MIYAMOTO ,  Jumpei FUJIKATA ,  Kiyoshi SUZUKI

IPC: C25D17/06

Abstract: Provided is a substrate holder where an effect of a pressure of a plating solution can be suppressed. A substrate holder includes first and second holding members for sandwiching a substrate. The first holding member includes: a support base; a movable base for supporting the substrate; and a biasing mechanism disposed between the support base and the movable base, and biasing the movable base in a direction along which the movable base is separated from the support base. The second holding member includes a protruding portion brought into contact with the substrate so as to seal the substrate. A biasing force of the biasing mechanism which is applied to a region or a position of the movable base differs from a biasing force of the biasing mechanism which is applied to another region or at another position of the movable base.

公开(公告)号：US20250108416A1

公开(公告)日：2025-04-03

申请号：US18895237

申请日：2024-09-24

Applicant: EBARA CORPORATION

Inventor： Fuyuki OGAKI ,  Yusuke WATANABE ,  Michiaki MATSUDA ,  Kohei WAKUI ,  Kiyoshi SUZUKI

IPC: B08B13/00 ,  B08B1/34 ,  B24B37/34

Abstract: Provided is a rotation speed calculation apparatus including: a first vibration sensor configured to detect a vibration generated when a notch in a peripheral edge portion of a substrate to be cleaned hits a roller holding the peripheral edge portion of the substrate when the substrate is rotated by driving the roller to rotate; a second vibration sensor configured to detect a vibration of a housing defining a space in which the substrate is cleaned; and a rotation speed calculator configured to calculate a rotation speed of the substrate based on the vibration detected by the first vibration sensor and the vibration detected by the second vibration sensor.