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公开(公告)号:US20220406633A1
公开(公告)日:2022-12-22
申请号:US17787565
申请日:2020-12-21
Applicant: EBARA CORPORATION
Inventor: Michiaki MATSUDA , Hisajiro NAKANO , Fuyuki OGAKI , Yusuke WATANABE , Junji KUNISAWA
Abstract: A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.
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公开(公告)号:US20250164977A1
公开(公告)日:2025-05-22
申请号:US18294110
申请日:2022-07-29
Applicant: EBARA CORPORATION
Inventor: Michiaki MATSUDA , Mitsuru MIYAZAKI , Hisajiro NAKANO , Yusuke WATANABE
IPC: G05B19/418 , B24B37/04
Abstract: A substrate support device includes: a plurality of rollers that is arranged inside a housing and holds an outer edge of a substrate; a rotation drive unit that rotates the substrate by rotationally driving the plurality of rollers; a vibration transmission mechanism that is installed in such a manner as to extend from any of the rollers or the rotation drive unit up to the housing and transmits vibrations to the housing, the vibrations occurring due to a notch or an orientation flat on the outer edge of the substrate hitting the roller; a detection sensor that is arranged outside the housing, detects at least one of sound, vibration, and strain occurring from the housing, and outputs a signal corresponding thereto; and a rotation speed calculation section that calculates a rotation speed of the substrate, based on the signal outputted from the detection sensor.
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公开(公告)号:US20250108416A1
公开(公告)日:2025-04-03
申请号:US18895237
申请日:2024-09-24
Applicant: EBARA CORPORATION
Inventor: Fuyuki OGAKI , Yusuke WATANABE , Michiaki MATSUDA , Kohei WAKUI , Kiyoshi SUZUKI
Abstract: Provided is a rotation speed calculation apparatus including: a first vibration sensor configured to detect a vibration generated when a notch in a peripheral edge portion of a substrate to be cleaned hits a roller holding the peripheral edge portion of the substrate when the substrate is rotated by driving the roller to rotate; a second vibration sensor configured to detect a vibration of a housing defining a space in which the substrate is cleaned; and a rotation speed calculator configured to calculate a rotation speed of the substrate based on the vibration detected by the first vibration sensor and the vibration detected by the second vibration sensor.
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公开(公告)号:US20240342854A1
公开(公告)日:2024-10-17
申请号:US18294730
申请日:2022-07-04
Applicant: EBARA CORPORATION
Inventor: Hiroki NAKAMURA , Yuta SUZUKI , Yusuke WATANABE , Michiaki MATSUDA , Koki YAMAMOTO , Taro TAKAHASHI
IPC: B24B37/013 , B24B49/00 , B24B49/04
CPC classification number: B24B37/013 , B24B49/003 , B24B49/045
Abstract: To accurately detect a polishing end point even if a change in a polishing frictional force is small. A polishing apparatus includes a polishing table for holding a polishing pad, a holder for holding a polishing target object such that the polishing target object faces the polishing pad, and an end point detector that detects, based on a signal indicating a state of polishing of the polishing target object by the polishing pad, a polishing end point indicating an end of the polishing. The end point detector is configured to remove noise of the signal, exponentiate the signal subjected to the noise removal with an exponent greater than 1, and detect the polishing end point based on the exponentiated signal.
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