PHOTO-DETECTING DEVICE
    1.
    发明公开

    公开(公告)号:US20240290902A1

    公开(公告)日:2024-08-29

    申请号:US18584699

    申请日:2024-02-22

    Abstract: A light-detecting device includes a base, a first absorption layer, a second absorption layer and a first semiconductor layer. The first absorption layer is located on the base and has a first band gap. The second absorption layer is located between the first absorption layer and the base and has a second band gap and a first dopant. The first semiconductor layer is located between the first absorption layer and the second absorption layer and has a third band gap. The second band gap is equal to or greater than the first band gap, and a third band gap greater than the first band gap and the second band gap. The first absorption layer does not include the first dopant.

    Photodetector with modified region in barrier and absorption structures

    公开(公告)号:US11935969B2

    公开(公告)日:2024-03-19

    申请号:US17092674

    申请日:2020-11-09

    CPC classification number: H01L31/02162 H01L31/0203

    Abstract: A photodetector includes a first semiconductor layer, an absorption structure, a second semiconductor layer, and a barrier structure. The absorption structure is located on the first semiconductor layer, and having a first conduction band, a first valence band, and a first band gap. The second semiconductor layer is located on the absorption structure, and having a second conduction band, a second valence band, and a second band gap. The barrier structure is located between the absorption structure and the second semiconductor layer, and having a third conduction band, a third valence band, and a third band gap. The third conduction band is greater than the second conduction band or the third valence band is less than the second valence band.

    Photodetector
    3.
    发明申请

    公开(公告)号:US20210151612A1

    公开(公告)日:2021-05-20

    申请号:US17092674

    申请日:2020-11-09

    Abstract: A photodetector includes a first semiconductor layer, an absorption structure, a second semiconductor layer, and a barrier structure. The absorption structure is located on the first semiconductor layer, and having a first conduction band, a first valence band, and a first band gap. The second semiconductor layer is located on the absorption structure, and having a second conduction band, a second valence band, and a second band gap. The barrier structure is located between the absorption structure and the second semiconductor layer, and having a third conduction band, a third valence band, and a third band gap. The third conduction band is greater than the second conduction band or the third valence band is less than the second valence band.

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